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Tuesday, January 25, 2022, 1PM - 5PM EST

Event: AVS Webinar: Fundamental and Practical Insights on Stress Evolution during Thin Film Growth
Location: Virtual/Online
Contact: Heather Korff
Web: https://avs.swoogo.com/webinar_stresstfg

Understanding the origin of stress in thin films produced by physical vapor deposition (PVD) is of key importance as excessive stress levels can lead to premature failure by cracking, buckling or interfacial delamination, which compromises device durability.

This webinar will provide an overview on how film stress develops during deposition, how it is affected by the main process parameters, and how to mitigate it. Selected examples from epitaxial, amorphous and polycrystalline thin films will be highlighted, with emphasis on metallic thin films. Models explaining the generation and relaxation of stress will be presented and discussed. The webinar will also cover practical aspects on how to measure stress during growth using wafer curvature methods.

Sunday, January 30, 2022, 8AM - 4PM EST

Event: AVS Board of Directors’ Meeting
Location: Cary, North Carolina
Contact: Yvonne Towse

In conjunction with the AVS Publications Retreat and visit to the new Publications Office

Tuesday, February 01, 2022, 10AM - 5PM EST

Event: Plasma Etching and RIE: Fundamentals and Applications (1 or 2 days)
Location: Virtual/Online
Contact: Heather Korff
Web: https://avs.swoogo.com/avsonlinesct_feb22

The first day of this course covers plasma-assisted etching phenomena and equipment in a manner that will assist the attendee in understanding and developing plasma etching and RIE processes. The emphasis will be on the fundamental physical and chemical processes that determine the consequences of a reactive gas plasma/surface interaction. The role of energetic ions as encountered in RIE systems and the factors that influence anisotropy of etching will be described. Many kinds of plasma-assisted etching equipment will be discussed, including capacitively coupled, inductively coupled, and wave-generated plasma sources.

The second day of this course covers the applied aspects of plasma-assisted etching. Emphasis will be on mechanistic understanding as opposed to specific processing issues, recipes, and problems. The etching of Si and its compounds will be covered in detail as well as the etching of other technology-related materials such as Al, organics, III-V compounds, etc. Topics such as selectivity, loading, ARDE, damage, and issues associated with high-density plasma RIE will be covered. A section on plasma diagnostics will focus on optical emission spectroscopy with actinometry, mass spectrometry, and laser-induced fluorescence.

Thursday, February 03, 2022, 7AM - 7PM EST

Event: The 4th International Symposium of the Vacuum Society of the Philippines (ISVSP 2022)
Location: Online
Contact: Hernando Salapare III

The ISVSP is a specialized meeting that gathers domestic and world-renowned scientists and scholars in the Philippines to discuss a range of technology-related topics, emerging trends, and special areas of interest in line with the theme of the symposium. It provides opportunities to entertain topics that will stretch into the future that will be vital in assisting our local industry in different technological fields. It aims to stimulate discussions, establish collaborations, and foster camaraderie among participants. We anticipate that this event will be participated by colleagues from the academe, researchers, students, and industry professionals. The symposium highlights plenary and parallel oral sessions as well as poster sessions with the goal of providing a scientific forum to enable interactive exchange of state-of-the-art knowledge. ISVSP is now on its 4th year with the theme, “Refocusing Vacuum and Plasma Technology to the current needs of the Society”. For more information, visit our official website (http://vacuumphilippines.org/index.php/symposia/isvsp-2022).

Abstract Deadline: December 15, 2021

Thursday, February 03, 2022, 10AM - 5PM EST

Event: Basics of Radio Frequency Technology
Location: Virtual/Online
Contact: Heather Korff
Web: https://avs.swoogo.com/avsonlinesct_feb22

This introductory course provides maintenance and equipment engineers and technicians with a basic working knowledge of RF technology as it is applied to semiconductor processing equipment.

