Call for Abstracts - Divisions & Groups


Advanced Surface Engineering (SE)

The program of the Advanced Surface Engineering Division (SE) focuses on all topics related to intentionally enhancing or changing the properties and functionalities of surfaces of all kinds and the characterization of such surfaces. Both fundamental scientific and application-oriented contributions presenting results from experiments or from modelling or simulation are welcome. The session “Plasma-assisted Surface Modification and Deposition Processes” invites contributions aiming for understanding or further developing techniques and processes to alter the properties of surfaces or to synthesise thin films and coatings on surfaces of interest. Topics related to analysis and characterisation of such modified surfaces will be covered by the session “Nanostructured Thin Films and Coatings”. This includes also contributions on new and advanced characterisation techniques in order to gain further details. A frequent application of coatings is to protect the underlying surface from environmental influences. The session “Wear, Oxidation and Corrosion Protective Coatings” will deal with all different kinds of protective coatings in academic research, but also in industrial and ‘real-world’ applications. Surfaces in contact are subject to friction and wear. The session “Tribology: from Nano to Macro-scale” invites contributions on fundamental aspects of friction and wear as well as on the development of new testing methods for tribological contact situations. Last but not least the session “New Challenges and Opportunities in Surface Engineering” will serve as a forum to gather new ideas and developments in the field and to shows its broadness. The main focus will be on topics and contributions that show how surface engineering can assist to solve present-day and future problems. Invited lectures will review and highlight the state-of-the-art and latest findings in various topics. Academics, scientists, technicians and especially young students and PhD students from various disciplines and all countries are invited to contribute to a technical program of large diversity.

SE1+PS: Plasma-assisted Surface Modification and Deposition Processes
  • Rony Snyders, University of Mons, Belgium, "Innovative PVD Strategies for the Design of Novel TiO2-based Photoanode Utilized in Dye-sensitized Solar Cells"
SE2+AS+TF: Nanostructured Thin Films and Coatings
  • Grzegorz Greczynski, Linköping University, Sweden, "A Paradigm Shift in Thin Film Growth by Magnetron Sputtering: from Gas-Ion to Metal-Ion-Controlled Irradiation"
SE3+AS+SS: Wear, Oxidation and Corrosion Protective Coatings
  • Albano Cavaleiro, University of Coimbra, Portugal, "The Use of the Nanocomposite Concept in Hard Coatings for Improving the Frictional Performance"
SE4: Tribology: From Nano to Macro-scale
  • Peter Lee, Southwest Research Institute, “The Scaling of Tribological Material Effects from 2D to 3D”
SE5: New Challenges and Opportunities in Surface Engineering
  • Esteban Broitman, SKF Research and Development Technology, Netherlands, "Surface Engineering for Bearing Applications: Present Status and (Near)-Future Needs"
  • Megan J. Cordill, Austrian Academy of Sciences, Austria, "Evaluating Electro-Mechanical Reliability using In-Situ Methods"

SE6: Advanced Surface Engineering Poster Session

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Applied Surface Science (AS)

