Events Calendar

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This meeting will be comprised of a series of invited talks on the theme “Quantum Science” followed by a poster session and an informal networking event.

Abstracts are now being solicited for oral and poster presentations on topics of interest within AVS: surfaces, films, materials, interfaces, vacuum techniques, electronic properties, photovoltaics, nanofabrication, energy storage, etc.

These local chapter meetings are also an ideal setting for students and early career researchers and professionals to present their research. Student participation is strongly encouraged.  Established professionals are also welcome to submit abstracts, which could include recent studies, or provide overviews of topics of general scientific interest to the Society and chapter members.

Registration for the meeting is free and will start at 4.00 PM.  Pizza, soda, and water will be provided at about 6:30 pm. At the end of the meeting, awards will be given for the best poster presentation(s).  The award winner(s) will be given a certificate from the AVS and also publicized in the AVS Newsletter.

Please email your Name, Affiliation, and email address to prices@ge.com or smentkow@ge.com to submit an abstract and to register:

• For abstracts, by May 1, 2019, follow the instructions, with the exact subject line in the email, “HMAVS Spring 2019 Abstract”.
• For registration, by April 29, 2019, with your name and affiliation, with the exact subject line in the email, “HMAVS Spring 2019 Registration”.

Please forward this announcement to your colleagues!

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The AIV XXIV Conference approaches the issues associated with materials and processing, in the research and manufacturing communities. The three-day Conference promotes a multidisciplinary environment to encourage a cross fertilization between attendees on emerging technologies.

The main topics are:

• Micro and Nano Scale Engineered Coatings and Films
• Biointerfaces and Surface Science
• Nuclear Fusion Technology
• Materials and Technologies for Additive Manufacturing
• Innovation in Large Vacuum Systems 

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AVS Western Pennsylvania Chapter Courses & Workshops 
Location*: Millennium Science Complex Penn State University Rooms N308 A&B (Posters located in Commons area) State College, PA USA 
Date: May 16, 2019 
Time: 8:00 a.m.-7:00 p.m. 
Cost: $60/Workshop; $150 for all 3 Workshops AVS Member Discount: $5/Workshop
INFO | REGISTER HERE

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The ICMCTF is internationally recognized as a vibrant technical conference that integrates fundamental and applied research focused on thin film deposition, characterization, and advanced surface modification techniques.  ICMCTF is the premier international meeting in the field promoting global exchange of information among scientists, technologists, and manufacturers.  The conference draws more than 800 attendees each year with multiple oral technical sessions and a well attended poster session which is a major component of the technical program.

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The Southern California Chapter of the AVS invites you to a presentation on Amphiphobic Coatings for Easy-to-Clean Surfaces.
The presentation will be given by Bernard Coll of Von Ardenne North America. This event will be held on Wednesday, May 22, 2019, at 6:30 pm at The Holiday Inn in Buena Park. The event includes a three course dinner (salad, dessert, and beverages included).

The presentation will discuss recent trends in the development of durable and environmentally resistant, vacuum deposited Easy-to-Clean coatings. Performance of the coatings – based on fluoro-silicon materials –will be reviewed and compared to alternative commercially available products.

Click here to see the announcement for this event

The announcement gives detailed information on the meeting, including cost details, and directions to the event. The registration form included with the announcement should be sent with your payment to reserve your place (payment may be made by PayPal or check).  Please send payment/registration form so that we receive them by May 15, 2019 to ensure your participation in this event!

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Highlight Theme: AVS Quantum Science, focus on Quantum Materials

Invited Speakers:

• Fahad Mahmood (JHU): “Measuring and Manipulating Topology in Quantum Materials with Femtosecond Light ”
• Alan Bracker (NRL): “Semiconductor Quantum Dots for Scalable Quantum Photonics"
• Josh Pomeroy (NIST): “Silicon as a Quantum Material: Advantages, Unknowns, and Early Devices”
• Hyunsoo Kim (U Md): “High Spin Superconductivity in Half-Heusler Semimetals”

Equipment Exhibit—Vacuum Hardware and Instruments

Poster Session
Open to graduate and undergrad students working in AVS research topics including:   

• Biomaterial Interfaces
• Electronic Materials & Processes
• Magnetic Interfaces & Nanostructures
• MEMS & NEMS
• Surface Science
• Thin Films
• Vacuum Technology
• Plasma Science

NIST Tours:
Special tour offerings of NIST laboratories will be available, including the NIST 2D Chemical Vapor Deposition Growth Kinetics Lab and NIST Tunnel Junction Fabrication Lab.

Pre-registration required  --  http://goo.gl/forms/DD7y3fPUII
       
RSVP deadline*  May 17, 2019           *(foreign nationals are encouraged to apply early)

Contact:  Jacob Ricker   (301) 975-4475  jacob.ricker@nist.gov
Vendors:  Doug Baker     (757) 723-6531  doug_baker@avs.org

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The 8th International Conference on Spectroscopic Ellipsometry continues the well-established ICSE series to provide an excellent forum for scientists and engineers working in instrumentation, science and applications of spectroscopic ellipsometry, and related techniques. ICSE-8 will bring together international participants from many countries and offer them the opportunity to present their latest results. Both young and experienced researchers are kindly invited to participate and interact for dissemination, discussion, and advancement of science and technology topics represented in ICSE-8. Following the high standards set by previous conferences, ICSE-8 will aim at presenting a useful balance of fundamental and applied research and industrial applications. Submission of original work is solicited.

Abstract Deadline: December 21, 2018

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The EIPBN Conference is dedicated to lithographic patterning science, nanomanufacturing process technology, and the applications these methods enable. For 61 years, and 62 meetings the conference has brought together engineers and scientists from industries and universities from all over the world to report on and discuss recent progress and future trends. 

Abstract Deadline: January 26, 2018

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The 79th Physical Electronics Conference will be held at the University of Central Florida. This topical conference provides a yearly forum for the dissemination and discussion of novel and fundamental theoretical and experimental research in the physics, chemistry, biology, and engineering of surfaces and interfaces. It includes the prestigious Nottingham Prize competition for best presentation based on doctoral research. Over 75 years the emphases of the conference have changed, yet the meeting remains centered in its basis of fundamental science at material interfaces. Central themes now include the interfaces of metals, semiconductors, ionic conductors, dielectrics, fluids, porous materials, and biomaterials.

Abstract deadline for contributed papers, if applicable: May 3, 2019

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Our local symposium draws between 100 and 200 scientists who participate in short courses, technical sessions and the vendor exhibit. The technical sessions include invited presentations by nationally recognized experts in vacuum science, surface chemistry and physics, as well as contributed presentations by Chapter members and others.

Short courses are offered on a wide variety of topics. Displays of state of the art vacuum, surface analysis, plasma etching and thin film deposition equipment from approximately 65 vendors can be found at the equipment exhibit. A substantial portion of the Symposium proceeds is channeled into a scholarship program for deserving students interested in the physical sciences. Members of the Chapter also act as judges for the New Mexico and Oklahoma State Science and Engineering Fairs, the New Mexico Junior Academy of Science and Regional Science Fairs.

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The workshop is going to highlight new capability in the field of Atomic Layer Etching, Atomic Layer Deposition and Selective Area Patterning which are of interest to the semiconductor device community for the enablement of future device fabrication technology.

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The 15th International Symposium on Sputtering and Plasma Processes (ISSP2019) will be held in Kanazawa, Japan from June 11th to 14th, 2019. This symposium has been held biennially and has gathered 135+ presentations and 210+ attendees. The topics of this symposium include 1) fundamentals of sputtering and plasma processes, 2) sputtering processes, 3) plasma processes, 4) plasma induced process technologies, 5) thin films, 6) micro- and nano-technologies, 7) applications, and 8) others. The program will consist of invited, contributed talks and poster presentations. To encourage young scientists' contributions, poster awards will be given to three outstanding poster presentations.

Abstract Deadline: January 15, 2019

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This Webinar will begin with a review of evolving growth in energy use, with specific emphasis on electricity generation and use in the United States, and expected future penetration of solar-derived energy sources. Thin-film photovoltaic (PV) technologies will be distinguished from other solar technologies, such as solar-thermal and crystalline-Si PV. Present markets and major advantages/disadvantages of thin-film PV will be identified and briefly discussed.

• Instructor: Timothy A. Gessert
• Cost: $250 (AVS Member) | $300 (Non-Member)

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The AVS 19th International Conference on Atomic Layer Deposition (ALD 2019) featuring the 6th International Atomic Layer Etching Workshop (ALE 2019) will be a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films and now topics related to atomic layer etching.  Since 2001, the ALD conference has been held alternately in the United States, Europe and Asia, allowing fruitful exchange of ideas, know-how and practices between scientists. This year, the ALD conference will again incorporate the Atomic Layer Etching 2019 Workshop (ALE 2019), so that attendees can interact freely. The conference will take place Sunday, July 21-Wednesday, July 24, 2019, at the Hyatt Regency Bellevue in Bellevue, Washington (East Seattle).

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The 6th International Atomic Layer Etching Workshop (ALE 2019) will be held in conjunction with ALD 2019
at the Hyatt Regency Bellevue in Bellevue, Washington (East Seattle).

A broad range of topics are expected.

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The 6th International Atomic Layer Etching Workshop (ALE 2019) will be held in conjunction with ALD 2019
at the Hyatt Regency Bellevue in Bellevue, Washington (East Seattle).

A broad range of topics are expected.

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The Annual Symposium of the PNWAVS Science and Technology Society will be held  at Washington State University in Pullman WA, on Sept 5-6, 2019.
 
This symposium will hold two days of invited and contributed sessions that include talks and poster presentations. A welcome reception will start the symposium on Thursday evening.  A vendor and equipment exhibit will be held during the symposium on Friday, September 6^th.

The PNWAVS symposium has a long tradition of providing a stimulating interdisciplinary program in a relaxed, informal atmosphere. The meeting attracts a broad representation of government, corporate, and university researchers from throughout the Pacific Northwest, Western Canada and Alaska.

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Call for Papers:
Oral or poster contributions on any topic of AVS interest are solicited.

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Taught by industry professionals, AVS Short courses offer training for technicians, scientists, and engineers in three broad categories:

Vacuum and Equipment Technology Topics related to vacuum and processing equipment design, operation, and maintenance.

Materials and Interface Characterization Topics covering chemical, physical, and electrical characterization of films, surfaces, particles, and interfaces.

Materials Processing Topics covering materials processing, modification, and integration.

AVS courses not only facilitate student/instructor interaction, but provide networking opportunities with your peer

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The 35th North American Molecular Beam Epitaxy Conference (NAMBE 2019) is a prominent international forum for reporting scientific and technological developments in Molecular Beam Epitaxy research. The conference showcases important results from fundamental materials and device research, through technological applications, and into high-volume and low-cost production. NAMBE features award presentations for MBE Innovator, NAMBE Young Investigator, and Best Student Paper. In addition to a diverse technical program, vendors will exhibit the latest equipment available for material growth and characterization. Exhibits will surround the coffee breaks and poster presentations, providing opportunities for discussions between attendees and vendors.

Abstract Deadline: 11 May 2019 

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An Equipment Exhibition will be given by the Southern California Chapter of AVS (SCCAVS) on Tuesday, October 1, 2019 at the Holiday Inn Buena Park Hotel & Conference Center. The Exhibition will be open from 12:00 noon to 6:00 pm. Exhibitor information will be available in Spring 2019. To learn more visit www.sccavs.org.

Short Courses: The SCCAVS will be concurrently offering a Short Course program with courses of varying topics. The Short Course Program will be held from 8:00 am to 5:00 pm from September 30 - October 2. Specific courses will be determined in Spring 2019.

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The AVS International Symposium and Exhibition has been developed to address cutting-edge issues associated with vacuum science and technology in both the research and manufacturing communities. The Symposium is a week long forum for science and technology exchange featuring papers from technical divisions and technology groups, and topical conferences on emerging technologies. The equipment exhibition is one of the largest in the world and provides an excellent opportunity to view the latest products and services offered by over 200 participating companies. More than 3,000 scientists and engineers gather from around the world to attend. Short courses are offered in conjunction with the International Symposium providing specialized training in specific areas of vacuum science and related technologies. A Career Workshop and Job Center are also offered to all attendees. The Workshop covers such topics as résumé preparation, job search skills, networking, interviewing skills, and more. The Job Center provides the opportunity for job seekers to submit their résumés and meet with potential employers.

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In conjunction with the AVS 66th International Symposium & Exhibition.

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The conference will provide a forum for colleagues from both academia and industries throughout the World to exchange results and new ideas on Secondary Ion Mass Spectrometry and related techniques. A global forum for researchers and users from academia, research organizations and industries to exchange results and new ideas on SIMS and related techniques.

The conference will cover advancements of scientific knowledge from fundamental understanding to new applications. Discussion on present possibilities and future developments of the technique, in view of the future requirements coming from technology and basic research, will be particularly solicited also with dedicated discussion sessions.

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International Symposium on Clusters and Nanomaterials, to be held in Richmond, Virginia, will focus on the roles that clusters and nanomaterials play in addressing the outstanding challenges and opportunities in clean and sustainable energy and medicine. The objective of the Richmond Symposium is to provide a multidisciplinary forum by bringing together researchers from the fields of physics, chemistry, materials science, engineering, and medicine to share their ideas and results, identify outstanding problems, and develop new collaborations.

Abstract Deadline: August 16, 2019

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Since TACT was established in December 1998, we are happy to celebrate her 20th birthday this year. This association has organized six international conferences so far, including Asia CVD 2005, TACT 2009, TACT 2011, and TACT 2013, TACT 2015, and TACT 2017. TACT2019 will be the seventh one. This TACT 2019 will be held from November 17 to 20, 2019 at National Taipei University of Technology in Taipei, Taiwan. As a continuity from 2009, 2011, 2013, 2015, and 2017. TACT 2019 is the sixth one in the row as the important biennial events for knowledge exchange and interactive platform for researchers and engineers from academia and industry. The TACT 2019 will cover a wide spectrum of aspects related to thin film and coating technologies for sustainable energy, semiconductor, optoelectronic, tribological, organic, biological, protective, and functional coatings.

Abstract Deadline: 31 August, 2019

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WINDS is an international, interactive workshop intended to provide a forum for discussion of new ideas in the broad area of nanoscience, and opportunities for interaction and networking among scientists. The conference is designed to explore the fundamental properties of nanoscale heterostructures and potential device applications, and covers a spectrum of nanoscale science, emerging materials and device technologies.

The format consists of morning and evening sessions with a blend of contributed, invited and poster presentations, with significant time available each afternoon for extended discussions. WINDS is scheduled each year for the week immediately following the US Thanksgiving holiday, to be held in Hawaii as a central location best serving the majority of attendees of historical record drawn from Pacific Rim countries. The conference General Chair rotates annually between the US, Japan and Europe.

Abstract Deadline: August 30, 2019

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The 2019 MRS Fall Meeting and Exhibit will be held in Boston, Massachusetts.  All technical sessions and non-symposia, broader impact events will be held at the Hynes Convention Center and adjacent Sheraton Boston Hotel.

Abstract Submission:
May 13, 2019–June 13, 2019

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ISVSP is a specialized meeting that gathers domestic and world-renowned scientists in the Philippines to discuss a range of technology-related topics, emerging trends, and special areas of interest in vacuum, plasma, and allied fields. It provides opportunities to entertain topics that will stretch into the future and will be vital in assisting our local industry in different fields. It aims to stimulate discussions, establish collaborations, and foster camaraderie among participants.

Abstract Deadline: August 30, 2019

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The ICMCTF is internationally recognized as a vibrant technical conference that integrates fundamental and applied research focused on thin film deposition, characterization, and advanced surface modification techniques.  ICMCTF is the premier international meeting in the field promoting global exchange of information among scientists, technologists, and manufacturers.  The conference draws more than 800 attendees each year with multiple oral technical sessions and a well attended poster session which is a major component of the technical program.

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The AVS 20th International Conference on Atomic Layer Deposition (ALD 2020) featuring the 7th International Atomic Layer Etching Workshop (ALE 2020) will be adapted into a Virtual Meeting comprised of Live and On Demand Sessions.

The ALD/ALE 2020 Virtual Meeting will kick off on Monday, June 29, 2020, with a FREE (registration required) live Plenary & ALD Innovator Award Session. Following the announcement of the ALD 2020 Awardee there will be a series of plenary and invited talks.

Paid attendees will be able to participate in the Tuesday, June 30, 2020 and Wednesday, July 1, 2020, Technical & Poster Sessions. The live sessions will feature invited and student awards talks. After each day’s live sessions, we also invite attendees to view the pre-recorded Technical & Poster Sessions On Demand. Posters will be a mix of pre-recorded (video or audio) talks and/or PDF files.

Attendees may also register for the Tutorial that is being held live over a two-day period (Tuesday, June 30-Wednesday, July 1). The Tutorial will feature three speakers each day with a live question and answer period where your chat questions can be answered. The Tutorial Session will be recorded and placed On Demand for those who paid for them until July 31, 2020.

