Division Chairs

Nanoscale Science & Technology

Alex Belianinov


Sandia National Labs
E-mail: alex_belianinov @ avs.org

ALEX BELIANINOV is a Principal Member of Technical Staff at Sandia National Laboratories. Alex received his Ph.D. in analytical chemistry from Iowa State University in 2012 under Patricia Thiel (Medard W. Welch Award recipient in 2014, past AVS President, AVS Fellow). He moved to Oak Ridge National Laboratory (ORNL) in 2012 as a postdoctoral research associate with Sergei Kalinin (Medard W. Welch Award recipient in 2023 and AVS Fellow) and was subsequently onboarded in 2015 at the ORNL’s Center for Nanoscale Materials Sciences as a Strategic Hire. He has received the Microscopy Today Innovation award, as well as an R&D 100 award for his work in combining machine learning with microscopy techniques. He has served as DOE BES detailee in 2020-2021 for NSRC SBIR Phase I and II projects. In 2020, he completed an MBA from the University of Tennessee.

Alex published over 150 papers with ~4500 citations and an h-index of 36. He started coming to AVS in 2009 as a graduate student, and since then stayed heavily involved with AVS serving as a committee member for the Helium Ion Focus Topic since 2016, and more recently as a committee member for the AI/ML focus topic. Alex is a co-organizer and a program committee member for the Conference on Electron, Ion and Photon Beam Technology and Nanofabrication, the International Conference on the Application of Accelerators in Research and Industry, and co-organizer for the annual Big Data in Materials Research: Bootcamp and Workshop at University of Maryland running for the last decade.

As a part of his professional services, he organized many professional workshops and symposia at MRS, MS&T, M&M, and AVS. He is on the editorial board of Micromachines and a reviewer for DOE BES, DOE ASCR, DOE SBIR/STTR, ACS journals, APS journals, JVST A/B, and MRS Bulletin. His professional interests include ion beam nanofabrication, ion implantation, imaging, and data analysis.