The Applied Surface Science Division provides a forum for research in surface preparation, modification, and utilization for practical applications with a focus on Characterization of Surfaces, Interfaces, and Nanomaterials. The Division has long been the premier gathering place for the global community of surface analysts with historic emphasis on techniques such as SIMS, XPS, and Auger spectroscopies.  We have long-standing analytical interests with traditional sessions such as quantitative surface analysis, industrial problem solving and advances in technique development.  Our contributors present a blend of fundamental research in measurement science along with cutting-edge applied studies in nanoscience, materials for energy conversion, semiconductor processing, polymers, biotechnology and more. We strive to grow in new areas for future development in the  applied surface analysis. For AVS 66 we are also encouraging contributions focusing on the roles of surfaces and interfaces in materials, technologies, and processes for energy transitions.  Novel surface analytical methods for providing insight into energy transitions, such as Atom Probe, Tip Enhanced Raman and Infrared and in operando techniques are welcome.
AS1+BI+RA: Quantitative Surface Analysis
  • Todd Williamson, Los Alamos National Laboratory, "Oxygen Energy Filtering and Relative Sensitivity Factor Considerations for Making U and Pu Measurements by LG-SIMS"
AS2: Multimodal Analysis - Combining Information within and Across Scales
  • Caterina Minelli, National Physical Laboratory, UK, “Complementary Measurements of Colloidal Nanoparticles and their Coatings by In-situ and Vacuum-based Methods”
AS3+CA+LS: Operando Characterization Techniques for In situ Surface Analysis of Energy Devices
  • Kelsey Stoerzinger, Oregon State University, "Probing the Electronic Structure of Electrocatalysts and the Formation of Reaction Intermediates"
  • Sefik Suzer, Bilkent University, Turkey, "Operando-XPS Investigation of Low-Volatile Liquids and their Interfaces"
AS4+RA: Computational Techniques for Surface Analysis
  • Wolfgang Werner, TU Wien, Austria, “Quantifying XPS-signals from Core-shell Nanoparticles”
AS5: Materials for Energy Transitions: Role of Surfaces and Interfaces
  • Paul Braun, University of Illinois, "Interfaces in Electrodeposited Li-Ion Battery Electrodes"
  • Steve Harvey, National Renewable Energy Lab, "Solar Energy From a Big-Picture Perspective to Nanoscale Insights via TOF-SIMS"
AS6: Industrial Problem Solving using Surface Analytical Tools
  • Albert Fahey, Corning, "Quantification and Depth Profile Fidelity: Methods of Analysis of Glass, Glass Surfaces and Optical Thin Film Interfaces"
AS7+BI+CA+LS: Beyond Traditional Surface Analysis
  • Daniel Perea, Pacific Northwest National Laboratory, "Nanoscale Tomographic Mapping the Liquid-Solid Interface with Cryo-APT"
  • Olivier Renault, CEA-LETI, France, “Nanotechnology as a Driver for Going Beyond Traditional Surface Analysis”
AS8: Advances in Depth Profiling, Imaging and Time-resolved Analysis
  • Fred Stevie, North Carolina State University, "What Really Lies Beneath the Avs Surface? Depth Profiling Can Provide the Answer"
AS9: Applied Surface Science Poster Session

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Biomaterial Interfaces (BI)

The Biomaterials Interfaces Division is organizing a series of sessions to provide an interdisciplinary forum for the presentation and discussion of fundamental aspects of bio-interface science and engineering. The BI program brings together recent advances made in materials science and molecular biology with sophisticated surface and interface analysis methods along with theoretical and modeling approaches for biological systems. Areas of interest are: Microbes and Fouling at Surfaces, including: control of microbes and fouling, biofilms, biofouling, attachment and adhesion of microbes, assessment of antifouling and fouling release function, antifouling coatings, motility at interfaces, colonization analysis, biofilms and EPS; Biomolecules and Biophysics at Interfaces, including: proteins at surfaces, nucleic acids, polysaccharides, adsorption, blood-contacting materials, bioadhesion, and infection and immunity; Characterization of Biological and Biomaterials Surfaces, including: spectroscopy, imaging, microscopy, optical and mechanical methods of thin film analysis, characterization in biological media, quantification, chemometrics, microfluidics, time- and spatial resolution, scanning probe techniques; Biofabrication, Bioanalytics, Biosensors and Diagnostics, including: biological membranes, vesicles, membrane processes, forces, recognition, signaling, biosensors, microfluidics, point-of-care devices, paper based sensors, electrochemistry; Bio-Nano and Single Molecules, including: nanofabrication, characterization of nano-structures, organic thin films, polymer coatings, hybrid coatings, biologically inspired materials, plasma produced biomaterials, patterning; 3D Cell Culture, including: spheroids, organoids, engineered tissues, 3D structures, tissue formation, implant integration, artificial organs, 3D biofilm structures; In Situ Characterization of Biomaterials, including: Sum Frequency Generation, Infrared Spectroscopy, Quartz Crystal Microbalance and Ellipsometry; Bioenergy, in line with the Symposium theme, including: artificial photosynthesis, bio(photo)electrochemistry, bio batteries, bio/electronic interfaces, bacteria/electrode interfaces or dye-sensitized solar cells. Biolubrication and Wear, including: biocorrosion mechanisms, biocorrosion prevention, functional fluids and fluid interfaces, and lubricious biopolymers. The BI program begins with the traditional Sunday afternoon Plenary Session. We also invite submissions of Flash/Poster Presentations, to take place during a Networking Session accompanied by awards for the best student Flash/Poster presentations. 

