Description

Randy J. Shul retired from Sandia National Laboratories in 2022 after 30 years of service. Over his career, his interests included Si micromachining for MEMS, integrated microsystems, sensors, and advanced packaging technologies; plasma etch process development for the wide-bandgap group-III nitrides; development of high-density, low-damage plasma etch processes for advanced compound semiconductor devices; and failure analysis of state-of-the-art integrated circuits using advanced ion and electron beam microscopy. Previously, he worked at AT&T Bell Laboratories where he was responsible for plasma process development for the fabrication of GaAs digital integrated circuits. Randy earned a B.A. in Chemistry in 1981 from Rutgers University and a Ph.D. in Chemistry from the Pennsylvania State University in 1987.  He is the author or co-author of over 225 journal publications, eight book chapters, and has 19 patents.  He has been a member of the AVS since 1988 and was elected Fellow of the Society in 2023.  He served as NMAVS Symposium Chair in 1995, Vice Chair in 1996, Chair in 1997, and served as Chapter Secretary for several years.  He was also technical program Vice Chair for the national AVS meeting in 2000.