T.C. Smith has been continuously involved in the development of ion implantation processes in pilot line environments for more than 25 years. He recently retired from Motorola's Semiconductor Products Sector where he was a member of the technical staff in the Advanced Custom Technologies department. Prior to that, he developed implant processes for CMOS in Motorola's Advanced Product Research and Development Laboratory. He received his M.S. degree in physics from the University of Notre Dame and has specialized in various aspects of ion implantation technology throughout his career. With more than 25 publications in this field, he has focused on problems involved with the use of photoresist masking in implantation and particulate contamination. He has facilitated an internal Motorola course on ion implantation technology for more than 20 years and has taught a graduate course on ion implantation as adjunct professor at Arizona State University. Since 1986, he has been on the faculty of the International Ion Implantation School. This school accompanies the International Conference on Ion Implantation Technology, which is held every two years. He has also taught a course on Ion Implantation Process Engineering for Semyzen in Singapore and SEMI in Taiwan. He has been a member of the Greater Silicon Valley Ion Implant Users Group since its formation and is a member of AVS and the Electrochemical Society. He is actively involved in ion implantation technology, developing and conducting seminars, and in-house training in ion implantation process engineering. He also serves as a consultant to both equipment manufacturers and implant users.