BI1: 3D Cell Culture: Spheroids, Organoids, Engineered Tissues
  • Laura Arriaga, University of Madrid, Spain, “Emulsion-templated Asymmetric Vesicles”
BI2: In Situ Characterization of Biomaterials
  • Allon Hochbaum, UCI, "Physiological Consequences of Bacterial-Material Interface Topography"
BI3+AS+NS: Biofabrication, Bioanalytics, Biosensors and Diagnostics
  • Tzahi Kohen-Karni, Carnegie Mellon University, "Bioelectronics with Graphene and Graphene-Based Hybrid-Nanomaterials – From Transparent to Fuzzy Interfaces"
BI4+AS: Characterization of Biological and Biomaterial Surfaces
  • Sapun Parehk, UT Austin, “Characterization of Biological and Biomaterial Surfaces: Hierarchical Changes in Protein Structure: From Surfaces to Cells”
BI5+AS: Biomolecules and Biophysics and Interfaces
  • Heather Allen, Ohio State University, "Iron Speciation at Aqueous Surfaces"
BI6+AS: Microbes and Fouling at Surfaces
  • Paul Stoodley, Ohio State University, "Biofilm Mechanics: an Adapted Mechanism for Surface Survival But a Drag for Us"
BI7+AS: Bio-Nano and Single Molecules
  • Stephanie Allen, University of Nottingham, UK, "Using Force to Probe Stem Cell Properties and Interactions"
BI8: Biolubrication and Wear
  • Phil Kim, Adaptive Surface Technologies, "Designing Anti-Fouling Lubricious Surfaces Based on Modular Approaches"
BI9: Bio-Energy
  • Alison Parkin, University of York, UK, “New Electrochemical Methods for Probing Metalloenzymes”
BI10: Biomaterial Interfaces Posters/Flash Poster Session

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Electronic Materials & Photonics (EM)

The Electronic Materials and Photonics Division encompasses and welcomes abstract submissions in any aspect of the science and engineering of materials, interfaces, and processing that advance electronic, photonic, and optoelectronic device technologies.  Topics planned for AVS 66 include materials, processes, and devices for advanced logic, memory, and interconnect applications.  Methods to enable new device topologies and simplify process flows such as selective area patterning, deposition, and etching will also be highlighted.  Multiple sessions will be focused on emerging computing paradigms, including quantum and neuromorphic computing.  We encourage submissions on the processing and interface challenges that face the materials, devices, and circuits under development for these novel approaches.  In honor of our late colleague Prof. Nikolaus Dietz, a long-time EMPD committee member and AVS contributor, we are soliciting papers for a special session covering the materials growth, characterization, and fabrication of wide and ultra-wide band gap devices.  Consistent with the energy theme of AVS 66, we are devoting a session to the electronics and photonics needed to enable renewable energy generation, storage, and transmission.  Topics include but are not limited to low-power electronics, power electronics, photovoltaics, and thermoelectrics.  We will also hold a session covering the latest advances in electronic and photonic nanostructure synthesis, assembly, and properties, as well as the techniques required for their characterization on the nanoscale.  As in past years, we will offer multiple graduate student poster awards as well as post-doc travel awards to help create a forum in which younger scientists can present their work and develop relationships for the future.