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The IIT 2020 conference is an open forum for discussion of major challenges in current and emerging technologies related to the tools and processes for ion implantation, annealing of semiconductors and non-semiconductors, implanted devices, metrology of implanted layers and devices, as well as methods related to ion implantation.

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The AVS International Symposium and Exhibition has been developed to address cutting-edge issues associated with vacuum science and technology in both the research and manufacturing communities.

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The AVS 67 Virtual Symposium features Live Technical and On Demand Sessions on Emerging Topics Related to Materials, Processing & Interfaces.

We are working very quickly to plan for a virtual meeting so please watch for more details in the coming weeks of how presenters, attendees, and sponsors will be able to participate virtually.

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The ICMCTF is internationally recognized as a vibrant technical conference that integrates fundamental and applied research focused on thin film deposition, characterization, and advanced surface modification techniques.  ICMCTF is the premier international meeting in the field promoting global exchange of information among scientists, technologists, and manufacturers.  The conference draws more than 800 attendees each year with multiple oral technical sessions and a well attended poster session which is a major component of the technical program.

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The AVS International Symposium and Exhibition has been developed to address cutting-edge issues associated with vacuum science and technology in both the research and manufacturing communities. The Symposium is a week long forum for science and technology exchange featuring papers from technical divisions and technology groups, and topical conferences on emerging technologies. The equipment exhibition is one of the largest in the world and provides an excellent opportunity to view the latest products and services offered by over 200 participating companies. More than 3,000 scientists and engineers gather from around the world to attend. Short courses are offered in conjunction with the International Symposium providing specialized training in specific areas of vacuum science and related technologies. A Career Workshop and Job Center are also offered to all attendees. The Workshop covers such topics as résumé preparation, job search skills, networking, interviewing skills, and more. The Job Center provides the opportunity for job seekers to submit their résumés and meet with potential employers.

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The ICMCTF is internationally recognized as a vibrant technical conference that integrates fundamental and applied research focused on thin film deposition, characterization, and advanced surface modification techniques.  ICMCTF is the premier international meeting in the field promoting global exchange of information among scientists, technologists, and manufacturers.  The conference draws more than 800 attendees each year with multiple oral technical sessions and a well attended poster session which is a major component of the technical program.

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The Conference on the Physics and Chemistry of Surfaces and Interfaces will bring together experts in these diverse fields, together with device scientists and persons expert at fabricating inorganic, organic and biomaterial microstructural and nanostructural materials for semiconductor, magnetic, optical, and biological systems. Our goal will be to stimulate interactions among these scientists that lead to significant advances on the problems of technological importance in the fields of active surfaces and interfaces.

Abstract Deadline: October 4, 2019

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Dinner and Discussion Meeting - Wednesday, January 22nd (Register by January 20th)

Please join us for camaraderie, and to learn more about innovative biomaterials, surface analysis, and microscopy techniques!

Date: Wednesday January 22nd, 2020
Location: Buca di Beppo (2728 Gannon Rd., St. Paul)
Time: 4:00-7:00 pm
Cost: $25 to cover the cost of your food and drink (cash or check onsite).  Students encouraged to attend! - only $10/student

RSVP here!

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In conjunction with the AVS Publications Summit and a visit with the Publications Staff

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The NCCAVS sponsors an Annual Equipment Exhibition to showcase products and services of companies supporting vacuum-related industries. Attracting approximately 80+ exhibitors and over 700 attendees.

Largest Attendance of any AVS Chapters or Divisions. * Speaker events at capacity. * Extended hours provide ample time to engage all attendees. * Lunch, Evening Reception and Cocktails at no cost to attendees.

Held In Conjunction with:

• NCCAVS Technical Symposium
• 9^th Annual Student Poster Session

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The 2020 FLAVS Symposium will be held on March 9-10, 2020 in the Engineering Building II at the University of Central Florida in Orlando.

The Symposium will consist of a plenary lecture, technical sessions with invited and contributed presentations, a poster session including a student poster competition and an equipment exhibit for vendors to display surface analytical, vacuum, microscopy, thin film and microelectronic equipment. This symposium is sponsored by the AVS Florida Chapter (Fl AVS).

The equipment exhibit will take place in the UCF Engineering Building Atrium, in conjunction with the poster session, reception and coffee breaks.

The reception will be held on Monday evening, March 9^th, from 5:00 - ­7:00 p.m. for all symposium participants and attendees.

There is NO REGISTRATION FEE for the meeting thanks to the support of our vendors and sponsors from colleges and industry.

Registration includes daily coffee breaks, poster session refreshments, reception and a symposium booklet.

A Door Prize Drawing will be held on Tuesday, March 10th  in the Exhibitor Hall. All registered symposium attendees will be eligible to register for the drawing. Participants will need to turn in a vendor signature page to qualify for the drawing.

Symposium Registration

Exhibitor & Sponsor Registration

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Lunch - $15, free for presenting students, included with vendor table.

Speaker: Joshua Spradlin, Jefferson Lab, “Particulate generation and control for SRF at JLab”

We Invite Student Posters:
Biomaterial Interfaces
Electronic Materials and Processing
Magnetic Interfaces
Nanostructures
MEMS and NEMS
Manufacturing Science and Technology
Plasma Science
Surface Science
Thin Films
Vacuum Technology

Lunch, Poster RSVP by March 19, 2020

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The opportunities for area selective deposition (ASD) to impact several areas of materials and technological advancement are driving exciting advances. This workshop will bring together leading experts from both academia and industry to share their vision and results about fundamental aspects of surface chemistry, new processes, metrology, applications, technology needs and integration challenges for ASD. Based on a series of successful workshops at IMEC in 2019 and 2016, North Carolina State University in 2018, and Eindhoven University of Technology in 2017, the two-day program will include invited and contributed speakers and a poster session and a reception on the evening of April 2.

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Virtual Meeting

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The international Electron Ion Photon Beam and Nanofabrication (EIPBN) conference is the premier gathering of scientists and engineers who are dedicated to electron, ion and photon lithography, imaging and analysis; atomically precise fabrication; nanofabrication process technologies and related emerging technologies; and their applications in a broad spectrum of fields. This is the 64th meeting of the EIPBN, and is where researchers from academia, government laboratories, and industry from around the world meet to present and discuss recent and future trends in these technologies.

Abstract Deadline: January 17, 2020

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The Rocky Mountain Chapter of AVS will hold its annual symposium in conjunction with Surface Analysis 2020. This joint meeting will be held at the Colorado School of Mines in Golden, CO. The program is expected to provide a forum on a wide range of topics related to surface analysis, including recent advances in surface analysis techniques and best practices in characterization of a diverse range of material systems.

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Annual conference on current topics of surface and material science. Topics include structural, electronic, chemical, magnetic, or topological properties of surfaces and interfaces and thin films, chemical and molecular process at surfaces and interfaces; energetics, kinetics, and dynamics of physical, chemical, and biological transformations; interactions of organic or biological materials; effects of reduced dimensionality, confinement or patterning. The conference has an emphasis on student attendants and out of two and an half days of presentations and posters dedicates a full day to presentations of contestants of the Nottingham Prize for the best research work for a PhD thesis.

Abstract Deadline: April 5, 2020

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The 33^rd International Vacuum Nanoelectronics Conference (VIRTUAL) will be held in Lyon, France, July 6-8, 2020. The subject matter covers fundamental and applied research in the physics of electron emission and beam properties of novel nano-emitters as well as on the materials, growth, and fabrication of sources and vacuum electronic devices. The meeting starts with a day of short courses followed by four days of presentations of original research by plenary, invited and oral speakers and poster sessions. It meets every year and may be considered as the pre-eminent conference in the world on cold electron sources and their applications.

Abstract Deadline: April 10, 2020 (still open non-officially)
 

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In conjunction with a visit to AVS HQ

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Joint International Conference on International Conference on Microelectronics and Plasma Technology (ICMAP 2020) and International Symposium on Functional Materials (ISFM 2020).

Abstract Submission: February 3, 2020 to May 15, 2020

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The International Conference on Molecular Beam Epitaxy (ICMBE 2020) provides a prominent international forum for reporting new developments in the areas of fundamental and applied molecular beam epitaxy research, including advances in the technique, synthesis of new materials, discovery of new physical properties, formation of novel heterostructures, and the development of innovative devices.

Abstract Deadline: March 15, 2020

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The 12th Vacuum Technique Conference is organized by the Łukasiewicz Research Network – Tele and Radio Research Institute under auspices of the Polish Vacuum Society. The mission of the Conference is to provide a forum for presentation and exchange of research results and expertise in the field of vacuum science and techniques, vacuum technologies and their applications, characterization of surfaces and thin films. Our goal is to continue and foster cooperation within the vacuum science community.

Abstract Deadline: April 30, 2020

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In conjunction with the AVS 66th International Symposium & Exhibition

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We are pleased to continue a joint symposium between the Materials Research Society, ASM International and American Vacuum Society. Topics in materials science, processing, nanotechnology, characterization and biomaterials will be presented by invited and student contributors.

Invited speakers:

• New Solar Cell Materials David Mitzi (Duke)
• UV LEDs Heather Splawn (Kyma)
• Biological Microdevices Roger Narayan (UNC & NCSU)
• Biomedical Textiles Martin King (NCSU)

Flyer
REGISTER HERE!

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The annual PCSI conference is devoted to achieve a fundamental understanding of the physical, chemical, biological, structural, optical, magnetic and electrical properties of surfaces and interfaces. These studies include novel growth processes and interfacial phenomena, new characterization tools, transport, and functionality of the structures for future devices.

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The FCMN will bring together scientists and engineers interested in all aspects of the characterization technology needed for nanoelectronic materials and device research, development, and manufacturing. All approaches are welcome: chemical, physical, electrical, magnetic, optical, in-situ, and real-time control and monitoring. The conference will summarize major issues and provided critical reviews of important semiconductor techniques needed as the semiconductor industry moves to silicon nanoelectronics and beyond.

The conference consists of formal invited presentation sessions and poster sessions for contributed papers. The poster papers cover new developments in characterization and metrology especially at the nanoscale. The conference series began 1995 and is the 13th conference in the series.

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The International Conference on Metallurgical Coatings and Thin Films (ICMCTF 2021) will be adapted into a Virtual Conference comprised of Live and On Demand Sessions. The registration deadline is April 30, 2021; all presenters must register by March 1, 2021.

The ICMCTF 2021 Virtual Conference will kick off on Monday, April 26, 2021, with the Plenary Lecture, followed by two parallel sessions of invited talks. Each morning’s Live Sessions will follow this pattern, kicking off with a keynote talk from 10:00 – 11:00 am ET followed by two parallel sessions of invited talks, being capped off by our Awards Session on Friday, April 30, 2021.

All Registered/Paid attendees will also be able to participate in the Monday, April 26–Friday, April 30 Technical & Poster Sessions. The live sessions will feature plenary, invited and honorary lectures.  After each day’s live sessions, we invite attendees to view the pre-recorded Technical & Poster Sessions On Demand. Posters will be a mix of pre-recorded (video or audio) talks and/or PDF files.

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Overview
A joint symposium between the Materials Research Society, ASM International and American Vacuum Society. Topics in materials science, processing, nanotechnology, characterization and biomaterials will be presented by invited and student contributors.

Student Poster /Oral Sessions
A student poster session will be held. Four student submissions will be selected for 15 min oral presentation.
Space for 32 student posters to be judged. Poster size no more than 48 in by 36 in. Register online and submit electronically in advance to help with judging.  Over $2000 in prizes will be awarded.

Submission Deadline: October 29, 2021

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The AVS 23rd International Conference on Atomic Layer Deposition (ALD 2023) featuring the 10th International Atomic Layer Etching Workshop (ALE 2023) will be a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films and now topics related to atomic layer etching.  Since 2001, the ALD conference has been held alternately in the United States, Europe and Asia, allowing fruitful exchange of ideas, know-how and practices between scientists. This year, the ALD conference will again incorporate the Atomic Layer Etching 2023Workshop (ALE 2023), so that attendees can interact freely. 

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The 34th International Vacuum Nanoelectronics Conference will be held in Lyon, France, July 5-9, 2021.
The subject matter covers fundamental and applied research in the physics of electron emission and beam properties of novel nano-emitters as well as on the materials, growth, and fabrication of sources and vacuum electronic devices. The meeting starts with a day of short courses followed by four days of presentations of original research by plenary, invited and oral speakers and poster sessions. It meets every year and may be considered as the pre-eminent conference in the world on cold electron sources and their applications.

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In conjunction with a visit to AVS HQ

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In conjunction with the AVS 67th International Symposium & Exhibition

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Date: May 27, 2020
Speaker: Prof. James Whitten from UMass Lowell.

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Date: June 24, 2020
Speaker: Prof. Sally McArthur from Swinburne University of Technology.

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Nanoscale Tomographic Mapping of Hydrated Materials with Cryo-APT
May 14, 2020
1:00pm - 2:00pm EDT
Presenter: Daniel Perea
REGISTER HERE!

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Atomic Layer Etching
May 19, 2020
10:00am – 5:00pm EDT
AVS Instructor: Steven M. George
REGISTER HERE!

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Sputter Deposition
May 21, 2020
10:00am – 5:00pm EDT
AVS Instructor: Angus Rockett
REGISTER HERE!

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SPECIAL AVS Career Center Webinar – FREE!
How to Virtual Network and Find Collaborators from Afar
Presenter: Alaina G. Levine
May 28, 2020
1:00 pm – 2:00 p.m. EDT
REGISTER HERE! (FREE)

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• Instructor: Kateryna Artyushkova
• Cost: $250/person

REGISTER HERE!

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SPECIAL AVS Career Center Webinar – FREE!
Modern Resumes and CVs
Presenter: Lisa Balbes
September 29, 2020
2:00 pm – 3:00 p.m. EDT
REGISTER HERE! (FREE)

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An Equipment Exhibition will be hosted by the Southern California Chapter of AVS (SCCAVS) on Tuesday, October 6, 2020 at the Holiday Inn Buena Park Hotel & Conference Center. The Exhibition will be open from 12:00 noon to 6:00 pm. Exhibitor Registration is now available!

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The AVS International Symposium and Exhibition has been developed to address cutting-edge issues associated with vacuum science and technology in both the research and manufacturing communities. The Symposium is a week long forum for science and technology exchange featuring papers from technical divisions and technology groups, and topical conferences on emerging technologies. The equipment exhibition is one of the largest in the world and provides an excellent opportunity to view the latest products and services offered by over 200 participating companies. More than 3,000 scientists and engineers gather from around the world to attend. Short courses are offered in conjunction with the International Symposium providing specialized training in specific areas of vacuum science and related technologies. A Career Workshop and Job Center are also offered to all attendees. The Workshop covers such topics as résumé preparation, job search skills, networking, interviewing skills, and more. The Job Center provides the opportunity for job seekers to submit their résumés and meet with potential employers.

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Organic Electronics – Connecting Nature
Presenter: Magnus Berggren
August 19, 2020
1:00 p.m. – 2:00 p.m. EDT – Zoom Platform
REGISTER HERE! (FREE)

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• Instructor: Gregory Abadias
• Cost: $250/person

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• Instructors: Lara Gamble and Dan Graham
• Cost: $250/person

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The AVS 21st International Conference on Atomic Layer Deposition (ALD 2021) featuring the 8th International Atomic Layer Etching Workshop (ALE 2021) will be adapted into a Virtual Meeting comprised of Live and On Demand Sessions. The registration deadline is June 30, 2021; all presenters must register by May 1, 2021.

The event will feature: 

• Live Tutorial Session with live Q&A Chat opportunities (Sunday, June 27, 2021)
• Live Plenary, Awards, and Student Finalists with live Q&A Chat opportunities (Monday, June 28, 2021)
• Live Parallel Technical Sessions with live Q&A Chat opportunities (Tuesday-Wednesday, June 29-30, 2021)
• On Demand Oral Sessions (Starting Monday, June 28, 2021)
• On Demand Poster Sessions with a Mix of Pre-recorded (Video or Audio) Talks and/or PDF files
• Live and On Demand Sessions available on Mobile App/Online Scheduler through July 31, 2021 and then to AVS members in the AVS Technical Library

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The American Vacuum Society (AVS)  is excited to announce the AVS 2020 International Twitter Poster Competition, a new online venue to share your research with a global audience. We hope you will join us to disseminate your latest findings, connect with your research community, and meet new colleagues.

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Presenter: Alaina G. Levine

Learn from a STEM careers consultant how to execute an interviewing plan to help you land that dream job. We’ll look at what you should be doing before, during, and after the interview, how to adjust different elements of a virtual experience (such as light and sound), how to look professional on camera, and more. Brought to you by Physics Today and AVS Science and Technology.

Alaina G. Levine is an award-winning entrepreneur, STEM career consultant, science journalist, professional speaker and corporate comedian. She is the author of Networking for Nerds (Wiley, 2015), and writes "Your Unicorn Career", a career column for Science/ScienceCareers. She holds bachelor’s degrees in mathematics and anthropology with a certificate in Middle Eastern Studies from the University of Arizona, and studied at the American University in Cairo as a US Department of Defense Boren Fellow.

