Course Objectives

• Understand the radio frequency (RF) plasma system as an electronic circuit.
• Learn a systematic approach to viewing a RF plasma system.
• Know techniques for maintaining and troubleshooting RF systems.

Course Description

This introductory course provides maintenance and equipment engineers and technicians with a basic working knowledge of RF technology as it is applied to semiconductor processing equipment.

The role of RF in the various plasma processes, including sputter deposition and etching systems, is discussed. The characteristics and uses of various components that make up an RF system are described. The differences between resistive and reactive components are explained as well as the differences between series and parallel resonance.

The course covers the operation of RF generators, coaxial cables, matching networks, filter circuits, and the plasma chamber itself. The use of inductive versus capacitive coupling of RF power into the plasma discharge is reviewed as well as methods for measuring target and substrate voltages and their relation to ion energies.  Basic and practical troubleshooting techniques are discussed.

Course Materials

• Online Course/Program includes link to PDF notes file

• In Person Course/Program includes printed notes

Who Should Attend?

Engineers and equipment technicians who use RF power in vacuum systems and require a working knowledge of RF fundamentals.