- Learn the fundamentals and practical aspects of using the major surface, interface, and thin film analysis spectroscopic techniques.
- Understand and be able to interpret the data provided by each technique.
- Know the comparative usage and limitations of each technique.
This course is for those wanting a good understanding of the practical usage of the major spectroscopic analytical methods used for determining atomic and chemical composition and, in some cases, structural information at the surfaces and interfaces of materials, and through thin films.
The major techniques covered are x-ray photoelectron spectroscopy (XPS, or electron spectroscopy for chemical analysis [ESCA]), Auger electron spectroscopy (AES, including scanning Auger microscopy [SAM]), secondary ion mass spectroscopy (SIMS), and Rutherford backscattering spectroscopy (RBS). The principles of each technique are given, followed by specific examples of practical applications (particularly to semiconductor, data storage, and thin-film material situations).
A comparison is made of the information content provided; the differences in surface sensitivity, spatial resolution, etc.; and the cost and ease of obtaining the information. If time allows, a few of the lesser used techniques will also be reviewed. The aim is to provide enough knowledge to be able to choose and use the techniques to answer surface, interface, and thin film analytical questions. It is not intended, however, to be an instrument operation training course.
Course Cost: $790
Who should attend?
Anyone with a need to understand, in some depth, what information these analytical techniques can provide and how to get it. This would include scientists and students working in surface-related fields, process engineers and managers with responsibilities for surface- or interface-related technologies, and technicians working with these techniques.
C.R. Brundle and Associates