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Career Center Webinar
Career Planning in a Crisis: How to move your career forward
Presenter: Alaina G. Levine
September 15, 2020
1:00 pm – 2:00 p.m. EDT
REGISTRATION COMING SOON!

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The 31st Annual Symposium of the PNWAVS Science and Technology Society (www.pnwavs.org) will be a virtual meeting hosted by EMSL located at Pacific Northwest National Laboratory in Richland, WA. The meeting will consist of two days of invited talks, plenary speakers, and student presentation competitions.
 
The PNWAVS symposium has a long tradition of providing a stimulating interdisciplinary program in a relaxed, informal atmosphere. The meeting attracts a broad representation of government, corporate, and university researchers from throughout the Pacific Northwest, Western Canada and Alaska.

This virtual symposium will adopt a different format than our traditional meetings.  All content will be streamed via Zoom, and a Discord channel will be available to facilitate real-time text chat between attendees.

There will be a student presentation competition for undergraduate and graduate students. If you wish to participate in the competition, please indicate the level (undergraduate or graduate) on your abstract and show it in the first presentation slide.
A cash award of $500 plus $500 towards expenses to attend the International AVS Symposium will be given to the winner of the graduate competition. A cash award of $250 will be given to the winner of the undergraduate competition. Cash awards will also be given to the 2nd and 3rd place winners from both competitions.

Registration is free, but all attendees must register in advance. The online registration will be available at www.pnwavs.org.  If you have any questions about registration, please contact Shuttha Shutthanandan by email (shuttha@pnnl.gov) or phone at 509-371-6530.

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The 5th U.S. Gallium Oxide Workshop (GOX 2022) will be held in the Washington, D.C. area on August 7-10, 2022 to highlight domestic research in the rapidly emerging field of Ga2O3 and related materials with high critical field strength. The purpose of this workshop is to provide a premier platform for reporting recent advances in materials and device development and identify scientific gaps remaining. The intent is to create actionable coordination across government, industry and academia to enable rapid transitional technologies in this field.  There will be no written proceedings in order to facilitate a friendly and stimulating environment for scientific discussions among participants from domestic and international Ga2O3 research groups.  Attendees can expect topics including, but not limited to: bulk and epitaxial growth, theory/modeling/simulations, device and circuit advancements, materials characterization and novel properties, and heterostructures.

GOX 2022 will consist of two and a half days of presentations by invited and contributed speakers, as well as two evening poster sessions where the latest Ga2O3 results can be discussed. The Workshop will be preceded by a welcome reception beneficial for networking with others in the field and establishing new collaborations.

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Date: Monday, September 14, 2020 (online) | 1-5 pm (Central), 2-6 pm (Eastern) 

• Each poster presenter will have the option to present their poster in any combination of:
  • Twitter post of poster as GIF, PNG, or JPG file at about 2 pm. Questions and discussion using comment functions in Twitter until 5 pm. #AVSPrairie2020
  • Prerecorded video presentation on YouTube or another server
  • Host a live video conference room to present and discuss
• Each presenter will be asked to record a 1 minute video to describe the topic, motivation, and central question of their research. These will be shown at the start of the poster session to advertise each poster.
• The online conference program will contain a live directory of links to the Twitter posts, video presentations, and zoom discussion rooms.

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The AVS Pacific Rim Symposium on Surfaces, Coatings and Interfaces (PacSurf 2022) will be held on the Big Island of Hawaii from December 11 – 15, 2022. This conference is being organized by AVS (United States) with a Steering Committee composed of representatives from Australia, Canada, China, Japan, Korea, Mexico, New Zealand, Philippines, Singapore, Taiwan, and the United States. Symposium attendees will interact during morning and evening sessions that will include plenary, invited, and contributed presentations.The main topics for PacSurf 2022 will be focused on the latest advances in Biomaterial Surfaces & Interfaces, Energy Harvesting & Storage,  Nanomaterials, Plasma Processing, and Thin Films. We will have morning and evening technical sessions with the afternoons free for other activities and discussions.

The conference will be held in the Waikoloa Beach Marriott Resort and Spa on the Big Island of Hawaii.  We are confident you will benefit by attending PacSurf 2022 and networking with the other attendees.

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Controlling Contamination in Vacuum Systems
November 16, 2020
10:00 a.m. - 5:00 p.m. EDT
Instructor: Tim Gessert
REGISTER HERE!

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Plasma-Enhanced CVD: Fundamentals, Techniques and Applications
November 19, 2020
10:00 a.m. - 5:00 p.m. EDT
Instructor: Robert Grubbs
REGISTER HERE!

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Vacuum Leak Detection and Basic Troubleshooting
November 18, 2020
10:00 a.m. - 5:00 p.m. EDT
Instructor: Neil Peacock
REGISTER HERE!

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The AVS 22nd International Conference on Atomic Layer Deposition (ALD 2022) featuring the 9th International Atomic Layer Etching Workshop (ALE 2022) will be a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films and now topics related to atomic layer etching.  Since 2001, the ALD conference has been held alternately in the United States, Europe and Asia, allowing fruitful exchange of ideas, know-how and practices between scientists. This year, the ALD conference will again incorporate the Atomic Layer Etching 2022 Workshop (ALE 2022), so that attendees can interact freely. The conference will take place Sunday, June 26 - Wednesday, June 29, 2022, at the International Convention Center in Ghent, Belgium.

As in past conferences, the meeting will be preceded (Sunday, June 26) by one day of tutorials and a welcome reception. Sessions will take place (Monday-Wednesday, June 26-29) along with an industry tradeshow. All presentations will be audio-recorded and provided to attendees following the conference (posters will be included as PDFs). Anticipated attendance is 600+.

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Date: Tuesday, March 2, 2021
Time: 1:00 p.m.-5:00 p.m. EST

In this webinar, fabrication of thin films on polymer substrates, the theories of electro-mechanical testing, various in-situ methods to characterize electro-mechanical behavior, and how material engineering can be used to design long-lasting flexible systems will be presented. Both monotonic and cyclic testing methods will be discussed and an outlook on the field will be provided. This webinar is aimed at being a practical guide to help one understand the basics of thin film deposition onto polymers, electro-mechanical testing methods, and the strengths and weaknesses of flexible thin film systems.

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Date: Tuesday, January 26, 2021
Time: 1:00 p.m.-5:00 p.m. EST

Advanced MRAM consists of dense arrays of millions to billions of nano-pillars patterned from magnetic tunnel junction thin films, each with a diameter of 20-100nm. In common integration schemes, each nanopillar is electrically connected to a bottom and a top electrode with a pillar pitch of <500nm. The advanced magnetic tunnel junction (MTJ) thin film itself consists of more than 10 single layers with individual thicknesses down to a few Angstroms in certain cases. Combining the relatively complicated MTJ structure with specialized patterning processes is a challenge for the development of advanced MRAM. The goal of this webinar is to give an overview of the thin film growth and stack design for advanced MTJs along with basic integration process steps.

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Date: Wednesday, February 10, 2021
Time: 1:00 p.m.-5:00 p.m. EST

Atomic Layer Deposition (ALD) has become a key technology in both the lab and the fab with many devices and other applications benefiting from the (ultra)thin films that can be prepared with very precise thickness control and with unparalleled conformality and uniformity. Nowadays, a significant number of the ALD processes employed are so-called plasma-assisted or plasma-enhanced ALD processes. In the last decade, this method has faced a real breakthrough in high-volume manufacturing and an extensive set of processes and reactor designs have been demonstrated. Yet the reasons why and when to use plasma-assisted ALD are often not clear as well what kind of plasma configurations to use and which conditions to apply. Also, misconceptions about the implications of using plasmas during ALD exist, for example with respect to plasma damage and limitations of conformality. This webinar will address these aspects starting with the basics of ALD and plasma-based processing and will range up to the applications that can benefit from plasma-assisted ALD.

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Atomic layer etching (ALE) is based on sequential, self-limiting reactions that yield controlled etching at the atomic level.  ALE is critical for atomic layer processing that is increasingly important for nanoscale fabrication.  The course will cover both plasma ALE and thermal ALE.  Process strategies will be described that are useful for many applications including advanced semiconductor processing.

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This virtual conference, taking place December 8, 2020,  will draw from cutting edge research in material science; topics include structural, electronic, chemical, magnetic, or topological properties of surfaces and interfaces and thin films; electron correlation or processes of energy, electron, ion, and molecular transfer at surfaces and interfaces at surfaces and interfaces; energetics, kinetics, and dynamics of physical, chemical, and biological transformations; interactions of organic or biological materials; mechanisms of film growth, effects of reduced dimensionality, confinement or patterning. Presentations of PhD thesis research, made by student contestants for the prestigious Nottingham prize ($1,500), are highlighted.

Abstract deadline for contributed papers, if applicable: October 15, 2020

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The Southern California Chapter of the AVS invites you to a presentation on Flexible Nano-porous Template for A Reusable Anti-COVID-19 Face Mask.

The presentation will be given by Professor Muhammad Mustafa Hussain, of the King Abdullah University of Science and Technology and UC Berkeley. It will be presented as a FREE Zoom Webinar on Wednesday, October 21, 2020, at 7:00 pm (PDT) at The Holiday Inn in Buena Park.

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WINDS is a week long, international, and interactive workshop designed to explore the fundamental properties of nanoscale devices and applications thereof. It provides a forum for researchers in material, device, and characterization science, both experimental and theoretical, to interact. This breadth of expertise reflects the technical challenges in developing nanoscale devices and material systems, since every device is a heterostructure of one form or another and the properties of the interfaces often determine the functionality and properties of the nanoscale system.

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Since TACT was established in December 1998, we are happy to celebrate her 20th birthday this year. This association has organized six international conferences so far, including Asia CVD 2005, TACT 2009, TACT 2011, TACT 2013, TACT 2015, , TACT 2017 and TACT 2019. TACT 2021 will be the eighth one, which will be held from November 15 to 18, 2021 at National Taipei University of Technology in Taipei, Taiwan.

TACT 2021 is an important biennial event for knowledge exchange and interactive platform for researchers and engineers from academia and industry. TACT 2021 will cover a wide spectrum of aspects related to thin film, coating and plasma technologies for sustainable energy, semiconductor, optoelectronic, flexible device,  tribological, organic, biological, protective and functional coatings.

Abstract Submission Deadline: July 15, 2021

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Since we are unable to hold our traditional in-person symposium this fall, we hope you will be able to take your lunchbreak with MN-AVS and enjoy our upcoming seminar series.  Our first seminar will take place on Thursday November 12 from Noon - 1 pm.  Details below.

"The study of perovskite solar cell performance heterogeneities at the nanoscale"
Dr. Beth Tennyson
Marie Currie Fellow, Cambridge University

Abstract: The functionality of halide perovskite solar cells at the micro- and nanoscales is heterogeneous, and it is critical to determine how the local electrical and chemical properties affect overall photovoltaic (PV) efficiency. In this presentation, we begin by showing a variety of nanoscale microscopy methods applied to perovskite semiconductors to analyze the local performance of the material. These results reveal that the perovskite’s nanoscale voltage response depends on its chemical composition, the perovskite's charge carrier dynamics depend on the incident photon energy (i.e. wavelength), and that altered chemical properties due to the inclusion of potassium additives impacts the electrical response in three dimensions. Further, we measure the photon out-coupling of a perovskite material on an underlying c-Si textured design (for multi-junction solar cell device applications) and discover a spectral and spatial dependence of the geometrical patterning which dominates the perovskite typical grain-to-grain radiative recombination variation. Such heterogeneity suggests that tuning the surface morphology in tandem PVs could lead to a homogenization of the perovskite’s photoluminescence emission.

Zoom login information:

Topic: MN-AVS Brownbag Seminar
Time: Nov 12, 2020 11:30 AM Central Time (US and Canada)

Join Zoom Meeting
https://uwlax-edu.zoom.us/j/85862692103?pwd=RkZuT0wwM1lnWTByTUF0NHVhUEFiZz09

Meeting ID: 858 6269 2103
Passcode: 516898

Please feel free to share this information with any friends and colleagues who may be interested in attending, and do not hesitate to contact me with any questions.

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This one day version of the course will covers plasma-assisted etching phenomena and equipment in a manner that will assist the attendee in understanding and developing plasma etching and RIE processes. The emphasis will be on the fundamental physical and chemical processes that determine the consequences of a reactive gas plasma/surface interaction. The role of energetic ions as encountered in RIE systems and the factors that influence anisotropy of etching will be described. Many kinds of plasma-assisted etching equipment will be discussed, including capacitively coupled, inductively coupled, and wave-generated plasma sources.

In addition there will be discussion on the applied aspects of plasma-assisted etching. Emphasis will be on mechanistic understanding as opposed to specific processing issues, recipes, and problems.

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This course provides a comprehensive description of all vacuum pumps currently used in industry, research and development. Roughing, high and ultrahigh vacuum pumps will be described. The two primary pumping mechanisms, throughput and capture, will be explained. Criteria for selecting pumps will be examined and performance specifications illustrated to assist the user in designing and operating pumping systems. A complete listing of commercially available pumps will be provided.

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This course provides an understanding of the cause and effect of changes in sputtering parameters on the energetics of the sputtering and deposition processes and their relationship to film properties. The energy and distribution of species ejected from the target are discussed. The effect of the sputtering system on material transport to the substrate and subsequent film deposition is also discussed for films of metals, alloys, and compounds. The parameters of different sputtering systems (diode, triode, magnetron, and ion guns) with DC and RF power supplies are discussed with respect to film properties.

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NCCAVS 2021 Technical Symposium
Details Available on the NCCAVS User Group Website

NCCAVS Annual Equipment Exhibition (Postponed until 2022)
Annual Student Poster Competition (Postponed until 2022)

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Our second lunchtime seminar will be held on Tuesday, December 8th from Noon - 1pm.  Details below.

"Introducing Solid Carbon Monoxide: A 2D Material with Unique Physical and Electronic Properties"
Dr. Carol J. Hirschmugl
Department of Physics, UW - Milwaukee
CEO, COnovate

Zoom login information:

Topic: MN-AVS Lunchtime Seminar: Dr. Carol Hirschmugl
Time: Dec 8, 2020 12:00 PM Central Time (US and Canada)

Communicate with Seth T. King regarding the Zoom  details.

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Beta-Gallium Oxide is an emerging ultra-wide band gap semiconductor with a predicted critical breakdown field much higher than the commercial wide band gap semiconductors such as Gallium Nitride and Silicon Carbide. The key attractive feature is the availability of single crystal large area bulk substrates. This webinar will begin with the motivation for pursuing research on ultra-wide band gap semiconductors for applications in power electronics and high frequency electronics. State-of-the-art progress in bulk crystal growth, epitaxy and ion implantation will be reviewed. Strategies to maximize breakdown voltage in lateral Gallium Oxide MOSFETs, vertical diodes and transistors will be discussed. The main theme of the webinar will be to highlight and discuss the interrelationship between material properties, material processing and device performance. The future outlook for Gallium Oxide in achieving its theoretical potential, as well as the key challenges & limitations, will also be discussed.

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Developments in nanoelectronics and nanoscale surface modification continue to drive the need for more elegant and reliable bottom-up area selective deposition (ASD) strategies. Many technology fields increasingly focus on developing new strategies for ASD, including sub-10 nm next generation devices, mixed-material catalysts, new optical devices, and materials for energy storage. This three-day virtual workshop will gather leading experts from academia and industry. Themes addressed include: fundamental challenges related to recent developments in ASD, applications for ASD in next-generation technology, emergent processes for implementing ASD techniques, and new perspectives on metrological and characterization strategies for further understanding persistent mechanistic challenges.

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The ICMCTF is internationally recognized as a vibrant technical conference that integrates fundamental and applied research focused on thin film deposition, characterization, and advanced surface modification techniques.  ICMCTF is the premier international meeting in the field promoting global exchange of information among scientists, technologists, and manufacturers.  The conference draws more than 800 attendees each year with multiple oral technical sessions and a well attended poster session which is a major component of the technical program.

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Agenda:
2:30 – 3:30 pm     Keynote presentation and Q&A
3:30 – 4:00 pm    Open floor discussion on AVS-NE Chapter activities

Keynote Talk: “Bugs BeGone – Approaches to Prevent and Treat Infections”
Dr. Melissa Reynolds – Colorado State University

The epidemic of multidrug resistant bacteria necessitates the development of new materials to inhibit bacterial infections, both in solution and on surfaces. This presentation will focus on holistic approaches for addressing bacterial infections associated with implanted medical devices. Effective prevention and treatment of infections related to implantable medical devices requires the fabrication of surfaces with long lasting antibiotic character, as the lifetime of the device is related to the lifetime of the patient. Towards this goal, the fabrication of polymers with metal-organic framework additives and the ability of these materials to prevent the attachment of bacteria on their surfaces will be presented.  Additionally, methods that first detect bacteria in solution and then “turn-on” anti-bacterial activity will be presented. Multifunctional materials that can inhibit bacterial attachment, detect bacteria, and kill bacteria may prove valuable in long-term implantable materials.