The role of RF in the various plasma processes, including sputter deposition and etching systems, is discussed. The characteristics and uses of various components that make up an RF system are described. The differences between resistive and reactive components are explained as well as the differences between series and parallel resonance.

The course covers the operation of RF generators, coaxial cables, matching networks, filter circuits, and the plasma chamber itself. The use of inductive versus capacitive coupling of RF power into the plasma discharge is reviewed as well as methods for measuring target and substrate voltages and their relation to ion energies. Basic and practical troubleshooting techniques are discussed.

Friday, February 04, 2022, 10AM - 5PM EST

Event: Partial Pressure Analysis with Residual Gas Analyzers
Location: Virtual/Online
Contact: Heather Korff
Web: https://avs.swoogo.com/avsonlinesct_feb22

This course provides the basic training required to interpret Residual Gas Analyzer (RGA) data and produce actionable information for process control applications. The operation of an RGA is described, with specific attention dedicated to the multiple tuning parameters available to RGA operators. Routine calibration, tuning and maintenance procedures are discussed. Typical RGA spectra are shown and analyzed and the interferences from background gases are highlighted. Quantitative calculations of gas concentrations are described. Relevant literature references, gas libraries, tables and graphs are presented. A portion of time is always reserved to address the specific needs of the group.

Tuesday, February 08, 2022, 10AM - 5PM EST

Event: Atomic Layer Etching
Location: Virtual/Online
Contact: Heather Korff
Web: https://avs.swoogo.com/avsonlinesct_feb22

Atomic layer etching (ALE) is based on sequential, self-limiting reactions that yield controlled etching at the atomic level. ALE is critical for atomic layer processing that is increasingly important for nanoscale fabrication. The course will cover both plasma ALE and thermal ALE. Process strategies will be described that are useful for many applications including advanced semiconductor processing.

The first part of the course will cover the basics of plasma ALE. Si ALE will be described as the model plasma ALE system defined by chlorination and Ar+ ion sputtering. Other plasma ALE systems will be discussed such as SiO2, Si3N4 and HfO2 ALE. The second part of the course will cover the basics of thermal ALE. Al2O3 ALE will be developed as the model thermal ALE system based on fluorination and ligand-exchange reactions. Other thermal ALE systems will be discussed such as TiN, SiO2 and Si ALE.

The course will also discuss selectivity in ALE and the importance of ALE in area-selective atomic layer deposition (ALD). ALE and ALD can also be integrated into process flows in the same reactor for advanced device fabrication. Other applications for ALE include surface cleaning and surface smoothening.

Wednesday, February 09, 2022, 1PM - 5PM EST

Event: AVS Webinar: Atomic Layer Deposition from an Applications Perspective
Location: Virtual/Online
Contact: Heather Korff
Web: https://avs.swoogo.com/webinar_ALDApp

Over the last two decades Atomic Layer Deposition (ALD) has become a key enabling method with a multitude of applications benefiting from the (ultra)thin films that can be prepared with precise thickness control and with unparalleled uniformity and conformality on substrates with a demanding surface topology.

In this webinar the method of ALD will be presented with a focus on various applications of ALD: both in the lab and in the fab; from high volume manufacturing to niche markets; from emerging technologies to proof-of-concepts. Special attention will be given to the key features that ALD provides for these specific applications as well as the associated ALD configurations and types of equipment.

Thursday, February 10, 2022, 10AM - 5PM EST

Event: Plasma-Enhanced CVD: Fundamentals, Techniques and Applications (1 day)
Location: Virtual/Online
Contact: Heather Korff
Web: https://avs.swoogo.com/avsonlinesct_feb22

This course starts with a brief review of the basics of processing plasmas. This knowledge is then applied to the plasma deposition of thin films in practical device applications. The unique aspects of PECVD are emphasized by an in-depth comparison of PECVD with other deposition technologies. The relationship between process parameters and film properties is illustrated by reviewing several important device applications of PECVD.

