Thin Film Division Russell F. Messier Mid-Career Award and Lecture
The AVS Thin Film Division is pleased to announce the new
Russell F. Messier Mid-Career Award and Lecture for Outstanding Research in Thin Films established to recognize the outstanding achievements of mid-career researchers contributing to thin film science, experimentation, theory, simulation, engineering, and/or technology.
Eligibility
- The nominee should have made pioneering contributions to the science and or technology of thin films, vapor deposition, and/or related fields that advance the state-of-knowledge or the state-of-technology for the community.
- The nominee should have published at least a portion of their work in an AVS Journal (e.g., JVST) and/or presented their work at an AVS symposium or other AVS sponsored conference, as indicated on their CV.
- The nominee should be in their mid-career as defined as being between 12 and 25 years past completion of their terminal degree by Dec. 31 of the award year, as indicated on their CV.
- The nominee cannot be a member of the TFD Awards Committee at the time of nomination and selection.
Nature of the Award
This award seeks to recognize those, who like its namesake, flourish (or “strike diamond”) in their mid-careers. While Russ Messier did not become a tenure track professor until 12 years past his Ph.D., he only took 1 year to earn tenure and 4 years to be promoted to full professor, becoming widely recognized for his pioneering work in low-temperature diamond coatings and fundamental contributions to the structure-zone model for film microstructure engineering. Awardees will receive a plaque, a cash prize ($2000), and be invited to give a featured lecture within the Thin Film Division sessions at the annual AVS International Symposium.
Establishment and Support
This award is a memorial to the scientific legacy of Dr. Russell. F. Messier, former Professor of Engineering Science and Mechanics at Penn State University, who had a 50-year career in thin film research and served on the executive board of both AVS and the Thin Film Division. The award was initially endowed by significant contributions from the friends and family of Dr. Messier.
Nomination and Selection Procedure
- A nominating letter citing the pioneering contributions made by the nominee to the science and/or technology of thin films
- At least one additional letter of support for the nomination.
- A CV that highlights:
- Significant accomplishments
- Publications in AVS Journals
- Presentations at AVS Symposia
- Year of Terminal Degree
- Nominators and other supporters can only support 1 nominee each year.
- All nomination documents should be submitted to Mark Losego, losego@gatech.edu, by March 31, 2026.
- Nomination packages will be evaluated by the AVS TFD Awards Committee.