Melissa Reynolds, Ph.D., serves as the Associate Dean for Research in the College of Natural Sciences and is a Professor in Chemistry and Biomedical Engineering at Colorado State University. She received a BS in Chemistry from Washington State University and a PhD from the University of Michigan and worked for a translational biomedical device company before joining CSU in 2009. Her research interests are in improving medical device technologies to improve patient outcomes. Her group is highly multidisciplinary and collaborative working in the areas of metal organic frameworks as biocatalysts, antibacterial materials, and biosensors. She has been recognized as an emerging investigator by the Journal of Materials Chemistry, a Webb-Waring Biomedical Research Early Career Award, NSF CAREER Award and Monfort Award.  The group’s research on metal organic frameworks received a 2013 TechConnect National Innovation Award. Her research has been funded by NSF, NIH, DOD, Boettcher Foundation, state funding and corporate funding.

Please contact Necmi Biyikli or Marco Hopstaken for Zoom details.

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The series of international symposia entitled “Atomic Level Characterization (ALC)” focus on practical applications of atomic level characterization (both atomic dimensions and energy levels) of new materials and devices, including bio- and organic materials as well as inorganics. Descriptions of new applications and instrumentation for various analytical techniques of surface and interface analysis are solicited in these symposia. The goal is to promote stimulating discussions among researchers specializing in different probe methods. The symposium also encourages discussion of fundamental problems to be solved in the further development of atomic level characterization of materials, including approaches based on theory and simulations.

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The 37th North American Molecular Beam Epitaxy Conference (NAMBE 2023) is a prominent international forum for reporting scientific and technological developments in Molecular Beam Epitaxy research. The conference showcases important results from fundamental materials and device research, technological applications, and production. NAMBE features award presentations for MBE Innovator, Young Investigator, and Best Student Paper. Vendors will exhibit the latest equipment available for material growth and characterization. Exhibits will surround the coffee breaks and poster presentations, providing opportunities for discussions between attendees and vendors. Short topical workshops are also being considered the day before the main conference.

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The AVS International Symposium and Exhibition has been developed to address cutting-edge issues associated with vacuum science and technology in both the research and manufacturing communities. The Symposium is a week long forum for science and technology exchange featuring papers from technical divisions and technology groups, and topical conferences on emerging technologies. The equipment exhibition is one of the largest in the world and provides an excellent opportunity to view the latest products and services offered by over 200 participating companies. More than 3,000 scientists and engineers gather from around the world to attend. Short courses are offered in conjunction with the International Symposium providing specialized training in specific areas of vacuum science and related technologies. A Career Workshop and Job Center are also offered to all attendees. The Workshop covers such topics as résumé preparation, job search skills, networking, interviewing skills, and more. The Job Center provides the opportunity for job seekers to submit their résumés and meet with potential employers.

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Career Consultant: Lisa Balbes, Balbes Consultants LLC
Panelists:
Andy Antonelli, Senior Director & Fellow, Onto Innovation, Inc.
Susan Sinnott, Department Head, Materials Science and Engineering, The Pennsylvania State University
Lee Howell, Vice-President – Process Equipment Division, Kurt J. Lesker Company

Receiving a job offer is a wonderful feeling, and the highlight of a long and often painful job search process. You may be tempted to accept the offer as is and be done with it. But no matter how generous the offer, there will always be something to discuss and negotiate.

This workshop will help identify what you can negotiate (much more than just salary), and how to conduct a positive, professional negotiation that leaves both parties happy. It will also provide tips on related topics such as when you are asked to provide your requirements first, and how to approach renegotiations once already in a position.

The session will begin with a presentation from a professional career consultant, followed by panelists who will talk about their own experiences and advice from both sides of the negotiating table.

REGISTER HERE!

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Career Consultant: Lisa Balbes, Balbes Consultants LLC

This workshop will discuss the culture of industry, what it takes to be successful in that sector, and how careers in industry can differ from careers in academia.  It will help you prepare for knowing what to expect and what steps to take before making the change, and will also provide tips on how to conduct an effective job search in industry.  The session will begin with a presentation from a professional career consultant, followed by panelists with diverse careers who have undergone this transition who will talk about their careers and what they have learned along the way.

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Join us on March 16, 2021 at 2:00 p.m. EST for an introduction to the Chapters, Divisions, and Groups (CDG) that constitute the backbone of the AVS. At this FREE 1-hour information session, you will learn about the different roles of the CDG and how they can help you develop professionally. You will also be able to connect with CDG representatives that can answer your questions and help you find opportunities to get involved. We look forward to seeing you and your colleagues at this event!


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The first part of the course will cover the basics of plasma ALE.  Si ALE will be described as the model plasma ALE system defined by chlorination and Ar+ ion sputtering.  Other plasma ALE systems will be discussed such as SiO2, Si3N4 and HfO2 ALE.  The second part of the course will cover the basics of thermal ALE.  Al2O3 ALE will be developed as the model thermal ALE system based on fluorination and ligand-exchange reactions.  Other thermal ALE systems will be discussed such as TiN, SiO2 and Si ALE.

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Vacuum systems can present a variety of hazards to the laboratory worker.  This course will provide an in-depth discussion of a wide variety of hazards and mitigation techniques related to vacuum systems.  A thorough discussion of the interface between the vacuum system and commonly associated pressure sources will be provided.  Potential accidental overpressure of the vacuum system will be emphasized as well as safety concerns for the use of brittle materials in vacuum applications.

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This course provides the basic training required to interpret Residual Gas Analyzer (RGA) data and produce actionable information for process control applications. The operation of an RGA is described, with specific attention dedicated to the multiple tuning parameters available to RGA operators. Routine calibration, tuning and maintenance procedures are discussed.

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The course begins with a definition of vacuum and a description of the physical conditions existing in a vacuum environment. Following this introduction will be a discussion of gases at low pressures and the interactions between gases and solids. The phenomena of gas flow though vacuum systems will then be examined. The primary components of vacuum systems, with an emphasis on pumps and gauges, will be described.

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This course deals with the principal aspects of system design, including materials selection, fabrication techniques, pump selection, sizing pumps and vacuum piping to a chamber, determining pumpdown time, leak rate specification, and surface preparation procedures. Methods for determining ultimate pressures are also discussed.

REGISTER HERE!
 

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Abstracts are now being solicited for oral and ‘poster’ presentations on topics of interest within AVS.

Participation in a local AVS chapter provides an excellent opportunity to interact in a smaller venue compared to the larger national conferences, affording the participants time to focus on presentations of scientific work that is happening in our immediate geographic proximity, along with ample time for professional networking.

These local chapter meetings are also an ideal setting for students and early career researchers and professionals to present their research. Student participation is strongly encouraged and we will introduce a new format including short presentations as a remote alternative to our usual poster session. 
 

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What topics of Nanoscience would you like to see at conferences? The Nanoscale Science and Technology Division wants to hear about it! We invite scientists of all career stages and nano-disciplines to join us for a one-hour Zoom session to propose and discuss new themes to be incorporated into the NSTD programming in coming years. Don’t miss this opportunity to help us build the future, learn where nanoscience is going, and contribute your own ideas to help guide it forward. The insights gained from this meeting will help sculpt the program committee and scientific program for the NSTD for AVS 68. If you’d like to be part of this initiative, please join us to start the process:

Thursday, April 29, 2021, 11:00 am EDT (UTC -4).

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We have two upcoming virtual events to bring to your attention – AVS Mid-Atlantic Virtual Chapter Meeting and XPS Curve Fitting Webinar by Physical Electronics.

We are excited to invite you to join us at the 2021 AVS Mid-Atlantic Virtual Chapter Meeting. We will host two days of technical talks with vendor spotlights on April 22-23, 2021.  

Please visit the Mid-Atlantic Meetings page for more information.

Please contact Sujitra Pookpanratana if you have any questions.

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Date: Wednesday, March 31, 2021 | 4 pm (Central), 5 pm (Eastern)
Speaker: Julie G. Ezold, Oak Ridge National Laboratory
Title: Heavy Actinide Production Program at Oak Ridge National Laboratory

The next virtual Student Chapter Meeting of the Prairie Chapter of the AVS: Science and Technology of Materials, Interfaces, and Processing will take place on Wednesday, March 31, 2021 at 4 pm central/ 5 pm EDT. The speaker will be Julie G. Ezold from Oak Ridge National Laboratory.  She is the Radioisotope Production and Operations Section Head.  You will have an opportunity to discuss the talk afterwards with everyone in attendance at the virtual meeting.

Join the online Google Meeting.

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Facing challenges fabricating a nanoscale device? Having difficulty with a complicated process step? Then join fabrication experts in the Nanoscale Science and Technology division of the AVS in the inaugural Nanofabrication Discussion Session.
This event is open to all levels of experience (from no experience to seasoned professionals). We will focus the discussion on various ways of realizing nanofabricated devices and avoid discussions on the merits of any proposed device. Also, corporate promotions are prohibited.
This event will be a discussion amongst nanofab enthusiasts aiming to help anyone who is looking for advice on the creation of a nanoscale device.

Thursday, May 20, 2021, 11:00 AM - 12:00 PM CDT (UTC -5) or 12pm – 1pm EDT (UTC -4).

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The AVS 24th International Conference on Atomic Layer Deposition (ALD 2024) featuring the 11th International Atomic Layer Etching Workshop (ALE 2024) will be a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films and now topics related to atomic layer etching.  Since 2001, the ALD conference has been held alternately in the United States, Europe and Asia, allowing fruitful exchange of ideas, know-how and practices between scientists. This year, the ALD conference will again incorporate the Atomic Layer Etching 2024 Workshop (ALE 2024), so that attendees can interact freely.

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The 2022 International Conference on Secondary Ion Mass Spectrometry (SIMS 23) will be held September 18-23, 2022, at the Hyatt Regency Minneapolis in Minneapolis, Minnesota, USA. SIMS 23 will provide a forum for colleagues from academic, industrial, and national laboratories throughout the world to exchange results and new ideas on Secondary Ion Mass Spectrometry and related techniques.

The conference will cover advancements of scientific knowledge from fundamentals to applications. In light of future requirements coming from technology and basic research, updates on present possibilities and future developments of the technique are particularly solicited for dedicated discussion sessions.

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In conjunction with the AVS Publications Retreat and visit to the new Publications Office

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In conjunction with a visit to AVS HQ

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Virtual Meeting

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In conjunction with the AVS 68th International Symposium & Exhibition

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Developments in nanoelectronics and nanoscale surface modification continue to drive the need for more elegant and reliable bottom-up area selective deposition (ASD) strategies. Many technology fields increasingly focus on developing new strategies for ASD, including sub-10 nm next generation devices, -material catalysts, new optical devices, and materials for energy storage. This two-day workshop will gather leading experts from academia and industry. Themes addressed include: fundamental challenges related to recent developments in ASD, applications for ASD in next-generation technology, emergent processes for implementing ASD techniques, and new perspectives on metrological and characterization strategies for further understanding persistent mechanistic challenges.

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Physical Electronics Conference and Nottingham Prize Competition. This year it will be a half-day virtual event focusing on the Nottingham Prize competition.

Abstract Deadline: May 9, 2021

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Presenter: Lucille A. Giannuzzi, Ph.D., FAVS, FMSA, FMAS, President, L.A. Giannuzzi & Associates LLC

Different FIB source technologies will be introduced. The basics of ion-solid interaction theory will be discussed, including use of ions for different applications and understanding ion implantation damage and how to mitigate it. The expanding applications of plasma FIB instruments compared to traditional Ga+ ion FIBs will be emphasized.  Ion patterning and delayering of semiconductor devices will be presented, and the use of FIBs for nano- and micro- prototyping, including applications for mechanical testing will be presented.  Large area 2D sectioning and 3D FIB-SEM tomography will be covered. FIB methods for S/TEM and APT specimen preparation will be discussed in detail.

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Join us for an AVS Publications “Meet the Editors” Event hosted by Dr. Eray Aydil, AVS Editor-in-Chief. During this event, updates on all AVS journals will be given and there will be journal trivia with opportunities to win Amazon gift cards.

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We will be holding our virtual MN-AVS Annual Fall Symposium on Wednesday, September 15, 2021.

This year's virtual symposium will include oral and poster contributions from students only. We invite both undergraduate and graduate students to participate. All students will be automatically enrolled into competition
for best Talk and Poster. Awards will include cash certificate and free AVS membership.

Abstract submission is via email only!
Each abstract should be a maximum of a single page in length. A second page containing figures or illustrations that support the abstract results may also be submitted. The abstract should be submitted as a MS Office Word document.

Please submit your abstract to Kateryna Artyushkova @ Kateryna_Artyushkova@avs.org.

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The 9th International Symposium on Functional Coatings and Surface Engineering will take place virtually on June 14-17, 2021.

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The International Conference on Molecular Beam Epitaxy provides a prominent international forum for reporting new developments in the areas of fundamental and applied molecular beam epitaxy research, including advances in the technique, synthesis of new materials, discovery of new physical properties, formation of novel heterostructures, and the development of innovative devices.

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The Southern California Chapter of the AVS invites you to a lecture on The Search for Habitable Planets via the Solar Gravitational Lens.

The presentation will be given by Dr. Henry Helvajian of The Aerospace Corporation. It will be presented as a FREE Zoom Webinar on Tuesday, June 29, 2021, at 11:00 am (PDT).

REGISTER HERE!

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The 36th North American Molecular Beam Epitaxy Conference (NAMBE 2022) is a prominent international forum for reporting scientific and technological developments in Molecular Beam Epitaxy research. The conference showcases important results from fundamental materials and device research, through technological applications, and into high-volume and low-cost production. NAMBE features the presentations of the MBE Innovator Award, the NAMBE Young Investigator Award, and the Best Student Paper awards.  In addition to a diverse technical program, vendors will exhibit the latest equipment available for material growth and characterization. The exhibit will surround the coffee breaks and poster presentations, providing many opportunities for discussions between attendees and vendors.

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Course Objectives

• Know the basic concepts of plasma etching.
• Understand the physics of RF glow discharges (both high and low density).
• Understand the surface science aspects of reactive ion etching (RIE).
• Learn about plasma-surface chemistry leading to etching.
• Recognize the factors that influence etching anisotropy.

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An Equipment Exhibition will be hosted by the Southern California Chapter of AVS (SCCAVS) on Tuesday, September 28, 2021 at the Holiday Inn Buena Park Hotel & Conference Center. The Exhibition will be open from 12:00 noon to 6:00 pm.

(Short Courses September 27 – 29)

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This talk will describe the key ideas and present some of the most recent device examples, including wireless, battery-free electronic 'tattoos' with applications in continuous monitoring of vital signs in maternal, fetal, neonatal and pediatric care; and microfluidic/electronic platforms that can capture, manipulate and perform biomarker analysis on microliter volumes of sweat, with applications in medical diagnostics and sports performance.

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Course Objectives

• Real vs virtual leaks
• Leak rate specifications
• Different leak detection methods
• How a mass spectrometer leak detector works
• Care and feeding of a mass spectrometer leak detector
• Basic ways to use a mass spectrometer leak detector
• What to do when a leak is found
• Possible steps when a system passes leak test but has sub-par performance
• Sources of gas that can affect vacuum system performance
• Ways to mitigate gas sources

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Course Objectives

• Learn the fundamentals of ALD based on sequential self-limiting surface reactions.
• Understand the important advantages of ALD and comparison with CVD.
• Learn about ideal and non-ideal ALD and thermal and plasma-enhanced ALD.
• Understand how ALD surface chemistry and growth are studied using in situ probes.
• Learn how ALD can be utilized for thin film nanoengineering.
• Understand the many current and potential applications of ALD.

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Course Objectives

• Learn about the types of commercially available vacuum pumps and their performance specifications.
• Learn how each pump works and what maintenance is required.
• Understand how to select a pump or pumps for a given application.

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Course Objectives

• Understand the three phases of vacuum chamber contamination: gases, films, and particulates.
• Learn the origins of vacuum chamber contaminants and methods for controlling or eliminating them.

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Course Objectives

• Understand the fundamentals of sputter deposition
• Review and discuss options for sputtering system design
• Learn how rf sputtering differs from dc sputtering and understand how rf sputtering works
• Understand reactive sputtering
• Understand thin film properties are modified by adjusting sputtering parameters

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Course Objectives

• Provide the basic knowledge required to interpret mass spectrometer (RGA) data, in vacuum applications ranging from UHV to atmospheric pressures.
• Presentation of elementary atomic electron structure
• Describe the filling of the electronic shells and sub shells
• Discuss molecule formation and the different types of molecular bonds
• Discuss operation of a mass spectrometer including its major components, i.e. ion source, mass separator, and detector and especially phenomena that occur in the ion source
• Discuss interpretation of the mass spectrometer spectra by presenting typical spectra for many common molecules and analysis of gas samples containing many different molecules
• Various types of analysis techniques are presented and many existing data bases are suggested
• Discuss chemical interactions between mass spectrometers and the sampled gases

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Course Objectives

• Know the basic concepts of plasma etching.
• Understand the physics of RF glow discharges (both high and low density).
• Understand the surface science aspects of reactive ion etching (RIE).
• Learn about plasma-surface chemistry leading to etching.
• Recognize the factors that influence etching anisotropy.

