Robert Small is currently the Technology Consultant for RS Associates. He previously held the positions of CMP Technical Director and also was the R&D Technical Director for the remover line of business at DuPont/EKC Technology. He was involved in developing new chemistries for post-CMP cleaning, CMP chemistries, and post-etch residue removal. He has a B.S. from Norwich University, an M.S. from Texas Tech University, and a Ph.D. in organic photochemistry from the University of Arizona. He holds more than twenty-five U.S. and foreign patents and currently has ten submitted U.S. patent applications. He has authored or co-authored more than 115 articles and presentations, including BEOL, post clean treatment, post CMP, and CMP processes.