Description

Erwin Kessels is a Professor at the Eindhoven University of Technology TU/e and he is the Scientific Director of the NanoLab@TU/e clean room facilities. Erwin received his M.Sc. and Ph.D. degree in Applied Physics from the TU/e in 1996 and 2000, respectively. His research interests cover the field of synthesis of ultrathin films and nanostructures using methods such as (plasma-enhanced)  atomic layer deposition (ALD) and atomic layer etching (ALE). He has contributed most prominently by his work on plasma-assisted ALD, his research related to ALD for photovoltaics, and ALD for nanopatterning (including area-selective ALD). Erwin has won several awards (the AVS Peter Mark Memorial Award in 2007; the ALD Innovation Award in 2019) and he has organized various conferences in the field of ALD and ALE. He is an Associate Editor of the Journal of Vacuum Science and Technology. He is also the driving force behind the AtomicLimits.com blog and the Founder of the ALD Academy.