Nagoya University
E-mail: kenji_ishikawa @ avs.org

KENJI ISHIKAWA is a Professor at the Center for Low Temperature Plasma Science (CLPS), Nagoya University, Japan. His scientific research interests involve plasma-surface interactions in advanced semiconductor processes for high-aspect-ratio features and novel materials. He holds his Ph.D. in engineering from Tohoku University. He did his research at the plasma laboratory and environmentally benign etching laboratory of the association of super electronics technologies (ASET) (1999-2004). He joined Nagoya University in 2009 and was promoted to an adjunct professor of the plasma nanotechnology research center (PLANT) of Nagoya University in 2012. From 2019 to 2020, he was an adjunct professor of the center of plasma nano-interface engineering (CPNE), Kyushu University. Since 2021, he has been working on plasma science and technology and graduating Ph.D. and M.S. students.

Kenji has published more than 330 papers in refereed international journals and his works have been cited over 5800 times with h-index of 37. He has also given more than 90 invited talks and holds more than 60 patents. Recently, he has served as a deputy director of the University's office of advanced semiconductor research strategies to create innovative plasma technologies for the assembly and packaging of next generation integrated circuits and is actively engaged as committee member of several plasma processing symposia involved the international symposium on dry process (DPS), International Microprocesses and Nanotechnology Conference (MNC). He currently serves as an AVS PSTD technical program committee member.