The deposition and properties of important materials such as silicon oxide, silicon nitride, silicon carbide, amorphous and polycrystalline silicon, diamond and diamond-like carbon are discussed in detail.

Much emphasis is placed on an up-to-date discussion of hardware and hardware considerations as these apply to process control and process safety.

Important trends in the design and operation of commercial equipment, particularly as it relates to microelectronics, are discussed in detail.

Friday, February 11, 2022, 10AM - 5PM EST

Event: UHV Design and Practices
Location: Virtual/Online
Contact: Heather Korff
Web: https://avs.swoogo.com/avsonlinesct_feb22

Ultrahigh vacuum (UHV) is a required environment for many research areas, such as surface science (which requires the use of electron, ion, and neutral spectroscopies), as well as for many technological areas, such as thin-film growth of electronic and optical materials. In this course, the techniques involved in the production, measurement, and operation of such pressure levels are discussed.

In addition to kinetic theory, system design elements--such as methods of pumping, materials selection, materials processing, outgassing considerations, system degassing, instrument degassing, surface effects, pressure-limiting factors, methods to shorten pumpdown time, and sample transfer systems--are reviewed. Special emphasis is given to total and partial pressure measurement within UHV systems. Various applications requiring an operational UHV environment are also discussed.

The course concludes with an open forum to exchange new ideas and techniques.

Thursday, February 17, 2022, 10AM - 6PM EST

Event: NCCAVS 42nd Annual Equipment Exhibition, NCCAVS Technical Symposium and 10th Annual Student Poster Session
Location: Fremont Marriott Silicon Valley, 46100 Landing Pkwy, Fremont, CA 94538
Contact: Chris Malocsay

The NCCAVS sponsors an Annual Equipment Exhibition to showcase products and services of companies supporting vacuum-related industries. Attracting approximately 80+ exhibitors and over 700 attendees.

Largest Attendance of any AVS Chapters or Divisions. * Speaker events at capacity. * Extended hours provide ample time to engage all attendees. * Lunch, Evening Reception and Cocktails at no cost to attendees.

Held In Conjunction with:

NCCAVS Technical Symposium
10^th Annual Student Poster Session

Monday, March 14, 2022, 7AM - 7PM EST

Event: International Conference on Frontiers of Characterization and Metrology for Nanoelectronics (FCMN)
Location: Monterey, California
Contact: Della Miller

The FCMN will bring together scientists and engineers interested in all aspects of the characterization technology needed for nanoelectronic materials and device research, development, and manufacturing. All approaches are welcome: chemical, physical, electrical, magnetic, optical, in-situ, and real-time control and monitoring. The conference will summarize major issues and provided critical reviews of important semiconductor techniques needed as the semiconductor industry moves to silicon nanoelectronics and beyond.

The conference consists of formal invited presentation sessions and poster sessions for contributed papers. The poster papers cover new developments in characterization and metrology especially at the nanoscale. The conference series began 1995 and is the 13th conference in the series.

Tuesday, March 29, 2022, 1PM - 2PM EST

Event: AVS e-Talk: Measuring Your Level of Vacuum: A Guide to Gauge Technology
Location: Virtual/Online
Contact: Heather Korff
Web: https://avs.swoogo.com/avs_gaugetech

Measuring pressure is one of the key ingredients in all vacuum applications. With continual improvements in pressure measurement technology and a plethora of manufacturers who delve into this space, it is sometimes difficult to understand the key differences in the technologies and what variables may affect the readings. This e-Talk will take a dive into the individual technologies and highlight some of the key characteristics for each. Also, a focus in this discussion will be some of the variables that can affect the measurements and how to potentially overcome those issues.