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The symposium will be held on Thursday, Sept 9, 2021 from 10 am to 5 pm CDT.

Registration fees will be waived this year as they were last year.

Abstract submission is open until August 27, 2021.

Please submit your abstracts and indicate in the email if you would prefer a poster or oral presentation to Jeff Terry by email at jeff_terry@avs.org.

Registration will also be via email to jeff_terry@avs.org, if you would like to attend, please send an email and you will be sent a link to the videoconference.

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The course begins with an overview of basic materials-related concepts used in microelectronics processing. This is followed by a description of process steps required to make an integrated circuit. Process steps such as photolithography, deposition (chemical vapor and sputtering), oxidation, implant, and etch along with current packaging technology will be covered, followed by a review of a simple process flow to emphasize how each step integrates with the others to create a working device.

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The 32nd Annual Symposium of the PNWAVS Science and Technology Society (www.pnwavs.org/) will be a hybrid onsite-virtual meeting hosted by Oregon State University located at Johnson Hall in Corvallis, OR. The meeting will consist of one afternoon tutorial talks and one and half days of invited talks, plenary speakers, and a student presentation competition.

The registration for the virtual meeting is free and the onsite meeting is $50 per person to cover onsite costs (food, drinks, etc.). Attendees must register in advance. All invited speakers are waived for registration. We also have some limited budgets to cover costs (registration, lodging, etc.) for onsite attendees based on first-come-first-served rules and the priority is given to students.

The online registration is available at www.pnwavs.org. If you have any questions about registration, please contact Shuttha Shutthanandan by email (shuttha@pnnl.gov) or phone at 509-371-6530.

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The NCCAVS sponsors an Annual Equipment Exhibition to showcase products and services of companies supporting vacuum-related industries. Attracting approximately 80+ exhibitors and over 700 attendees.

Largest Attendance of any AVS Chapters or Divisions. * Speaker events at capacity. * Extended hours provide ample time to engage all attendees. * Lunch, Evening Reception and Cocktails at no cost to attendees.

Held In Conjunction with:

• NCCAVS Technical Symposium
• 10^th Annual Student Poster Session

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The Shockley-Queisser model is a landmark in the analysis of light-> electrical energy conversion by the photovoltaic effect, specifically aimed at solar cells. By defining an ideal situation as reference for actual solar cells, upper limits for conversion efficiency are obtained. What is often missed or misunderstood, is that it is a   m o d e l ,  and as such assumptions are made, five of them. If this essential feat of the S&Q work is missed, one gets titles like “breaking the S&Q barrier” which, given that the model is solidly rooted in thermodynamics, should at least raise eyebrows.  By devising a system that does not obey one of the five assumptions, one goes outside the realm of the model.  One can ask, so what? Well, the mode, does encompass most types of solar cells and all the practical ones (without concentration).

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Area-selective deposition (ASD) is a technology that is currently gathering momentum as enabler for bottom-up fabrication. Its main promise is the ability to process material in a self-aligned fashion, thereby eliminating alignment errors in semiconductor processing. In addition, ASD has been considered for alternative nanofabrication schemes in catalysis. By using mature thin film techniques such as chemical vapor deposition (CVD) and atomic layer deposition (ALD) as a starting point, the development of strategies and approaches to ASD primarily focuses on making the growth selective to specific materials or surfaces. This often involves the selective adsorption of reactant species, or as a more general approach, the deactivation of surfaces on which no growth is desired by selective functionalization. While achieving selective deposition is already difficult, maintaining the selectivity is yet another challenge, as there are numerous side-reactions that could lead to loss of selectivity. In this webinar, several aspects of ASD technology will be addressed, ranging from fundamental surface reactions to technological challenges.

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Abstracts are now being solicited for oral and ‘poster’ presentations on topics of interest within AVS.

Participation in a local AVS chapter provides an excellent opportunity to interact in a smaller venue compared to the larger national conferences, affording the participants time to focus on presentations of scientific work that is happening in our immediate geographic proximity, along with ample time for professional networking.

These local chapter meetings are also an ideal setting for students and early career researchers and professionals to present their research. Therefore, student participation is strongly encouraged. Established professionals are also welcome to submit abstracts, which could include recent studies, or provide overviews of topics of general scientific interest to the society and chapter members. 

Registration for the meeting is free. Pizza and refreshments will be provided at about 6:00 pm. At the end of the meeting, awards will be given for the best oral and poster presentation(s).  The award winner(s) will be given a certificate from the AVS and will also be publicized in the AVS Newsletter.
 

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The oxidation and corrosion of technical alloys is critical to their use, lifecycle and design of new materials. The oxidation cycle is complex and relies on transport through the alloy, the growing oxide, and surface reactions in a highly dynamic and heterogeneous material system. The oxide growth process has been studied for many decades and is well-understood, both on an empirical and mechanistic level. On the other hand, there are still significant, and impactful gaps in our understanding of the transition from alloy to oxide in the very early stages of the oxidation process.

We will discuss the challenges and progress made in the study of the alloy surface reactions, and how they might (or might not) influence the oxidation process and therefore the performance of protective layers.

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Understanding the origin of stress in thin films produced by physical vapor deposition (PVD) is of key importance as excessive stress levels can lead to premature failure by cracking, buckling or interfacial delamination, which compromises device durability.

This webinar will provide an overview on how film stress develops during deposition, how it is affected by the main process parameters, and how to mitigate it. Selected examples from epitaxial, amorphous and polycrystalline thin films will be highlighted, with emphasis on metallic thin films. Models explaining the generation and relaxation of stress will be presented and discussed. The webinar will also cover practical aspects on how to measure stress during growth using wafer curvature methods.

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Over the last two decades Atomic Layer Deposition (ALD) has become a key enabling method with a multitude of applications benefiting from the (ultra)thin films that can be prepared with precise thickness control and with unparalleled uniformity and conformality on substrates with a demanding surface topology.

In this webinar the method of ALD will be presented with a focus on various applications of ALD: both in the lab and in the fab; from high volume manufacturing to niche markets;  from emerging technologies to proof-of-concepts. Special attention will be given to the key features that ALD provides for these specific applications as well as the associated ALD configurations and types of equipment.

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The AIV XXV CONFERENCE approaches the issues associated with materials and processing, in the research and manufacturing communities. The three day Conference promotes a multidisciplinary environment to encourage a cross fertilization between attendees on emerging technologies.

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The International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN), affectionately known as “3-Beams,” is the premier gathering of scientists and engineers who are dedicated to electron, ion and photon lithography, imaging, and analysis; atomically precise fabrication; nanofabrication process technologies; related emerging technologies; and their applications in a broad spectrum of fields. This is the 65th meeting of the EIPBN, where top researchers from academia, government laboratories, and industry from around the world meet to present and discuss recent trends and future directions in these technologies. 

Abstract Deadline: January 30, 2022

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Thermal evaporation is employed in a very wide variety of film-growth processing technologies with applications ranging from optics, magnetics, and microelectronics to wear and corrosion resistance to functional and decorative coatings. This course provides an understanding of thermal evaporation and related processes; the relationship between evaporation rate and vapor pressure; flux directionality; and film thickness uniformity.

8:00 a.m.-4:30 p.m. MST – Check Your Time Zone

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You are invited to join the AVS Applied Surface Science Division Virtual Awards Ceremony and Business Meeting on November 8, 2021 at 2 PM (EST).

For Zoom meeting details, please contact Mark Engelhard.

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Because of the ISO/CS announcement on 8 July 2021 of an extension of the ISO measures against  COVID-19, which is to cancel the face-to-face meetings till 31 October and of unpredictable situation of the coronavirus crisis, TC 201 meeting which was planned to be held in Zurich will be held virtually using the Zoom system provided by ISO.

Representatives of P-, O-members and liaison organizations of ISO/TC 201 and ISO/CS are invited to register to the meeting using Meeting Platform in individuals’ ISO Portal: URL; https://sd.iso.org/meetings/101389. Delegates or experts who are not registered in ISO Global Directory and are planning to participate in the meetings, are kindly asked to contact the Committee Manager with the information of affiliation and member body.

The virtual meeting will be held from 2 November (Tue.) to 5 November (Fri.)*. On each day the meeting will start on 12:00 (UTC) and end on 15:00 (UTC)**. Unlike on-site meetings, the meeting duration would be limited to three hours a day*** as the ISO guidelines for virtual meetings recommends. The duration of the meeting is shortened by 30% of the conventional meeting as a whole. SC managers are strongly encouraged to prepare for running SC meetings efficiently.

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Please join us on Gather for the Virtual AVS 67 Undergraduate Poster Session and Awards Ceremony on Tuesday, November 2, 2021, from 8:00 p.m.-9:30 pm EDT. Students will be present with their posters and ready to discuss! If you are interested in viewing their submissions prior to the Poster Session, you can find them on the AVS 67 Virtual Symposium mobile app/online scheduler under OD-UP On Demand: Undergraduate Poster Session.

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Please contact Robert Grubbs for more information and Zoom details.

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You are invited to join us for the AVS Heterogenous Catalysis FT Graduate Student Presentation Awards Ceremony.  Award finalists will briefly present their findings and then winners will be announced.

Please contact Ashleigh Baber for more information and  Zoom details.

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Please also join us on November 3rd, 11am-12pm EDT for the AVS NSTD awards ceremony with a presentation by the 2021 Nanotechnology achievement award winner Robert Carpick.

Contact Georg Fantner for more information and Zoom details.

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You are invited to join us for the finale of the AVS Nanoscale Science and Technology Division's graduate student and early career awards competition. We will have a live online zoom session where the  finalists for the Early Career Award and the finalists for the Graduate Student Award will present their work.

Contact Georg Fantner for more information and Zoom details.

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You are invited to join us for the finale and award presentation of the Mort Traum Award of the AVS Surface Science Division. We will have a live online zoom session where the four finalists will present their work and where the jury will decide which finalist will receive the award.

Contact Irene Groot for more information and Zoom details.

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You are invited to join the AVS CNSE Student Chapter for a movie night on November 15, 2021 at 5 PM (EDT).  The holiday classics "A Charlie Brown Thanksgiving" and "Garfield's Thanksgiving" will be shown.

Pizza, snacks and drinks will be provided.

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You are invited to join us for the AVS Texas Chapter Webinar/Meeting on December 15, 2021 at 3 PM - 4:30 PM (Central Time) / 4 PM - 5:30 PM (EST).  Featured speaker will be Dr. Alex Ignatiev on "The Vacuum of Space." 

Please contact Wiley Kirk for more information and  Zoom details.

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The AVS 26th International Conference on Atomic Layer Deposition (ALD 2026) featuring the 13th International Atomic Layer Etching Workshop (ALE 2026) will be a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films and now topics related to atomic layer etching.  Since 2001, the ALD conference has been held alternately in the United States, Europe and Asia, allowing fruitful exchange of ideas, know-how and practices between scientists. This year, the ALD conference will again incorporate the Atomic Layer Etching 2026 Workshop (ALE 2026), so that attendees can interact freely. The conference will take place Sunday, June 28 - Wednesday, July 1, 2026, at the International Convention Center in Ghent, Belgium.

As in past conferences, the meeting will be preceded (Sunday, June 28) by one day of tutorials and a welcome reception. Sessions will take place (Monday-Wednesday, June 29-July 1) along with an industry tradeshow. All presentations will be audio-recorded and provided to attendees following the conference (posters will be included as PDFs). Anticipated attendance is 800+.

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The first day of this course covers plasma-assisted etching phenomena and equipment in a manner that will assist the attendee in understanding and developing plasma etching and RIE processes. The emphasis will be on the fundamental physical and chemical processes that determine the consequences of a reactive gas plasma/surface interaction. The role of energetic ions as encountered in RIE systems and the factors that influence anisotropy of etching will be described. Many kinds of plasma-assisted etching equipment will be discussed, including capacitively coupled, inductively coupled, and wave-generated plasma sources.

The second day of this course covers the applied aspects of plasma-assisted etching. Emphasis will be on mechanistic understanding as opposed to specific processing issues, recipes, and problems. The etching of Si and its compounds will be covered in detail as well as the etching of other technology-related materials such as Al, organics, III-V compounds, etc. Topics such as selectivity, loading, ARDE, damage, and issues associated with high-density plasma RIE will be covered. A section on plasma diagnostics will focus on optical emission spectroscopy with actinometry, mass spectrometry, and laser-induced fluorescence.

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This introductory course provides maintenance and equipment engineers and technicians with a basic working knowledge of RF technology as it is applied to semiconductor processing equipment.

The role of RF in the various plasma processes, including sputter deposition and etching systems, is discussed. The characteristics and uses of various components that make up an RF system are described. The differences between resistive and reactive components are explained as well as the differences between series and parallel resonance.

The course covers the operation of RF generators, coaxial cables, matching networks, filter circuits, and the plasma chamber itself. The use of inductive versus capacitive coupling of RF power into the plasma discharge is reviewed as well as methods for measuring target and substrate voltages and their relation to ion energies.  Basic and practical troubleshooting techniques are discussed.

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This course provides the basic training required to interpret Residual Gas Analyzer (RGA) data and produce actionable information for process control applications. The operation of an RGA is described, with specific attention dedicated to the multiple tuning parameters available to RGA operators. Routine calibration, tuning and maintenance procedures are discussed. Typical RGA spectra are shown and analyzed and the interferences from background gases are highlighted. Quantitative calculations of gas concentrations are described.  Relevant literature references, gas libraries, tables and graphs are presented. A portion of time is always reserved to address the specific needs of the group.

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Atomic layer etching (ALE) is based on sequential, self-limiting reactions that yield controlled etching at the atomic level.  ALE is critical for atomic layer processing that is increasingly important for nanoscale fabrication.  The course will cover both plasma ALE and thermal ALE.  Process strategies will be described that are useful for many applications including advanced semiconductor processing.

The first part of the course will cover the basics of plasma ALE.  Si ALE will be described as the model plasma ALE system defined by chlorination and Ar+ ion sputtering.  Other plasma ALE systems will be discussed such as SiO2, Si3N4 and HfO2 ALE.  The second part of the course will cover the basics of thermal ALE.  Al2O3 ALE will be developed as the model thermal ALE system based on fluorination and ligand-exchange reactions.  Other thermal ALE systems will be discussed such as TiN, SiO2 and Si ALE.

The course will also discuss selectivity in ALE and the importance of ALE in area-selective atomic layer deposition (ALD).  ALE and ALD can also be integrated into process flows in the same reactor for advanced device fabrication.  Other applications for ALE include surface cleaning and surface smoothening.

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This course starts with a brief review of the basics of processing plasmas. This knowledge is then applied to the plasma deposition of thin films in practical device applications. The unique aspects of PECVD are emphasized by an in-depth comparison of PECVD with other deposition technologies. The relationship between process parameters and film properties is illustrated by reviewing several important device applications of PECVD.

The deposition and properties of important materials such as silicon oxide, silicon nitride, silicon carbide, amorphous and polycrystalline silicon, diamond and diamond-like carbon are discussed in detail.

Much emphasis is placed on an up-to-date discussion of hardware and hardware considerations as these apply to process control and process safety.

Important trends in the design and operation of commercial equipment, particularly as it relates to microelectronics, are discussed in detail.

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Ultrahigh vacuum (UHV) is a required environment for many research areas, such as surface science (which requires the use of electron, ion, and neutral spectroscopies), as well as for many technological areas, such as thin-film growth of electronic and optical materials. In this course, the techniques involved in the production, measurement, and operation of such pressure levels are discussed.

In addition to kinetic theory, system design elements--such as methods of pumping, materials selection, materials processing, outgassing considerations, system degassing, instrument degassing, surface effects, pressure-limiting factors, methods to shorten pumpdown time, and sample transfer systems--are reviewed. Special emphasis is given to total and partial pressure measurement within UHV systems. Various applications requiring an operational UHV environment are also discussed.

The course concludes with an open forum to exchange new ideas and techniques.

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The ISVSP is a specialized meeting that gathers domestic and world-renowned scientists and scholars in the Philippines to discuss a range of technology-related topics, emerging trends, and special areas of interest in line with the theme of the symposium. It provides opportunities to entertain topics that will stretch into the future that will be vital in assisting our local industry in different technological fields. It aims to stimulate discussions, establish collaborations, and foster camaraderie among participants. We anticipate that this event will be participated by colleagues from the academe, researchers, students, and industry professionals. The symposium highlights plenary and parallel oral sessions as well as poster sessions with the goal of providing a scientific forum to enable interactive exchange of state-of-the-art knowledge. ISVSP is now on its 4th year with the theme, “Refocusing Vacuum and Plasma Technology to the current needs of the Society”. For more information, visit our official website (http://vacuumphilippines.org/index.php/symposia/isvsp-2022).

