Description

John Caughman is on the research staff at Oak Ridge National Laboratory in the RF and Plasma Technology Group. He received his doctorate in Nuclear Engineering from the University of Illinois in 1989. He has extensive experience in developing and implementing RF diagnostic techniques for fingerprinting the RF systems used in micro-electronics fabrication. Current areas of research include RF power deposition in process plasmas (capacitively and/or inductively coupled) and the use of high-density plasmas for plasma-enhanced chemical vapor deposition of a variety of materials.