Thursday, April 21, 2022, 8AM - 8PM EST

Event: 6th Area Selective Deposition Workshop (ASD 2022)
Location: Westin St. Francis, San Francisco, CA
Contact: Rudy Wojtecki

Developments in nanoelectronics and nanoscale surface modification continue to drive the need for more elegant and reliable bottom-up area selective deposition (ASD) strategies. Many technology fields increasingly focus on developing new strategies for ASD, including sub-10 nm next generation devices, -material catalysts, new optical devices, and materials for energy storage. This two-day workshop will gather leading experts from academia and industry. Themes addressed include: fundamental challenges related to recent developments in ASD, applications for ASD in next-generation technology, emergent processes for implementing ASD techniques, and new perspectives on metrological and characterization strategies for further understanding persistent mechanistic challenges.

Monday, April 25, 2022, 8AM - 4PM EST

Event: AVS Board of Directors’ Meeting
Location: New York, New York
Contact: Yvonne Towse

In conjunction with a visit to AVS HQ

Tuesday, May 10, 2022, 7AM - 7PM EST

Event: AIV XXV Conferences - Materials, Interfaces, Processes in Industrial and Basic Research Application (2022)
Location: Complesso Monumentale di Santa Maria la Nova, Naples, Italy
Contact: Espedito Vassallo; e-mail: espedito.vassallo@istp.cnr.it

The AIV XXV CONFERENCE approaches the issues associated with materials and processing, in the research and manufacturing communities. The three day Conference promotes a multidisciplinary environment to encourage a cross fertilization between attendees on emerging technologies.

Sunday, May 22, 2022, 8AM - 8PM EST

Event: ICMCTF'22- International Conference On Metallurgical Coatings & Thin Films
Location: Town and Country Hotel, San Diego, CA
Contact: ICMCTF Information

The ICMCTF is internationally recognized as a vibrant technical conference that integrates fundamental and applied research focused on thin film deposition, characterization, and advanced surface modification techniques. ICMCTF is the premier international meeting in the field promoting global exchange of information among scientists, technologists, and manufacturers. The conference draws more than 800 attendees each year with multiple oral technical sessions and a well attended poster session which is a major component of the technical program.

Tuesday, May 31, 2022, 7AM - 7PM EST

Event: 65th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN 2022)
Location: Sheraton New Orleans, New Orleans, Louisiana
Contact: James Spallas; e-mail: eipbn20cc@eipbn.org and Rob Ilic; e-mail: robert.ilic@nist.gov

The International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN), affectionately known as “3-Beams,” is the premier gathering of scientists and engineers who are dedicated to electron, ion and photon lithography, imaging, and analysis; atomically precise fabrication; nanofabrication process technologies; related emerging technologies; and their applications in a broad spectrum of fields. This is the 65th meeting of the EIPBN, where top researchers from academia, government laboratories, and industry from around the world meet to present and discuss recent trends and future directions in these technologies.

Abstract Deadline: January 30, 2022

Sunday, June 26, 2022, 8AM - 7PM EST

Event: ALD/ALE 2022: AVS 22nd International Conference on Atomic Layer Deposition (ALD 2022) featuring the 9th International Atomic Layer Etching Workshop (ALE 2022)
Location: Ghent, Belgium
Contact: Della Miller

The AVS 22nd International Conference on Atomic Layer Deposition (ALD 2022) featuring the 9th International Atomic Layer Etching Workshop (ALE 2022) will be a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films and now topics related to atomic layer etching. Since 2001, the ALD conference has been held alternately in the United States, Europe and Asia, allowing fruitful exchange of ideas, know-how and practices between scientists. This year, the ALD conference will again incorporate the Atomic Layer Etching 2022 Workshop (ALE 2022), so that attendees can interact freely. The conference will take place Sunday, June 26 - Wednesday, June 29, 2022, at the International Convention Center in Ghent, Belgium.

As in past conferences, the meeting will be preceded (Sunday, June 26) by one day of tutorials and a welcome reception. Sessions will take place (Monday-Wednesday, June 26-29) along with an industry tradeshow. All presentations will be audio-recorded and provided to attendees following the conference (posters will be included as PDFs). Anticipated attendance is 600+.

