Randy J. Shul is currently a Principal Member of Technical Staff at Sandia National Laboratories in the Microdevice Technologies Department. His current interests include Si micromachining for MEMS, integrated microsystems, sensors, and advanced packaging technologies. He is also active in plasma etch process development for the wide-bandgap group-III nitrides and the development of high-density, low-damage plasma etch processes for advanced compound semiconductor devices. Previously, he worked at AT&T Bell Laboratories where he was responsible for plasma process development for the fabrication of GaAs digital integrated circuits. He earned a B.A. in chemistry in 1981 from Rutgers University and a Ph.D. in chemistry from the Pennsylvania State University in 1987. He is author of over 150 journal publications, eight book chapters, and has six patents. He has been a member of the AVS since 1988. He served as NMAVS Symposium Chair in 1995, Vice Chair in 1996, Chair in 1997, and is currently chapter Secretary. He was also technical program vice chair for the national AVS meeting in 2000.