Abstract Deadline: December 15, 2021

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Measuring pressure is one of the key ingredients in all vacuum applications. With continual improvements in pressure measurement technology and a plethora of manufacturers who delve into this space, it is sometimes difficult to understand the key differences in the technologies and what variables may affect the readings. This e-Talk will take a dive into the individual technologies and highlight some of the key characteristics for each. Also, a focus in this discussion will be some of the variables that can affect the measurements and how to potentially overcome those issues.

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The annual Physical Electronics Conference provides a forum for the dissemination and discussion of new research results in the physics and chemistry of surfaces and interfaces.  It includes the prestigious Nottingham Prize Competition for best presentation based on doctoral research.

Abstract Deadline: April 4, 2022

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The ICMCTF is internationally recognized as a vibrant technical conference that integrates fundamental and applied research focused on thin film deposition, characterization, and advanced surface modification techniques.  ICMCTF is the premier international meeting in the field promoting global exchange of information among scientists, technologists, and manufacturers.  The conference draws more than 800 attendees each year with multiple oral technical sessions and a well attended poster session which is a major component of the technical program.

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The 2022 FLAVS Symposium will be held on May 5-6, 2022 at the University of Central Florida in Orlando, Florida.

This will be an in-person event and will consist of a plenary lecture, technical sessions with invited and contributed presentations, a poster session including a student poster competition and an equipment exhibit for vendors to display surface analytical, vacuum, microscopy, thin film, and microelectronic equipment.   

There is no registration fee for either the symposium or equipment exhibit but online registration is strongly recommended.

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The 33rd Annual Symposium of the Pacific Northwest Chapter of the American Vacuum Society (PNWAVS) will be held in conjunction with the 40th Symposium on Applied Surface Analysis on September 14-16, 2022 at the Pacific Northwest National Laboratory (PNNL), located in Richland, Washington. The Applied Surface Science Division (ASSD) of the AVS sponsors a biannual topical conference to discuss advances in applied surface analysis. PNWAVS hosts an annual symposium that brings together researchers with interests in vacuum science and technology in the Pacific Northwest region.

A goal of this meeting is to promote interaction among all participants from industry, government, and university laboratories. Both invited and contributed papers in the form of oral and poster presentations will be presented at the meeting. The meeting will consist of three days of invited and contributed talks, plenary speakers, a vendor exhibit, tours of (ESC) and EMSL, and a student poster presentation competition.

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Short courses are offered on a wide variety of topics.

• One day courses cost $690, two day course costs $1020 and Basic Vacuum Technology (4 days) costs $1,795.
• Full time university students qualify for a $75 short course day rate.  (1 day course is $75, 2-day courses cost $150 and 4 day course is $300)
• AVS members may qualify for a discount.

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Lowering the cost of electricity from silicon solar modules to less than 2¢/kWh may be realized by increasing their efficiencies and improving their lifetimes. Both advances can be achieved by modifying the solar spectrum that enters the silicon solar cell by coating it with a quantum cutting material.

Quantum cutting materials convert each ultraviolet (UV) and blue photon absorbed at high energies to two near-infrared photons close to the silicon bandgap energy. This reduces UV exposure and heat generation, two factors that lower the operation life of photovoltaic systems while increasing power conversion efficiencies. Efficiencies exceeding the Shockley-Quessier limit become possible.

This e-talk will cover the recent progress in physical vapor deposition of quantum cutting halide perovskite thin films.

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The 48th Conference on the Physics and Chemistry of Surfaces and Interfaces (PCSI-48) and AVS Quantum Information Science Workshop will be held at Sonesta Redondo Beach & Marina in Redondo Beach, California, USA, from Sunday afternoon, January 15, through Thursday noon, January 19, 2023.

The annual PCSI conference is devoted to achieving a fundamental understanding of the physical, chemical, biological, structural, optical, magnetic, and electrical properties of surfaces and interfaces. These studies include novel growth processes and interfacial phenomena, new characterization tools, transport, and functionality of the structures for future devices.

Generous amounts of discussion time will be included in the program in order to emphasize the workshop character and to stimulate the exchange of new ideas.

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The semiconductor industry is headed towards heterogeneous integration in 2.5D or 3D form being driven primarily by the high cost of monolithic integration, extended time to market using advanced process nodes on large designs, and heterogeneity of systems. This is great news for packaging.

On the communication side emerging 5G mmWave frequencies are projected to support enormous bandwidth with 1-10Gps data speeds. Active research is ongoing to increase the data speeds even more by moving to higher frequencies in the sub-THz frequency range namely, 6G. With a broad range of frequencies to support, advanced packaging solutions are required.

This presentation addresses the needs for 5G and 6G communication along with the progress made on glass interposer-based solutions at Georgia Tech’s Packaging Research Center, which includes work being done in collaboration with Sandia. Advances in the application of machine learning for design optimization in the context of beamforming will be discussed as well.

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In conjunction with PCSI 2023 and an AQS Workshop.

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In conjunction with a visit with the AVS Publications staff.

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Virtual Meeting.

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In conjunction with the AVS 69th International Symposium & Exhibition.

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This annual workshop is the successor to the original WINDS and the International Symposium on Advanced Nanodevices and Nanotechnology (ISANN), which were held on alternate years dating back to 1986 (http://www.winds-meeting.info). WINDS covers a spectrum of nanoscale science, emerging materials and device technologies with morning and evening sessions. Afternoons are free for ad hoc discussions among participants. The conference is intended to provide a forum for discussion of new ideas in the broad area of nanoscience, and opportunities for interaction and networking among scientists.

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The 2022 AVS Prairie Chapter Fall Symposium will be held on September 1, 2022 at the University of Notre Dame in Notre Dame, Indiana.

This will be an in-person event and will consist of invited and contributed presentations, a poster session including a student poster competition and an equipment exhibit for vendors to display surface analytical, vacuum, microscopy, thin film, and microelectronic equipment.

Registration fees are $30 for students and postdocs and $70 for non-student participants.

REGISTER HERE!

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ISO TC 201 Surface Chemical Analysis meeting will be held from 5 October (Wed) 2022 to 7 Oct (Fri) 2022 in Brescia, Italy.

This will be a hybrid meeting format as TCs can only hold either virtual or hybrid meetings without approval by ISO according to the ISO COVID-19 measures updated on 18 Feb.  

SCOPE of ISO TC201
Standardization in the field of surface chemical analysis. Surface chemical analysis includes analytical techniques in which beams of electrons, ions, neutral atoms or molecules, or photons are incident on the specimen material and scattered or emitted electrons, ions, neutral atoms or molecules, or photons are detected. It also includes techniques in which probes are scanned over the surface and surface-related signals are detected.

The meeting as well as lodging place will be Double Tree Hotel by Hilton.

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Highlight Theme: Semiconductor Fabrication and Technology

Invited Speakers:

• Virginia Wheeler (US NRL): “Approaches for the Advancement of Wideand Ultra-wide Bandgap Semiconductor Materials and Heterojunctions”
• Howard Fairbrother (Johns Hopkins University): “Charged particle deposition and modification of materials: A surface science approach"
• Gina Adam (George Washington University): “Memristor engineering towards next-generation analog neuromorphic systems”
• William Sweet (Northrop Grumman): “Advanced Packaging within the Domestic Microelectronics Ecosystem”

Pre-registration required  --  http://goo.gl/forms/DD7y3fPUII
       
Registration deadline* - May 19, 2022          
*(foreign nationals are encouraged to apply early)

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The American Vacuum Society (AVS) is excited to announce the 2022 AVS International “One-Tweet Challenge” Competition, an online venue for students and professionals to share their research with a global audience. We challenge you to capture the impact of your research in 280 characters and one image. Join us to disseminate your latest findings, connect with your research community, and meet new colleagues!

REGISTER HERE

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Want to increase the likelihood of positive outcomes when there is conflict? Join us for a one hour FREE interactive webinar on “Skills and Strategies for Navigating Difficult Conversations and Negotiations” with Dr. Lily Wang, August 3, 2022 1PM EDT

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The 2022 AVS Michigan Chapter Welcome Banquet will be held on September 8, 2022 at the Kellogg Center, Michigan State University in East Lansing, Michigan.

For more information, visit AVS Michigan Chapter Meetings.

REGISTER HERE!

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Course Objectives

• Learn the fundamentals of ALE based on sequential self-limiting reactions.
• Understand the differences between plasma ALE and thermal ALE.
• Learn about the surface chemistry and reactors for ALE.
• Understand why plasma ALE can obtain atomic layer precise anisotropic etching.
• Learn how thermal ALE can achieve atomic layer precise isotropic etching.
• Learn how ALE can be utilized for thin film nanoengineering and device fabrication.
• Understand the many current and potential applications of ALE.

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Course Objectives

• Know the basic concepts of plasma etching.
• Understand the physics of RF glow discharges (both high and low density).
• Understand the surface science aspects of reactive ion etching (RIE).
• Learn about plasma-surface chemistry leading to etching.
• Recognize the factors that influence etching anisotropy.

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Course Objectives

• Understand the fundamentals of sputter deposition
• Review and discuss options for sputtering system design
• Learn how rf sputtering differs from dc sputtering and understand how rf sputtering works
• Understand reactive sputtering
• Understand thin film properties are modified by adjusting sputtering parameters

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Course Objectives

• Real vs virtual leaks
• Leak rate specifications
• Different leak detection methods
• How a mass spectrometer leak detector works
• Care and feeding of a mass spectrometer leak detector
• Basic ways to use a mass spectrometer leak detector
• What to do when a leak is found
• Possible steps when a system passes leak test but has sub-par performance
• Sources of gas that can affect vacuum system performance
• Ways to mitigate gas sources

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Course Objectives

• Understand the three phases of vacuum chamber contamination: gases, films, and particulates.
• Learn the origins of vacuum chamber contaminants and methods for controlling or eliminating them.

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Course Objectives

• Understand the radio frequency (RF) plasma system as an electronic circuit.
• Learn a systematic approach to viewing a RF plasma system.
• Know techniques for maintaining and troubleshooting RF systems.

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Course Objectives

• Basic operation principles of mass spectrometers for residual gas analysis.
• How to specify the best RGA system configuration for your application.
• How to configure RGA software and process control I/O to perform gas analysis and track real-time changes in gas composition. 
• Routine maintenance, tuning and calibration procedures.
• Quantitative compositional analysis and process control (actionable information) options.
• Spectral Interpretation: Quickly and effectively interpret typical RGA spectra. Monitor the quality of your vacuum process. Fingerprint your gas chamber. Chamber matching opportunities.
• How to differentiate between background and process gases 
• Typical chemical interactions between RGAs and sampled gases.

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International workshop for area selective deposition with half day tutorial (Sunday) and a special session (Wed) for "ALD for Semiconductors."

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The ability to design, tune and successfully test nanoporous crystalline materials allows for the development and commercialization of materials for many different environmental and energy applications. Metal-organic frameworks (MOFs) have shown great potential in challenging separations of molecules with very similar kinetic diameters. One area of strong focus in our lab is toward a fundamental understanding of the structure-property relationship of selective adsorption in MOFs. Here our team has implemented a synergistic approach involving predictive molecular modeling, experimental synthesis, and advanced testing to enable rapid discovery of new materials. Density functional theory (DFT) calculations were used to measure the binding energy for various gases on coordinatively unsaturated metal sites in MOFs. The modeling guides the materials synthesis, which in turn is supported by laboratory testing. Results then are used to validate and optimize the models for continuous advancements. Applications as adsorbents and direct electrical readout sensors will be presented.

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This course develops an understanding of atomic layer deposition (ALD). Al2O3 ALD is first introduced as an ideal model system and then ALD is compared with CVD. Non-ideal ALD behavior is presented before discussing plasma and radical-enhanced ALD. Subsequently, novel surface chemistry is described for metal ALD.

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The AVS International Symposium and Exhibition has been developed to address cutting-edge issues associated with vacuum science and technology in both the research and manufacturing communities. The Symposium is a week long forum for science and technology exchange featuring papers from technical divisions and technology groups, and topical conferences on emerging technologies. The equipment exhibition is one of the largest in the world and provides an excellent opportunity to view the latest products and services offered by over 200 participating companies. More than 3,000 scientists and engineers gather from around the world to attend. Short courses are offered in conjunction with the International Symposium providing specialized training in specific areas of vacuum science and related technologies. A Career Workshop and Job Center are also offered to all attendees. The Workshop covers such topics as résumé preparation, job search skills, networking, interviewing skills, and more. The Job Center provides the opportunity for job seekers to submit their résumés and meet with potential employers.

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The MIOMD conference will focus on materials and devices for mid-infrared optoelectronics. For wavelengths of 2 to 20 micrometers, the applications include environmental gas monitoring, detection of pharmaceuticals, free-space optical communications, thermal imaging and optical sensor instrumentation. Relevant topics include materials development, growth, and characterization for infrared optoelectronics; devices, components, and systems for infrared optoelectronics; infrared emitters and detectors; interband and intersubband materials and devices; novel architectures based on new materials and low-dimensional structures; non-linear technologies for infrared optoelectronics; materials and devices for THz technologies; and applications of mid-IR optoelectronic devices.

Abstract Deadline: April 1, 2023

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Invited Speakers:

• Phillip Bradford (NCSU): Fabrication and Characterization of Carbon Nanotube Hybrid Textiles
• Gabriel Veith (ORNL): Battery Interfaces: Dynamics, Transport, and “Oh, Come On”

Pre-registration required  --  https://go.ncsu.edu/css2022
       
Registration deadline* - November 11, 2022

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The NCCAVS sponsors an Annual Equipment Exhibition to showcase products and services of companies supporting vacuum-related industries. Attracting approximately 80+ exhibitors and over 700 attendees.

Largest Attendance of any AVS Chapters or Divisions. * Speaker events at capacity. * Extended hours provide ample time to engage all attendees. * Lunch, Evening Reception and Cocktails at no cost to attendees.

Held In Conjunction with:

• NCCAVS Technical Symposium
• 11^th Annual Student Poster Session

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Participation in a local AVS chapter provides an excellent opportunity to interact in a smaller venue compared to the larger national conferences, affording the participants time to focus on presentations of scientific work that is happening in our immediate geographic proximity, along with ample time for professional networking.

These local chapter meetings are also an ideal setting for students and early career researchers and professionals to present their research. Therefore, student participation is strongly encouraged. Established professionals are also welcome to submit abstracts, which could include recent studies, or provide overviews of topics of general scientific interest to the society and chapter members. 

Registration for the meeting is free. Pizza and refreshments will be provided at 6:10 pm. At the end of the meeting, awards will be given for the best oral and poster presentation(s).  The award winner(s) will be given a certificate from the AVS and will also be publicized in the AVS Newsletter.

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The International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN), affectionately known as “3-Beams,” is the premier gathering of scientists and engineers who are dedicated to electron, ion and photon lithography, imaging, and analysis; atomically precise fabrication; nanofabrication process technologies; related emerging technologies; and their applications in a broad spectrum of fields. This is the 66th meeting of the EIPBN, where top researchers from academia, government laboratories, and industry from around the world meet to present and discuss recent trends and future directions in these technologies. 

Abstract Deadline: January 13, 2023

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The 6th US Gallium Oxide Workshop (GOX 2023) is the premier forum to highlight domestic research in the rapidly emerging field of gallium oxide and related materials with high critical field strength. The purpose of this workshop is to provide a platform for reporting recent advances in materials and device development and identify scientific gaps remaining. The intent is to create actionable coordination across government, industry and academia to enable rapid transitional technologies in this field. There will be no written proceedings to facilitate a friendly and stimulating environment for scientific discussions.

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The 2022 AVS Ohio Chapter is excited to announce our first (in a long while) AVS Ohio event at the AVS Symposium in Pittsburgh.

Please join your fellow AVS Ohio members for a casual Welcome Reception with appetizers & refreshments on Tuesday, November 8 from 5:45 PM to 7:00 PM.

For planning purposes, we kindly ask you to RSVP here before October 10th. We hope to see you at AVS 68!

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Through invited speakers and audience participation, this conference will provide opportunities to learn about the capabilities of HAXPES and NAPXPS, and discuss issues, including reproducibility challenges. Reproducibility and quantification of ToF-SIMS spectra and images are also important but have been rarely discussed in the literature. QSA18 brings back the discussion of the basics of collecting, calibrating, and measuring SIMS data, along with a panel discussion of new developments in TOF-SIMS. Real examples and case studies will be presented with ample time for discussion.

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This conference covers the field of vacuum electron sources, consisting of principle, related science and technology, and their applications. This conference is the successor to the biennial series of the Tri-service/NASA Cathode Workshop since 1978. In order to achieve higher results, an international steering committee was formed, resulting in the launch of this conference series in Netherlands in 1996. Since then, the conference has been held every other year in Europe, Asia and the United States. Although the 14th conference was scheduled in 2022 at first, it was postponed by one year due to COVID-19.

Abstract Deadline: June 15, 2023

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Since established in December 1998, TACT has organized eight international conferences, from Asia CVD 2005 to TACT 2021. TACT 2023 will be held from November 12 to 15, 2023 at National Taipei University of Technology in Taipei, Taiwan. TACT 2023 is an important biennial event for knowledge exchange and interactive platform for researchers and engineers from academia and industry. It will cover a wide spectrum of aspects related to thin film, coating and plasma technologies for sustainable energy, semiconductor, optoelectronic, flexible device, tribological, organic, biological, protective and functional coatings. There will be about 800 participants from more than 20 countries.

