Mikko Ritala received his M.Sc. degree in 1991 from University of Turku, and his Ph.D. degree in 1994 from University of Helsinki, both in inorganic chemistry. During 1995 - 2003 he worked at the University of Helsinki, first as a postdoctoral researcher and then as an academy research fellow, both posts granted by the Academy of Finland. In 2003, he was nominated as a professor of inorganic materials chemistry at University of Helsinki. His research activities are in the area of thin film growth by Atomic Layer Deposition and electrodeposition for microelectronics and other application areas. Real time reaction mechanism studies form an important part of the research. He has published 150 papers and holds several patents. He can be reached by email at Mikko.Ritala@Helsinki.fi. A summary and a list of publications of the thin film research can be found through the website of the Laboratory of Inorganic Chemistry.