EM1+PS+TF: New Devices and Materials for Logic, Memory, and Interconnects
  • Sanjay Banerjee, University of Texas at Austin, “Electronics in Flatland”
  • Sasikanth Manipatruni, Intel, “Towards Beyond CMOS Computing: A Materials Centric Approach”
  • Azad Naeemi, Georgia Institute of Technology, "Performance Modeling and Design for Spintronic Logic and Memory Devices"
EM2+2D+AP+NS+PS: Selective-Area Patterning for Electronic and Photonic Devices
  • Charles Wallace, Intel, "The Role and Requirements of Selective Deposition in Advanced Patterning"
EM3+2D+MS+NS+QS+SE+TF: Leveraging Semiconductor Processing for Quantum Computing
  • Kevin Osborn, University of Maryland, "Cavity-QED and Other Electrical Characterizations to Address Two-Level System (TLS) Material Defects in Quantum Computing Circuits"
EM4+MS+NS+TF: Electronics and Photonics for Neuromorphic Computing
  • Asif Khan, Georgia Institute of Technology, "Ferroelectric Devices for Non-von Neumann Computing"
EM5+OX+TF: Nikolaus Dietz Memorial Session: Wide and Ultra-wide Band Gap Materials and Devices
  • Ian Ferguson, Missouri University of Science and Technology, “Dilute Magnetic Wide Bandgap Semiconductors for Room Temperature Spintronic Applications”
  • Axel Hoffmann, Technical University of Berlin, Germany, “Nitrides: A Promising Material for Opto-Electronics”
  • Vincent Woods, Pacific Northwest National Laboratory, "Nitride Based Wide Band Gap Semiconducting Materials: a Long Pathway to Advanced Nuclear Detection Capabilities"
EM6+2D+NS+TF: THEME Session: Electronics and Photonics for a Low-Carbon Future
  • Joel Ager, Lawrence Berkeley National Laboratory, “Electrochemical and Photoelectrochemical Conversion of Carbon Dioxide to C2 Products”
  • Mariana Bertoni, Arizona State University, "Uncovering the Materials Paradigm for Solar Absorbers through In situ Imaging and Characterization”
  • Karen Buechler, ALD NanoSolutions, "Atomic Layer Deposition’s Potential in Sustainability"
EM7+2D+AS+MI+MN+NS+TF: Nanostructures and Nanocharacterization of Electronic and Photonic Devices
  • Sergei Kalinin, Oak Ridge National Laboratory, "Building and Exploring Quantum Structures One Atom at a Time via Scanning Transmission Electron Microscopy"
EM8+AP+AS+MI+SS: Surface and Interface Challenges in Electronics and Photonics
  • Anders Mikkelsen, Lund University, Sweden, "Combining 2D and 1D Atomic Scale Tailored Nanowire Surfaces for Novel Electronics and Photonics"
EM9: Electronic Materials and Photonics Poster Session

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Magnetic Interfaces & Nanostructures (MI)

This year, the MI’s program features pioneering, controversial, introductory and emerging results in topical areas related to magnetic interfaces and nanostructures. Particular attention will be given to research areas in magnetism that are of strong interest to the AVS community so that maximum overlap with other divisions and focus topics can be achieved. The program will cover a wide area of topics ranging from chiral magnetism and spin orbit effects at interfaces to magnetism in magnetocaloric materials. The focus of the program is to cover areas of magnetism that are fascinating from a fundamental point of view but which carry significance for future applications. In addition, we would like to highlight the synergy between the research areas covered by MI and their role for the development of new materials and devices for the information society. For this reason, MI will solicit contributed abstracts for a special mini-symposium on “Novel Magnetic Materials and Device Concept for Energy efficient Information Processing and Storage .” Finally, the program committee will select the best graduate student presentation from finalists for the Leo Falicov Award. MI will also offer an award for postdoctoral fellows who will be presenting papers at the AVS66 Symposium.

MI1+2D: Emerging Multifunctional Magnetic Materials I
  • Bin Hu, University of Tennessee Knoxville, “Electric-Magnetic Coupling at Ferromagnetic/Semiconducting Interface”
  • Deepak Singh, University of Missouri, "Field and Current Control of the Electrical Conductivity of an Artificial Two-Dimensional Honeycomb Lattice"
MI2+2D: Emerging Multifunctional Magnetic Materials II
  • Janice Musfeldt, University of Tennessee Knoxville, “Microscopic Origin of Magnetism and Charge Ordering Pattern in Multiferroic (LuFeO3)3/(LuFe2O4)1
  • Taichi Okuda, Hiroshima Synchrotron Radiation Center, Japan, “Investigation of Hidden Local Spin-polarized Electronic States by Spin- and Angle-resolved Photoelectron Spectroscopy”
  • Vojtech Uhlir, Central European Institute of Technology, Czech Republic, "Emergence and Dynamics of Magnetic Order in Metamagnetic Nanostructures"
MI3: Magnetocaloric Materials
  • Joseph Heremans, Ohio State University, “The Roles Electron Spins Can Play in Thermal Energy Conversion”
  • Michael Mchenry, Carnegie Mellon University, "High Entropy Alloys for Magnetocaloric Applications"
MI4+2D+AS+EM: Novel Magnetic Materials and Device Concept for Energy efficient Information Processing and Storage (Mini-Symposium)
  • Burkard Hillebrands, Technical University Kaiserslautern, Germany, “Using Novel Magnonic Device Concepts for Efficient Information Processing”
  • Hans Nembach, NIST, "Dzyaloshinskii-Moriya Interaction in Magnetic Multilayers"
  • Georg Schmidt, Martin-Luther-Universität Halle-Wittenberg, Germany, "Fabrication of Free Standing YIG 3D Magnon Nanoresonators with Very Low Damping"
MI5 Magnetic Interfaces and Nanostructures Poster Session