Sunday, July 24, 2022, 12PM - 4PM EST

Event: AVS Board of Directors’ Meeting (via Zoom)
Location: Online/Virtual
Contact: Yvonne Towse

Virtual Meeting

Sunday, August 07, 2022, 7AM - 7PM EST

Event: Gallium Oxide Workshop (GOX 2022)
Location: Washington, DC Area, US
Contact: Virginia Wheeler and Kelson Chabak

The 5th U.S. Gallium Oxide Workshop (GOX 2022) will be held in the Washington, D.C. area on August 7-10, 2022 to highlight domestic research in the rapidly emerging field of Ga2O3 and related materials with high critical field strength. The purpose of this workshop is to provide a premier platform for reporting recent advances in materials and device development and identify scientific gaps remaining. The intent is to create actionable coordination across government, industry and academia to enable rapid transitional technologies in this field. There will be no written proceedings in order to facilitate a friendly and stimulating environment for scientific discussions among participants from domestic and international Ga2O3 research groups. Attendees can expect topics including, but not limited to: bulk and epitaxial growth, theory/modeling/simulations, device and circuit advancements, materials characterization and novel properties, and heterostructures.

GOX 2022 will consist of two and a half days of presentations by invited and contributed speakers, as well as two evening poster sessions where the latest Ga2O3 results can be discussed. The Workshop will be preceded by a welcome reception beneficial for networking with others in the field and establishing new collaborations.

Sunday, September 18, 2022, 7AM - 7PM EST

Event: 36th North American Conference on Molecular Beam Epitaxy (NAMBE 2022)
Location: The Atlantic Sands Hotel & Conference Center, Rehoboth Beach, DE
Contact: Joshua Zide, e-mail: zide@udel.edu

The 36th North American Molecular Beam Epitaxy Conference (NAMBE 2022) is a prominent international forum for reporting scientific and technological developments in Molecular Beam Epitaxy research. The conference showcases important results from fundamental materials and device research, through technological applications, and into high-volume and low-cost production. NAMBE features the presentations of the MBE Innovator Award, the NAMBE Young Investigator Award, and the Best Student Paper awards. In addition to a diverse technical program, vendors will exhibit the latest equipment available for material growth and characterization. The exhibit will surround the coffee breaks and poster presentations, providing many opportunities for discussions between attendees and vendors.

Sunday, September 18, 2022, 8AM - 5PM EST

Event: International Conference on Secondary Ion Mass Spectrometry (SIMS 23)
Location: Hyatt Regency Minneapolis, Minneapolis, Minnesota
Contact: Anna Belu, Conference Chair (Medtronic, USA)

The 2022 International Conference on Secondary Ion Mass Spectrometry (SIMS 23) will be held September 18-23, 2022, at the Hyatt Regency Minneapolis in Minneapolis, Minnesota, USA. SIMS 23 will provide a forum for colleagues from academic, industrial, and national laboratories throughout the world to exchange results and new ideas on Secondary Ion Mass Spectrometry and related techniques.

The conference will cover advancements of scientific knowledge from fundamentals to applications. In light of future requirements coming from technology and basic research, updates on present possibilities and future developments of the technique are particularly solicited for dedicated discussion sessions.

Monday, October 03, 2022, 12PM - 6PM EST

Event: 2022 SCCAVS Equipment Exhibition, Keynote Speakers, & Short Courses
Location: Holiday Inn Buena Park Hotel & Conference Center, Buena Park, CA 90620
Contact: Anna Corinne D'Ambrosio

An Equipment Exhibition will be hosted by the Southern California Chapter of AVS (SCCAVS) on Tuesday, October 4, 2022 at the Holiday Inn Buena Park Hotel & Conference Center. The Exhibition will be open from 12:00 noon to 6:00 pm.

