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UID:19c473e5-98c0-4377-9bd0-dca80216917a@avs.org
DTSTAMP:20260314T233918Z
DTSTART:20240804T120000Z
DTEND:20240807T230000Z
LOCATION: Helsinki, Finland
DESCRIPTION:\nThe AVS 24th International Conference on Atomic Layer Deposition (ALD 2024) featuring the 11th International Atomic Layer Etching Workshop (ALE 2024) will be a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films and now topics related to atomic layer etching.  Since 2001, the ALD conference has been held alternately in the United States, Europe and Asia, allowing fruitful exchange of ideas, know-how and practices between scientists. This year, the ALD conference will again incorporate the Atomic Layer Etching 2024 Workshop (ALE 2024), so that attendees can interact freely.\n\n Helsinki, Finland\n\n Della miller
SUMMARY:  24th International Conference on Atomic Layer Deposition (ALD 2024)/ 11th International Atomic Layer Etching Workshop (ALE 2024)
PRIORITY:3
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DESCRIPTION:Reminder
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