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The MEMS and NEMS Technology Group (MN) program will highlight recent advances in the broad areas of micro/nanoelectromechanical systems (MEMS/NEMS), especially latest fundamental studies of novel materials, processes, devices, and emerging functions and applications of MEMS/NEMS, in various areas. This AVS66 MN program will include a focus on sensing, communication, and energy. Specific highlights for AVS66 will be microscale gas chromatography and microfabrication technologies for quantum computing. Our program will include resonant low-dimensional materials and parametric and nonlinear MEMS/NEMS resonators which create intriguing possibilities of integrating these devices with existing fluidic, electronic and optical on-chip networks. The program continues to embrace latest progresses in optical MEMS/ NEMS, micro/nanophotonics, optomechanics, quantum MEMS/ NEMS, resonant systems, CMOS-MEMS, mesoscopic dynamics and dissipation processes, inertial sensors, harsh-environment transducers, and MEMS/NEMS-enabled energy technologies, etc. It also aims to capture some of the latest advances in soft materials, flexible and implantable MEMS/NEMS for biosensing, bio-inspired microsystems, wearable and wireless healthcare. 

MN1: Microscale Gas Chromatography and Gas Sensing
  • Gert Desmet, VUB,  Brussels, Brussels, "Micromachined Silicon Micro-pillar Arrays for Liquid and Gas Chromatography"
  • Ted Zellers, University of Michigan, “An Integrated Passive µPreconcentrator with Progressively-Heated µInjector for µGC”
MN2: MEMS Technology for Energy Efficient Solutions
  • Mingzhen Liu, UESTC, China, “Materials Synthesis and Device Fabrication for Novel Inorganic Perovskites”
  • Matteo Rinaldi, Northeastern University
MN3: Low-dimensional MEMS and NEMS
  • Philip Feng, Case Western Reserve University, “Engineering Quantum Signal Transduction in Atomic Layer 2D Devices”
MN4: Quantum Nanomechanics and Optomechanics
  • Mark Dykman, Michigan State University, "Quantum Fluctuations and Time-symmetry Breaking in Arrays of Driven Nanoresonators"
  • Ivan Favero, MPQ, CNRS, Univ Paris Diderot, France, “High-Speed Nano-Optomechanics to Detect Physical Signals”
  • Simon Groeblacher, Delft University of Technology, The Netherlands
MN5: Micro and Nanophotonics and Plasmonics
  • Montserrat Calleja, CSIC Madrid, Spain, “Nanomechanical Sensing for the Life Sciences”
MN6: Microfabrication Approaches for Quantum Information Device
  • Matthew Blain, Sandia National Laboratory, “Surface Ion Trap Device Fabrication for Experiments in Quantum Information Science”
  • Rupert Lewis, Sandia National Laboratories, "Fabrication and Test Circuits for Superconducting Qubits"
MN7: MEMS and BioMEMS Processes, Materials, and Devices
  • Gianluca Piazza, Carnegie Mellon University, "Piezoelectrics Meets Photonics – Acousto-Optic Microsystems"
MN8: MEMS/NEMS Poster Session

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Manufacturing Science & Technology (MS)

The MSTG sessions bring together invited speakers to highlight the challenges needing to be addressed for successful manufacturing of next generation devices and technologies.  Our sessions are meant to bring together people working across the spectrum of these technologies, including basic science research, metrology, processing, and development, to encourage everyone to keep these manufacturing challenges in mind as they move the technologies forward.  This year we are highlighting the areas of  Solid State Battery Manufacturing, as contribution to the Symposium theme on energy transition, and Quantum and Neuromorphic Computing Manufacturing.