(Short Courses October 3 – 5)

Sunday, October 16, 2022, 7AM - 7PM EST

Event: 14th International Symposium on Atomic Level Characterizations for New Materials and Devices (ALC 2022)
Location: Bankoku Shinryokan, Nago, Okinawa, Japan
Contact: Hiroki Hibino

The series of international symposia entitled “Atomic Level Characterization (ALC)” focus on practical applications of atomic level characterization (both atomic dimensions and energy levels) of new materials and devices, including bio- and organic materials as well as inorganics. Descriptions of new applications and instrumentation for various analytical techniques of surface and interface analysis are solicited in these symposia. The goal is to promote stimulating discussions among researchers specializing in different probe methods. The symposium also encourages discussion of fundamental problems to be solved in the further development of atomic level characterization of materials, including approaches based on theory and simulations.

Sunday, November 06, 2022, 7AM - 12PM EST

Event: AVS 68th International Symposium & Exhibition
Location: David L. Lawrence Convention Center, Pittsburgh, Pennsylvania
Contact: Yvonne Towse

The AVS International Symposium and Exhibition has been developed to address cutting-edge issues associated with vacuum science and technology in both the research and manufacturing communities. The Symposium is a week long forum for science and technology exchange featuring papers from technical divisions and technology groups, and topical conferences on emerging technologies. The equipment exhibition is one of the largest in the world and provides an excellent opportunity to view the latest products and services offered by over 200 participating companies. More than 3,000 scientists and engineers gather from around the world to attend. Short courses are offered in conjunction with the International Symposium providing specialized training in specific areas of vacuum science and related technologies. A Career Workshop and Job Center are also offered to all attendees. The Workshop covers such topics as résumé preparation, job search skills, networking, interviewing skills, and more. The Job Center provides the opportunity for job seekers to submit their résumés and meet with potential employers.

Sunday, November 06, 2022, 8AM - 4PM EST

Event: AVS Board of Directors’ Meeting
Location: Pittsburgh, Pennsylvania
Contact: Yvonne Towse

In conjunction with the AVS 68th International Symposium & Exhibition

Sunday, December 11, 2022, 8AM - 6PM EST

Event: PacSurf 2022: Pacific Rim Symposium on Surfaces, Coatings, & Interfaces
Location: Waikoloa Beach Marriott Resort & Spa, Waikoloa, Hawaii
Contact: Della Miller, AVS, 530-896-0477

The AVS Pacific Rim Symposium on Surfaces, Coatings and Interfaces (PacSurf 2022) will be held on the Big Island of Hawaii from December 11 – 15, 2022. This conference is being organized by AVS (United States) with a Steering Committee composed of representatives from Australia, Canada, China, Japan, Korea, Mexico, New Zealand, Philippines, Singapore, Taiwan, and the United States. Symposium attendees will interact during morning and evening sessions that will include plenary, invited, and contributed presentations.The main topics for PacSurf 2022 will be focused on the latest advances in Biomaterial Surfaces & Interfaces, Energy Harvesting & Storage, Nanomaterials, Plasma Processing, and Thin Films. We will have morning and evening technical sessions with the afternoons free for other activities and discussions.

The conference will be held in the Waikoloa Beach Marriott Resort and Spa on the Big Island of Hawaii. We are confident you will benefit by attending PacSurf 2022 and networking with the other attendees.

Sunday, May 21, 2023, 8AM - 8PM EST

Event: ICMCTF'23- International Conference On Metallurgical Coatings & Thin Films
Location: Town and Country Hotel, San Diego, CA
Contact: ICMCTF Information

Sunday, July 23, 2023, 8AM - 1PM EST

Event: ALD/ALE 2023: 23rd International Conference on Atomic Layer Deposition (ALD 2023)
Location: Bellevue, Washington
Contact: Della miller

The AVS 23rd International Conference on Atomic Layer Deposition (ALD 2023) featuring the 10th International Atomic Layer Etching Workshop (ALE 2023) will be a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films and now topics related to atomic layer etching. Since 2001, the ALD conference has been held alternately in the United States, Europe and Asia, allowing fruitful exchange of ideas, know-how and practices between scientists. This year, the ALD conference will again incorporate the Atomic Layer Etching 2023Workshop (ALE 2023), so that attendees can interact freely.