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The 12th Vacuum Technique Conference is organized by the Łukasiewicz Research Network – Tele and Radio Research Institute under auspices of the Polish Vacuum Society. The mission of the Conference is to provide a forum for presentation and exchange of research results and expertise in the field of vacuum science and techniques, vacuum technologies and their applications, characterization of surfaces and thin films. Our goal is to continue and foster cooperation within the vacuum science community.

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Atomic Layer Deposition (ALD) has become a key technology in both the lab and the fab with many devices and other applications benefiting from the (ultra)thin films that can be prepared with very precise thickness control and with unparalleled conformality and uniformity. Nowadays, a significant number of the ALD processes employed are so-called plasma-assisted or plasma-enhanced ALD processes. 

The reasons why and when to use plasma-assisted ALD are often not clear as well what kind of plasma configurations to use and which conditions to apply. This webinar will address these aspects starting with the basics of ALD and plasma-based processing and will range up to the applications that can benefit from plasma-assisted ALD

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The 2023 SVC TechCon in Washington, D.C. focuses on the essential role that Thin Films, Coatings, and Surface Engineering play in the products and services that drive our daily lives. The SVC represents the latest technologies, manufacturing methodologies, and business insights, supporting a global group of stakeholders. Highlighted by prominent Keynote presentations and invited speakers, the TechCon offers an engaging podium for contributed talks & posters as well as roundtable discussions and other interactive features.

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The Rocky Mountain Chapter of AVS will be holding its Symposium on the 14th of September 2023 at the Denver-Westminster Double Tree Hotel on US36 in Westminster, Colorado.  In addition to the Symposium, the RMC will be putting on a short course program the 13th to 15th of September at the same location.

SCHEDULE AND REGISTRATION NOW AVAILABLE!

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Courses

• Cleaning and Surface Conditioning Techniques for Integrated Circuit Manufacturing (2 days) (3/13-14/23)
• Atomic Layer Etching (3/15/23)
• Sputter Deposition (3/16/23)
• Ultra-high Vacuum Design and Practices (3/17/23)
• Vacuum Pumps: An introduction to their operation and maintenance (3/20/23)
• Plasma Etching and RIE: Fundamentals and Applications (2 days) (3/21-22/23)
• Essentials of Accurate and Reliable Surface Analysis using X-ray Photoelectroni Spectroscopy (XPS) and Auger Electron Spectroscopy (AES) (3/23/23)
• Partial Pressure Analysis with Residual Gas Analyzers (3/24/23)

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Courses

• Plasma Basics (5/21/23)
• Physics of Plasmas use in Deposition Processes (5/22/23)
• Fundamentals of Sputter Deposition (5/22/23)
• Control of Micro- and Nanostructure Evolution during Physcal Vapor Deposition (5/23/23)
• Fundamentals of HiPIMS Plasmas for Thin Film Deposition (5/23/23)
• Advanced Understanding of HiPIMS Plasmas for Thin Film Deposition (5/24/23)
• Practical Thin Film Characterization - An Introduction (5/24/23)
• Thin Film Characterization by X-ray Photoelectron Spectroscopy (5/25/23)

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The top few nanometers of a sample is defined as the surface. The surface is where most chemical reactions take place. There are many instances where the surface of materials are designed/functionalized in order to optimize properties and improve device performance; there are other instances where the surface becomes compromised and the material/device performance degrades. Auger Electron Spectroscopy (AES), X-ray Photoelectron Spectroscopy (XPS), and Time of Flight Secondary Ion Mass Spectrometry (ToF-SIMS) are the three most common, and commercially available, surface analysis techniques. These techniques provide complimentary information regarding the composition/microstructure of the surface and sub-surface region of a sample. In this presentation, I will introduce AES, XPS, and ToF-SIMS, show typical data, and discuss how the data helped understand mechanisms and/or resolve material problems.  I will also introduce techniques which we do not have in-house,but have access to via external collaborations.

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Invited Speaker:

• Dr. Gon Namkoong (Old Dominion University): “Grain Boundary Engineered Perovskite Optoelectronic Devices for High Stability”

Equipment Exhibit—Vacuum Hardware and Instruments

Poster Session
Open to graduate and undergrad students working in AVS research topics including:   

• Biomaterial Interfaces
• Electronic Materials & Processing
• Magnetic Interfaces & Nanostructures
• MEMS & NEMS
• Manufacturing Science and Technology
• Plasma Science
• Surface Science
• Thin Films
• Vacuum Technology

Registration Deadline: March 20, 2023
Vendor Registration Contact:
Doug Baker, douglas.baker@teledyne.com

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Plasma coating technologies cover a wide range of applications, including semiconductors, displays, optoelectronics, mechanical engineering, aerospace, biomedical and consumer product industries. They value up the existing products to ultimate performance or make the impossible products to become possible, fulfilling the unmet needs of industries. Moreover, the global net-zero wind has let plasma coating technologies very important alternatives to conventional routes. On the other hand, the plasma coating technologies are evolving, making themselves more powerful, reliable and energy saving.

Currently, the key to successful plasma coating technologies involves high-density plasma coating system integration, coating materials R&D, as well as intelligence control. As such, DAH YOUNG Vacuum Equipment Co, Ltd., Institute of Plasma, Feng Chia University, Fraunhofer IST and PLASUS GmbH joined together, under the support from Department of Industrial Technology, Taiwan Ministry of Economic Affairs and ZIM, German Federal Ministry for Economic Affairs and Climate Action, to carry out a DE-TW project with fruitful outcome. Therefore, we invite speakers from universities, research institutes and industry together with us to share the latest plasma coating technologies. Greatly welcome your participation!

REGISTER HERE!

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Materials with high surface-to-volume ratios demonstrate exquisite sensitivity and detection limits in diverse sensing applications. Integration of nanowires, nanotubes, and two-dimensional (2D) semiconductors into sensing devices, however, presents challenges inhibiting development of products based on these materials. To realize applications of 2D transducers in ubiquitous low-cost diagnostic devices, new fabrication approaches are required. Processes for high-rate (>106 per day) mass-production of low-cost two-dimensional electronic medical diagnostic devices with limits of detection rivalling PCR will be presented.

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The annual New Mexico AVS Technical Symposium will feature scientists and engineers at all levels of their career with special emphasis for students, technologists, and early career researchers. This interdisciplinary, one-day forum allows for emerging scientists and engineers to present their research and collaborate with new colleagues. For students especially, the friendly exchange is valuable practice for future conferences and job presentations.

Short courses are offered on a wide variety of topics. Our vendor exhibit annually provides an exceptional opportunity to reach individuals from Los Alamos National Laboratory, Sandia National Labs, Air Force Research Laboratory and local industries such as Intel, Emcore and CVI Laser. Faculty and students from The University of New Mexico, New Mexico State University, and New Mexico Tech are frequent attendees.

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Join us for the AVS Michigan Chapter Symposium 2023. This all-day event is scheduled for June 7, 2023 at the North Campus Research Complex in Ann Arbor, MI.

The theme of the Symposium is Thin films and plasma for future microelectronics that will bring together experts from academia, research and industry to facilitate discussions on the future of US semiconductor ecosystem with emphasis on midwestern and Michigan infrastructure, economy and education.

This year’s Symposium will feature plenary and invited talks, a poster session and an industrial exhibition.

REGISTER NOW!

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Highlight Theme: Semiconductor Packaging and Heterogeneous Integration

Invited Speakers:

• Christina DiMarino (Virginia Tech): "High-Density Packaging and Integration of Wide Bandgap Power Semiconductors"
• John Hryniewicz (Thorlabs Quantum Electronics): “Vertically integrated photonic device manufacturing at TQE”
• Kartik Srinivasan (NIST/UMD JQI): “Integrated Photonics for Clocks and Sensors”
• George Orji (NIST): “Research needs in Advanced Semiconductor Packaging”

Pre-registration required  --  http://goo.gl/forms/DD7y3fPUII
       
Registration deadline* - May 19, 2023          
*(foreign nationals are encouraged to apply early)

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Want to strengthen your leadership skills or become a more effective leader? Register for this FREE webinar on “Cultivate Your Leadership Skills: A Review of Effective Leadership Traits and Practices” with Dr. Lily M. Wang, June 22, 2023 2PM EDT

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The 83rd Physical Electronics Conference, including the prestigious Nottingham Prize Competition for the best presentation based on doctoral research, will be held at the University of Wisconsin-La Crosse, July 31 - August 3, 2023. This topical conference provides a yearly forum for the dissemination and discussion of novel and fundamental theoretical and experimental research in the physics, chemistry, biology, and engineering of surfaces and interfaces.

Abstract Deadline: June 12, 2023

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The annual PCSI conference is devoted to the fundamental physical, chemical, biological, structural, magnetic, and electrical properties of surfaces and interfaces. These topics include novel growth processes, interfacial phenomena, new characterization tools, transport and optical and magnetic studies, and studies of novel functionality for future device applications.

Abstract Deadline: September 15, 2023

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The FCMN will bring together scientists and engineers interested in all aspects of the characterization technology needed for nanoelectronic materials and device research, development, integration, and manufacturing. All approaches are welcome: chemical, physical, electrical, magnetic, optical, in situ, and real-time control and monitoring. The semiconductor industry is evolving rapidly: the conference will highlight major issues and provide critical reviews of important materials and structure characterization and nearline/inline metrology methods, including hardware, data analysis, and AI and machine learning, as the industry both extends the technology deep into the nanoscale and increases the diversity of devices and systems.

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The IVNC series is devoted to the science and technology of micro and nanodevices that harness vacuum and high electric field phenomena. The first IVNC was held in Williamsburg, VA in 1988. Initially focused on field emission, displays and power tubes, IVNC first evolved into the pre-eminent conference series in the world on electron sources and their applications to then expand to encompass fundamentals, fabrication, and applications of other vacuum and high electric field phenomena e.g., plasmas, liquid ionization, gas ionization, X-rays, mass spectrometry, space propulsion, vacuum quantum systems, and harsh electronics.

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In conjunction with a visit with Publications Staff.

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In conjunction with ICMCTF 50.

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Virtual Meeting

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In conjunction with the AVS 70th International Symposium & Exhibition.

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The 10th International Symposium on Functional Coatings and Surface Engineering will take place in Montréal, Canada on June 2-5, 2024.

The symposium features:

• Invited lectures of leading experts;
• Oral and Poster original presentations;
• Short courses;
• Workshops on coating characterization;
• exhibit;
• Discussion and networking sessions.

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AVS National is offering an in-person four (4) day Fundamentals of Vacuum Technology course, Monday through Thursday, November 6-9, 2023 from 8:30 a.m.-5:00 p.m. (PT) (check your timezone) at the Oregon Convention Center in Portland, OR.

This course will be held in conjunction with the AVS 69th International Symposium and Exhibition.

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The Rocky Mountain Chapter of AVS will be putting on a short course program on the 13th to 15th of September at the Denver-Westminster Double Tree Hotel on US36 in Westminster, Colorado.

SCHEDULE AND REGISTRATION NOW AVAILABLE!

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Please join us at the AVS Ohio Chapter 2023 Symposium in Dayton, Ohio on Tuesday, August 1, 2023.   There will be Invited Speakers, contributed poster sessions with cash prizes for students and we kindly ask that you promote this event in your respective environments (academia, industry and the DOD).

Registration Deadline: July 17, 2023.

REGISTER HERE!

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The 34th Annual Symposium of the Pacific Northwest Chapter of the American Vacuum Society (PNWAVS) will be held in Boise, Idaho on September 7 and 8, 2023.  Every year, PNWAVS hosts an annual symposium that brings together researchers with interests in vacuum science and technology in the Pacific Northwest region. This year, we will host annual symposium at the Boise State University, Boise, Idaho.  

A goal of this meeting is to promote interaction among all participants from industry, government, and university laboratories. Both invited and contributed papers in the form of oral and poster presentations will be presented at the meeting. The meeting will consist of one and a half days of invited and contributed talks, plenary speaker, a vendor exhibit, tours of Boise State university campus and a student poster presentation competition.

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The ICMCTF is internationally recognized as a vibrant technical conference that integrates fundamental and applied research focused on thin film deposition, characterization, and advanced surface modification techniques.  ICMCTF is the premier international meeting in the field promoting global exchange of information among scientists, technologists, and manufacturers.  The conference draws more than 800 attendees each year with multiple oral technical sessions and a well attended poster session which is a major component of the technical program.

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MN-AVS will be holding it's 2023 Annual Fall Symposium on Thursday, September 7, 2023.

The event will feature 6 speakers from academia and industry and our plenary speaker Dane Morgan from the University of Wisconsin, who will be speaking on the topic of AI including generative AI for data/ image analysis and materials development.

Please register to attend before September 1st. We are also looking to hold a student capsule presentation with three prizes available including a grand prize of $800 towards attending the national AVS conference either this or next year.

Please submit your abstract to Ali Rafati @ ali_rafati@avs.org.

REGISTER HERE!

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The North American Molecular Beam Epitaxy Conference (NAMBE) is a prominent international forum for reporting scientific and technological developments in Molecular Beam Epitaxy research. The conference showcases important results from fundamental materials and device research, technological applications, and production. NAMBE features award presentations for MBE Innovator, Young Investigator, and Best Student Paper. Vendors will exhibit the latest equipment available for material growth and characterization. Exhibits will surround the coffee breaks and poster presentations, providing opportunities for discussions between attendees and vendors. Short topical workshops are also being considered the day before the main conference.

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WINDS is an international and interactive workshop designed to explore the fundamental properties of nanoscale heterostructures and potential device applications. The workshop is composed of morning and evening sessions, with afternoons free for ad hoc meetings to encourage extended interaction and discussion among participants.

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The conference continues the yearly tradition of having a smaller (~200 ppl) conference focused on selective area, atomic layer deposition and etching, which has grown out of the AVS ALD conferences.

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Courses

• Plasma-Enhanced CVD: Fundamentals, Techniques, & Applications (October 3-4, 2023)
• Reactive Sputtering and Deposition (October 5-6, 2023)
• Basics of Radio Frequency Technology (October 9, 2023)
• Plasma Etching and RIE: Fundamentals & Applications
  (1 or 2 day option: October 10, 2023 (Day 1: Fundamentals); October 11, 2023 (Day 2: Applications))

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The ICMCTF is internationally recognized as a vibrant technical conference that integrates fundamental and applied research focused on thin film deposition, characterization, and advanced surface modification techniques.  ICMCTF is the premier international meeting in the field promoting global exchange of information among scientists, technologists, and manufacturers.  The conference draws more than 800 attendees each year with multiple oral technical sessions and a well attended poster session which is a major component of the technical program.

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Among the most impactful skills is the ability to converse with others with whom you are having conflict to achieve desired outcomes. 

This webinar focuses on methods that participants can develop and practice to lead them through hard and uncomfortable conversations. As a certified Trainer in 'Crucial Conversations for Mastering Dialogue’, Dr. Wang will introduce that framework as well as other tactics that participants can use to navigate difficult conversations.

September 27, 2023 1PM EDT

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The 2023 AVS Prairie Chapter Fall Symposium will be held on September 13, 2023 at the Illinois Institute of Technology, Chicago, IL.

This will be an in-person event and will consist of invited and contributed presentations, a poster session including a student poster competition and an equipment exhibit for vendors to display surface analytical, vacuum, microscopy, thin film, and microelectronic equipment.

Registration fees are $40 for students and postdocs and $75 for non-student participants.

Abstract submission is open until Sept 1, 2023. Please submit your abstracts by email and indicate if you would prefer a poster or oral presentation to Jeff Terry at jeff_terry@avs.org. 

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The AVS Pacific Rim Symposium on Surfaces, Coatings and Interfaces (PacSurf 2024) will be held on the Big Island of Hawaii from December 8 – 12, 2024. This conference is being organized by AVS with a Steering Committee composed of representatives from Australia, Canada, China, Japan, Korea, Mexico, New Zealand, Philippines, Singapore, Taiwan, and the United States. Symposium attendees will interact during morning and evening sessions that will include plenary, invited, and contributed presentations.The main topics for PacSurf 2024 will be focused on the latest advances in Biomaterial Surfaces & Interfaces, Energy Harvesting & Storage,  Nanomaterials, Plasma Processing, and Thin Films. We will have morning and evening technical sessions with the afternoons free for other activities and discussions.

The conference will be held in the Waikoloa Beach Marriott Resort and Spa on the Big Island of Hawaii.  We are confident you will benefit by attending PacSurf 2024 and networking with the other attendees.