MS1: Science and Technology for Manufacturing: Neuromorphic and Quantum Computing (ALL INVITED SESSION) 
  • Michael Hayduk, AFRL, “Quantum Information Science at AFRL”
  • Santosh Kurinec, RIT, "Ferroelectrics for Neuromorphic Computing"
  • Satyavolu Papa Rao, SUNY Polytechnic Institute, "Key Methods of Quantum Computing and the Associated Materials Challenges"
  • Vishal Saxena, University of Idaho, "Memristive and Photonic Neuromorphic Computing Solutions"
  • Robert Sutor, IBM Research, "Josephson Junction Quantum Computing"
MS2: Science and Technology for Manufacturing: Solid State Batteries (ALL INVITED SESSION) 
  • SangBok Lee, University of Maryland College Park, "Precision Solid State Battery Architectures: Science, Challenges and Opportunity"
  • Corey Love, U.S. Naval Research Laboratory, "Enabling High Cycle Life Alkali Metal Anodes through Imposed Thermal Gradients"
  • Amy Prieto, Colorado State University
  • Debra Rolison, U.S. Naval Research Laboratory, "The Importance of Modifying the Nothing Within 3D Electrode Architectures for Solid-State Energy Storage"
MS3: Manufacturing Science and Technology Poster Session

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Nanometer-scale Science & Technology (NS)

This Division explores the science and technology that emerges when material is shrunk to the nanoscale. Researchers from around the globe will present their work on topics such as nanoscale devices and quantum systems exploiting nanoscale design and characterization. The role of nanomaterials in novel devices and constructs is highlighted, particularly their surface chemistry, energetics, mechanics, and imagery. Specific emphasis will be made on the key connections between nanoscale physical and chemical phenomena induced in confined volumes and in the scanning probe, electron and ion microscope environments, as well as approaches to harness these phenomena for nanoscale and atom-by-atom fabrication. The NSTD particularly promotes novel physical phenomena emerging in these nanosystems, and their applications for quantum information systems, sensing, and other applications.

NS1: 2D and 1D Optics and Optoelectronics at the Nanoscale
  • Chennupati Jagadish, ANU, Australia, "Semiconductor Nanowires for Optoelectronics Applications"
  • Jasha Repp, University of Regensburg, Germany, “Lightwave Scanning Tunneling Microscopy of Single Molecules”
NS2+QS: Quantitative Imaging of Quantum Systems
  • Ondrej Krivanek, Nion, "Phonon Spectroscopy by 5 meV Resolution EELS in the Electron Microscope"
NS3+AS: In situ Electron Microscopy
  • Canhui Wang, National Institute of Standards and Technology (NIST), "In-situ Electron Microscopy of Localized Surface Plasmon Promoted Reactions"
  • Wagner, Jakob Birkedal, Technical University of Denmark, “Dynamics of Material Surfaces and Interfaces – The Good, the Bad and the Electron Beam”
NS4+AS+RA+SS: Big Data and Machine Learning in Imaging
  • Ilke Arslan, Argonne National Lab, "From Electrons to X-rays: Tackling Big Data Problems through AI"
NS5+2D+QS: Direct Atomic Fabrication by Electron and Particle Beams
  • Paul Mazarov, RAITH, GmbH, Germany, “Light and Heavy Ions from New Non-classical Liquid Metal Ion Sources for Advanced Nanofabrication”
  • Jianguo Wen, Argonne National Lab, “Nanoscale Manipulation of Redox of Ag by Electron Beam”
NS6+2D+AS+QS: Quantum Systems by SPM Fabrication and Characterization
  • Joseph Stroscio, National Institute of Standards and Technology (NIST), "Visualizing the Interplay between Spatial and Magnetic Confinement in Graphene Quantum Dots"
NS7: Molecular and Atomic Forces
  • John Sader, University of Melbourne, Australia, "Interatomic Force Laws That Evade Dynamic Measurement"
NS8: SPM for Electrical Characterization
  • Adnan Mehonic, UCL, UK, "Silicon Oxide for RRAM Application - The SPM Analysis Approach"
  • Gheorghe Stan, National Institute of Standards and Technology (NIST), "Intermittent Contact Resonance Atomic Force Microscopy (icr-Afm) for Nanoscale Mechanical Property Characterization"
NS9: X Ray Nanoscience
  • Martin Holt, Argonne National Lab, "Nanoscale Structural Imaging through Bragg Diffraction Microscopy"
NS10+2D+AS: Covalently Bonded 2D Materials
  • Sabine Maier, University of Erlangen-Nürnberg, Germany, "Bottom-up Fabrication of 2D Molecular Networks via On-surface Reactions"
  • Paul Weiss, University of California, Los Angeles, "Fabrication of and Connections to Two-Dimensional Materials"
NS11: Nanometer-scale Science and Technology Poster Session

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Plasma Science & Technology (PS)

