Eindhoven University of Technology TU/e
E-mail: erwin_kessels @ avs.org

ERWIN KESSELS is a Professor at the Eindhoven University of Technology TU/e and he is the Scientific Director of the NanoLab@TU/e clean room facilities. Erwin received his M.Sc. and Ph.D. degrees in Applied Physics from the TU/e in 1996 and 2000, respectively. His doctoral thesis work was partly carried out at the University of California Santa Barbara and as a postdoc he was affiliated to the Colorado State University and Philipps University in Marburg (Germany).

His research interests cover the field of synthesis of ultrathin films and nanostructures using methods such as (plasma-enhanced) atomic layer deposition (ALD) and atomic layer etching (ALE). With 20+ years of experience in the field of ALD, he has contributed most prominently by his work on plasma-enhanced ALD, his research related to ALD for semiconductor technology and photovoltaics, and ALD for nanopatterning (including area-selective ALD).

Erwin has won several awards – John Coburn and Harold Winters Student Award in 1999, AVS Peter Mark Memorial Award in 2007, ALD Innovation Award in 2019, and has been a fellow of the AVS since 2019. He has organized many conferences and workshops in the field of ALD and ALE, including the AVS International Conference on Atomic Layer Deposition in 2008 and the Atomic Layer Etching workshop in 2020 and 2022. Within the AVS, he served on the Executive Committee of the Plasma Science and Technology Division and the Thin Film Division, and he has served as the president of the Dutch Vacuum Society NEVAC.

Currently, Erwin is an Associate Editor of the Journal of Vacuum Science and Technology. He is also the driving force behind the AtomicLimits.com blog and the founder of the ALD Academy.