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The 42nd Annual Symposium on Applied Surface Analysis (Surface Analysis ‘24) will be held jointly with the 35th Annual Symposium of the Pacific Northwest Chapter of AVS ‘The Science and Technology Society’ (PNWAVS) in the Discovery Hall at Pacific Northwest National Laboratory (PNNL), Richland, Washington August 6-9, 2024. For more information, visit: http://www.pnwavs.org. Surface Analysis ‘24, the annual topical conference sponsored by the Applied Surface Science Division, is an interdisciplinary meeting to discuss advances in applications of surface analysis. Historically, PNWAVS hosts a symposium each year that is related to the research areas and interests in the Pacific Northwest region.

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Invited Speakers:

• Shyam Aravamudhan (JSNN): Building a Semiconductor Workforce
• Kirtley Amos (NCSU): Data Science in Ag - Accelerating Translational Agricultural Research

Pre-registration required  --  https://go.ncsu.edu/css2023
       
Registration deadline* - November 7, 2023

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The International Symposium on Sputtering and Plasma Processes (ISSP) was established in 1991. The main subject of the 1st symposium was "Reactive Sputtering". It was the time that some new approaches to improve deposition rate and stability of the reactive sputtering process were started to be addressed. Since then, the symposium has been held biennially. At each symposium, the current topics and trends concerning sputtering and plasma processes have become the main focus and such topics have been discussed intensively.

Abstract Deadline: January 19, 2024

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The International Symposium of the Vacuum Society of the Philippines (ISVSP) is a specialized meeting that gathers domestic and world-renowned scientists in the Philippines to discuss a range of technology-related topics, emerging trends and special areas of interests. It provides opportunities to entertain topics that will stretch into the future and will be vital in assisting our local industry in different fields. It aims to stimulate discussions, establish collaborations, and foster camaraderie among participants. We anticipate that this event will be participated by colleagues from the academe, researchers, students, and industry professionals.

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The Rocky Mountain Chapter of AVS will be holding its Symposium on the 19th of September 2024 at the Denver-Westminster Double Tree Hotel on US36 in Westminster, Colorado.  In addition to the Symposium, the RMC will be putting on a short course program the 18th to 20th of September at the same location.

REGISTER HERE!

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The Rocky Mountain Chapter of AVS will be putting on a short course program on the 18th to 20th of September at the Denver-Westminster Double Tree Hotel on US36 in Westminster, Colorado.

REGISTER HERE!

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Courses

• Ultra-high Vacuum Design and Practices (3/5/24)
• Atomic Layer Deposition (3/6/24)
• Controlling Contamination in Vacuum Systems (3/7/24)
• Semiconductor Device Manufacturing Overview (3/12/24)
• Sputter Deposition (3/13/24)
• Partial Pressure Analysis with Residual Gas Analyzers (3/14/24)

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As Python-based APIs from major equipment manufacturers are becoming increasingly available, automated experimentation is now accessible to a broad range of scientists in both academia and industry. This webinar is tailored to meet these evolving needs. It is specifically designed to bridge the gap between theoretical data science concepts and their applications in automated microscopy, focusing on developing practical experimental workflows. The course provides an in-depth physicist's perspective on Bayesian methods and includes introduction into the GPax library. This approach is aimed at developing both intuition and practical skills necessary for applying Bayesian optimization in real-world experimental settings. Building upon optimization, we will discuss the construction of multistep workflows targeted at discovery of structure-property relationships, identifying physical laws, co-navigation between theory and experimental spaces, and co-orchestration of several tools. By the end of the course, attendees are expected to have a comprehensive understanding of how to apply Bayesian optimization methods effectively for simple tasks such as image optimization, and extend them to real world physics and materials science problems, making this course an invaluable resource for those looking to harness the full potential of ML/AI for modern experimental science.

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This session is intended for persons at all levels of careers who are interested in preparing awards packages, knowing about general award nomination processes, and writing nomination letters.

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The 2024 FLAVS Symposium will be held on March 11-12, 2024 at the University of Florida in Gainesville, Florida.  This will be an in-person event and will consist of a plenary lecture, technical sessions with invited and contributed presentations, a poster session including a student presentation and poster competition and an equipment exhibit for vendors to display surface analytical, vacuum, microscopy, thin film, and microelectronic equipment.   

There is no registration fee for either the symposium or equipment exhibit but online registration is required.

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The AVS International Symposium and Exhibition has been developed to address cutting-edge issues associated with vacuum science and technology in both the research and manufacturing communities. The Symposium is a week long forum for science and technology exchange featuring papers from technical divisions and technology groups, and topical conferences on emerging technologies. The equipment exhibition is one of the largest in the world and provides an excellent opportunity to view the latest products and services offered by over 200 participating companies. More than 3,000 scientists and engineers gather from around the world to attend. Short courses are offered in conjunction with the International Symposium providing specialized training in specific areas of vacuum science and related technologies. A Career Workshop and Job Center are also offered to all attendees. The Workshop covers such topics as résumé preparation, job search skills, networking, interviewing skills, and more. The Job Center provides the opportunity for job seekers to submit their résumés and meet with potential employers.

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The International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN), affectionately known as “3-Beams,” is the premier gathering of scientists and engineers who are dedicated to electron, ion and photon lithography, imaging, and analysis; atomically precise fabrication; nanofabrication process technologies; related emerging technologies; and their applications in a broad spectrum of fields. This is the 67th meeting of the EIPBN, where top researchers from academia, government laboratories, and industry from around the world meet to present and discuss recent trends and future directions in these technologies. 

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The series of international symposia entitled “Atomic Level Characterization (ALC)” focus on practical applications of atomic level characterization (both atomic dimensions and energy levels) of new materials and devices, including bio- and organic materials as well as inorganics. Descriptions of new applications and instrumentation for various analytical techniques of surface and interface analysis are solicited in these symposia. The goal is to promote stimulating discussions among researchers specializing in different probe methods. The symposium also encourages discussion of fundamental problems to be solved in the further development of atomic level characterization of materials, including approaches based on theory and simulations. 

Abstract Deadline: June 30, 2024

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The International Vacuum Nanoelectronics Conference series is devoted to the science and technology of micro and nano-devices that harness vacuum and/or high electric field phenomena. The conference covers both fundamental aspects and applications. Examples include electron sources, plasmas, liquid ionizers, gas ionizers, electric propulsion, X-rays, vacuum pumps, mass filters, vacuum quantum systems, and harsh electronics. 

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The annual PCSI conference is devoted to the fundamental physical, chemical, biological, structural, magnetic, and electrical properties of surfaces and interfaces. These topics include novel growth processes, interfacial phenomena, new characterization tools, transport and optical and magnetic studies, and studies of novel functionality for future device applications.

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The 2024 SVC TechCon in Washington, D.C. focuses on the essential role that Thin Films, Coatings, and Surface Engineering play in the products and services that drive our daily lives. The SVC represents the latest technologies, manufacturing methodologies, and business insights, supporting a global group of stakeholders. Highlighted by prominent Keynote presentations and invited speakers, the TechCon offers an engaging podium for contributed talks & posters as well as roundtable discussions and other interactive features.

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The annual New Mexico AVS Technical Symposium will feature scientists and engineers at all levels of their career with special emphasis for students, technologists, and early career researchers. This interdisciplinary, one-day forum allows for emerging scientists and engineers to present their research and collaborate with new colleagues. For students especially, the friendly exchange is valuable practice for future conferences and job presentations.

Short courses are offered on a wide variety of topics. Our vendor exhibit annually provides an exceptional opportunity to reach individuals from Los Alamos National Laboratory, Sandia National Labs, Air Force Research Laboratory and local industries such as Intel, Emcore and CVI Laser. Faculty and students from The University of New Mexico, New Mexico State University, and New Mexico Tech are frequent attendees.

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Participation in a local AVS chapter provides an excellent opportunity to interact in a smaller venue compared to the larger national conferences, affording the participants time to focus on presentations of scientific work that is happening in our immediate geographic proximity, along with ample time for professional networking.

The local chapter meetings are an ideal setting for students and early career researchers and professionals to present their research. Therefore, student participation is strongly encouraged. Established professionals are also welcome to submit abstracts, which could include recent studies, or provide overviews of topics of general scientific interest to the society and chapter members. 

Registration for the meeting is free and open to non-AVS members. Pizza and refreshments will be provided at about 6:00 pm. At the end of the meeting, awards will be given for the best oral and poster presentation(s).  The award winner(s) will be given a certificate from the AVS and will also be publicized in the AVS Newsletter.

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The AVS 25th International Conference on Atomic Layer Deposition (ALD 2025) featuring the 12th International Atomic Layer Etching Workshop (ALE 2025) will be a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films and now topics related to atomic layer etching.  Since 2001, the ALD conference has been held alternately in the United States, Europe and Asia, allowing fruitful exchange of ideas, know-how and practices between scientists. This year, the ALD conference will again incorporate the Atomic Layer Etching 2025 Workshop (ALE 2025), so that attendees can interact freely.

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Please join us at the AVS Ohio Chapter 2024 Symposium in Columbus, Ohio on Tuesday, July 30, 2024.   There will be Invited Speakers, contributed poster sessions with cash prizes for students and we kindly ask that you promote this event in your respective environments (academia, industry and the DOD).

REGISTRATION HERE!

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Join us for the AVS Michigan Chapter Symposium 2024. This all-day event is scheduled for June 5, 2024 at the Wayne State University Engineering Auditorium, 5050 Anthony Wayne, Detroit, Michigan.

The theme of the Symposium is Materials, Processes, and Devices for Novel Computing Hardware that will bring together experts from academia, research and industry to discuss cutting-edge research on novel computing paradigms of Neuromorphic and Quantum Computing, that transcend traditional CMOS devices and von Neumann architectures.

This year’s Symposium will feature plenary and invited talks, a poster session and an industrial exhibition.

REGISTER NOW!

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Highlight Theme: Nanoscale Fabrication, Measurement, and Applications

Invited Speakers:

• Cory Cress (US NRL), “Fundamental Studies on Low Dimensional Magnetic and Optical Materials”
• Keana Scott (NIST), “Advances and limitations of FIB SEM technology and applications for interface characterization”
• Nicholas Strandwitz (Lehigh), “Advanced Low-k Metal Oxides and Wear-Resistant Nitride
• Joshua Zide (University of Delaware), “Epitaxial Growth of Semiconductors and Semiconductor Nanocomposites for (Opto)electronics”

Pre-registration required  --  http://goo.gl/forms/DD7y3fPUII
       
Registration deadline* - May 2, 2024          
*(foreign nationals are encouraged to apply early)

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In conjunction with a visit with Publications Staff.

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In conjunction with ICMCTF 51.

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In conjunction with the AVS 71st International Symposium & Exhibition.

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Virtual Meeting

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The North American Molecular Beam Epitaxy Conference (NAMBE) is a prominent international forum for reporting scientific and technological developments in Molecular Beam Epitaxy research. The conference showcases important results from fundamental materials and device research, technological applications, and production. NAMBE features award presentations for MBE Innovator, Young Investigator, and Best Student Paper. Vendors will exhibit the latest equipment available for material growth and characterization. Exhibits will surround the coffee breaks and poster presentations, providing opportunities for discussions between attendees and vendors. Short topical workshops are also being considered the day before the main conference.

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WINDS is an international workshop designed to explore the fundamental properties of nanoscale heterostructures and potential device applications. The workshop is composed of morning and evening sessions, with afternoons free for ad hoc meetings to encourage extended interaction and discussion. WINDS provides a forum for material, device, and characterization as well as experimental and modeling researchers to interact. This breadth of expertise reflects the technical challenges in developing nanoscale devices and material systems, since every device is a heterostructure of one form or another and the properties of the interfaces often determine the functionality and properties of the nanoscale system.

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The Joint Sheffield Hallam University-Fraunhofer IST HIPIMS Research Centre are pleased to organise the fourteenth edition of the International Conference on High Power Impulse Magnetron Sputtering. The scope includes a broad range of technologies for plasma coating, plasma surface treatments and non-plasma advanced surface engineering. We aspire to: +Promote High Power Impulse Magnetron Sputtering (HIPIMS) as a novel surface engineering technology +Provide a scientific forum to discuss the fundamentals of plasma thin film growth and industrial applications of HIPIMS +Bring together the surface engineering communities +Connect the academic and industrial communities to foster progress of plasma-based technologies.

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The CAARI-SNEAP international conference brings together researchers from all over the world who use particle accelerators in their research and industrial applications.

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We are excited for the AVS Great Plains Tornado Alley Virtual Happy Hour on Thursday at 33:00pm CST (4:00 pm ET)!

This meeting will be an informal and fun way for us to meet each other and hear more about the AVS Great Plains Tornado Alley chapter goals.  Please feel free to forward this invitation to colleagues you think may enjoy learning more about AVS Great Plains Tornado Alley and our plans for future events.  We look forward to seeing you, along with your favorite beverage, for a bit of regional trivia, chapter news, and socializing on Thursday, June 20th at 3:00pm CST!.

Please contact Rachael Farber for more information and Zoom details.

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Courses

• Plasma-Enhanced CVD: Fundamentals, Techniques, & Applications (September 24-25, 2024)
• Basics of Radio Frequency Technology (September 26, 2024)

REGISTER HERE

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AVS National is offering two (2) in person short courses, Monday through Thursday, November 4-7, 2024 from 8:30 a.m.-5:00 p.m. (ET) at the Tampa Convention Center in Tampa, FL.

These courses will be held in conjunction with the AVS 70th International Symposium and Exhibition.

REGISTER HERE

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Courses

• Plasma and Ion Beam Diagnostics: Principles & Applications (October 1, 2024)
• Cleaning & Surface Conditioning Techniques for IC Manufacturing (October 2-3, 2024)
• Atomic Layer Etching (October 4, 2024)

REGISTER HERE

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The AVS International Symposium and Exhibition has been developed to address cutting-edge issues associated with vacuum science and technology in both the research and manufacturing communities. The Symposium is a week long forum for science and technology exchange featuring papers from technical divisions and technology groups, and topical conferences on emerging technologies. The equipment exhibition is one of the largest in the world and provides an excellent opportunity to view the latest products and services offered by over 200 participating companies. More than 3,000 scientists and engineers gather from around the world to attend. Short courses are offered in conjunction with the International Symposium providing specialized training in specific areas of vacuum science and related technologies. A Career Workshop and Job Center are also offered to all attendees. The Workshop covers such topics as résumé preparation, job search skills, networking, interviewing skills, and more. The Job Center provides the opportunity for job seekers to submit their résumés and meet with potential employers.

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The AVS New Mexico Chapter will celebrate its 60th Anniversary on Saturday, September 14th (5PM-8PM) at the Marble NE Heights Brewery in Albuquerque.
 
Please plan to join us and mark your calendars. Details to follow. 

All questions should be directed to: Woody Weed at jwweed@comcast.net.

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The 2024 AVS Prairie Chapter Symposium will be held in the Illinois Materials Research Laboratory of the University of Illinois in Urbana-Champaign on Thursday, September 5, 2024. We will have four outstanding plenary presentations covering a broad range of topics of general interest to the AVS community, as well as a poster session with cash prizes and a scientific equipment exhibit.

For Meeting information, program and registration, visit https://avs.mrl.illinois.edu.

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Peer review is essential to scientific progress – it upholds the quality, integrity, and credibility of research published in academic journals. This process helps authors strengthen their submitted papers and assists the editors in deciding the next steps for a manuscript.

In this 45-minute educational webinar on peer review, our panel of AVS journal editors will provide valuable insight into the peer review process, publishing ethics, and how to become a peer reviewer.

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The NCCAVS sponsors an Annual Equipment Exhibition to showcase products and services of companies supporting vacuum-related industries.

Largest Attendance of any AVS Chapters or Divisions. * Speaker events at capacity. * Extended hours provide ample time to engage all attendees. * Lunch, Evening Reception and Cocktails at no cost to attendees.

Held In Conjunction with:

• NCCAVS Technical Symposium
• 12^th Annual Student Poster Session

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Since 2015, IWGO has been the premier international event for dissemination of research results related to the growth, processing, characterization, and theory of Gallium Oxide and related materials.

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Largest gathering of International SIMS experts in the field. Conference rotates between Asia, North America and Europe every 2 years. SIMS 2022 in Minneapolis was sponsored by AVS. We'd like to continue the strong association of SIMS with AVS. Event is typically Sunday to Friday, with Tutorials on Sunday, talks Mon-Fri, with a banquet event as well. Exhibit for vendors is an important component as well. Presentation of our bid must be made at the SIMS 2024 conference in early Sept 2024.

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Participation in a local AVS chapter provides an excellent opportunity to interact in a smaller venue compared to the larger national conferences, affording the participants time to focus on presentations of scientific work that is happening in our immediate geographic proximity, along with ample time for professional networking.

These local chapter meetings are also an ideal setting for students and early career researchers and professionals to present their research. Therefore, student participation is strongly encouraged. Established professionals are also welcome to submit abstracts, which could include recent studies, or provide overviews of topics of general scientific interest to the society and chapter members. 

Registration for the meeting is free and open to non-AVS members. Pizza and refreshments will be provided at about 6:00 pm. At the end of the meeting, awards will be given for the best student oral and poster presentation(s).  The student award winner(s) will be given a certificate from the AVS and will also be publicized in the AVS Newsletter

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