Monday, September 18, 2023, 7AM - 7PM EST

Event: 37th North American Molecular Beam Epitaxy Conference (NAMBE 2023)
Location: Monona Terrace Convention Center, Madison, WI, USA
Contact: Jason Kawasaki, Bharat Jalan

The 37th North American Molecular Beam Epitaxy Conference (NAMBE 2023) is a prominent international forum for reporting scientific and technological developments in Molecular Beam Epitaxy research. The conference showcases important results from fundamental materials and device research, technological applications, and production. NAMBE features award presentations for MBE Innovator, Young Investigator, and Best Student Paper. Vendors will exhibit the latest equipment available for material growth and characterization. Exhibits will surround the coffee breaks and poster presentations, providing opportunities for discussions between attendees and vendors. Short topical workshops are also being considered the day before the main conference.

Sunday, November 05, 2023, 7AM - 12PM EST

Event: AVS 69th International Symposium & Exhibition
Location: Oregon Convention Center, Portland, Oregon
Contact: Yvonne Towse

Sunday, May 19, 2024, 8AM - 8PM EST

Event: ICMCTF'24- International Conference On Metallurgical Coatings & Thin Films
Location: Town and Country Hotel, San Diego, CA
Contact: ICMCTF Information

Sunday, August 04, 2024, 8AM - 7PM EST

Event: 24th International Conference on Atomic Layer Deposition (ALD 2024)/ 11th International Atomic Layer Etching Workshop (ALE 2024)
Location: Helsinki, Finland
Contact: Della miller

The AVS 24th International Conference on Atomic Layer Deposition (ALD 2024) featuring the 11th International Atomic Layer Etching Workshop (ALE 2024) will be a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films and now topics related to atomic layer etching. Since 2001, the ALD conference has been held alternately in the United States, Europe and Asia, allowing fruitful exchange of ideas, know-how and practices between scientists. This year, the ALD conference will again incorporate the Atomic Layer Etching 2024 Workshop (ALE 2024), so that attendees can interact freely.

Sunday, November 03, 2024, 7AM - 12PM EST

Event: AVS 70th International Symposium & Exhibition
Location: Tampa Convention Center, Tampa, Florida
Contact: Yvonne Towse

Sunday, June 28, 2026, 8AM - 7PM EST

Event: ALD/ALE 2026: AVS 26th International Conference on Atomic Layer Deposition (ALD 2026) featuring the 13th International Atomic Layer Etching Workshop (ALE 2026)
Location: Tampa, Florida
Contact: Della Miller

The AVS 26th International Conference on Atomic Layer Deposition (ALD 2026) featuring the 13th International Atomic Layer Etching Workshop (ALE 2026) will be a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films and now topics related to atomic layer etching. Since 2001, the ALD conference has been held alternately in the United States, Europe and Asia, allowing fruitful exchange of ideas, know-how and practices between scientists. This year, the ALD conference will again incorporate the Atomic Layer Etching 2026 Workshop (ALE 2026), so that attendees can interact freely. The conference will take place Sunday, June 28 - Wednesday, July 1, 2026, at the International Convention Center in Ghent, Belgium.

As in past conferences, the meeting will be preceded (Sunday, June 28) by one day of tutorials and a welcome reception. Sessions will take place (Monday-Wednesday, June 29-July 1) along with an industry tradeshow. All presentations will be audio-recorded and provided to attendees following the conference (posters will be included as PDFs). Anticipated attendance is 800+.