The 2019 Plasma Science & Technology program highlights state-of-the-art advances in plasma research, ranging from fundamental studies of plasma physics and chemistry to new applications. Abstracts describing novel research are solicited in areas of plasma etching and deposition, advanced memory, plasma modeling, plasma-surface interactions, plasma sources, and plasma diagnostics, sensors, and control. Other areas of interest include plasma medicine, plasma biology, agriculture, and environment, atmospheric-pressure plasmas, and plasma-liquid interactions.  Sessions on plasma conversion and enhanced catalysis for chemical synthesis, and plasma processing of materials for energy applications are also planned to highlight the symposium theme on energy transition. In addition to the oral sessions, abstracts can be submitted to the poster session, which provides an excellent opportunity for one-on-one discussions of new results with colleagues. The PSTD poster session will also feature a Student Poster Prize Competition where attendees may vote for their favorite via the AVS66 mobile app.

PS1+EM: Advanced BEOL/Interconnect Etching
  • Angelique Raley, Tokyo Electron
PS2+EM: Advanced FEOL
  • Yohei Ishii, Hitachi High Technologies America Inc., Japan, “Investigation on Plasma Etch Technology Enabling SiGe/Si MOS-FET Pocess Integration”
PS3+EM: Advanced Memory and Patterning
  • Mitsuhiro Omura, Toshiba Memory Corporation, Japan, “Challenges in High-aspect-ratio Hole Etching for 3D Flash Memory”
PS4+SE: Atmospheric-Pressure Plasmas
  • Matteo Gherardi, University of Bologna, Italy, "On the Versatility of Atmospheric Non-Equilibrium Plasmas: Materials Synthesis, Packaging Sanitation, and Oncological Applications"
  • Jacob Shelley, Rensselaer Polytechnic Institute
PS5+2D+EM+SS+TF: Plasma-Enhanced Atomic Layer Etching
  • Peter Biolsi, TEL Technology Center, America, LLC
  • Jane P. Chang, University of California, Los Angeles, "Understanding Atomic Layer Etching: Thermodynamics, Kinetics, and Surface Chemistry"
PS6: Plasma Biology, Agriculture, and Environment
  • Cristina Satriano, University of Catania, Italy, "Smart Materials at the Nanobiointerfaces"
PS7+SS: Plasma Conversion and Enhanced Catalysis for Chemical Synthesis
  • Jason Hicks, University of Notre Dame, "Plasma-assisted catalysis: Exploring the Effects of Plasma Environments on Catalyst Performance"
  • Bruce E. Koel, Princeton University, "Plasma-assisted Ammonia Synthesis"
PS8+2D+SE+TF: Plasma Deposition and Plasma-Enhanced Atomic Layer Deposition
  • Erwin Kessels, Eindhoven University of Technology, The Netherlands, "Taking Plasma ALD to the Next Level: From Fundamental Understanding to Selective 3D Processing"
  • Christopher Muratore, University of Dayton, "Controlling the Performance of Molecular Semiconductors Via Tailored Plasma Particle Energy Distributions"
PS9: Plasma Diagnostics, Sensors, and Control
  • Shinjae You, Chungnam National University, Republic of Korea, “Cutoff Probe Measurement and its Modeling”
PS10: Plasma-Liquid Interactions
  • Katsuhisa Kitano, Osaka University, Japan, "Peroxynitric Acid Chemistry in Plasma-Treated Water for Effective and Safety Disinfection"
  • Sylwia Ptasinska, University of Notre Dame, "Plasma Reactive Species Formation in Liquids"
PS11: Plasma Medicine
  • Cristina Canal, Technical University of Catalonia, Spain
PS12: Plasma Modeling
  • Hae June Lee, Pusan National University, Republic of Korea
PS13+2D+EM+SE: Plasma Processing of Challenging Materials
  • Meihua Shen, Lam Research, “Meeting the Challenges in Patterning Phase Change Material for Next Generation Memory Devices”
PS14+EM: Plasma Processing of Materials for Energy
  • Maxime Darnon, University of Sherbrooke, Canada, "Plasma Processes for >40% Efficiency Solar Cells"
PS15: Plasma Sources
  • Peter Kurunczi, Applied Materials
PS16+AS+EM+SS: Plasma-Surface Interactions
  • Nathan Marchack, IBM T.J. Watson Research Center, “Advanced Cyclic Plasma Etch Approaches for Metal Patterning: Synergy and Surface Modification Effects”
PS17: Commemorating the Career of John Coburn (ALL INVITED SESSION)

PS18: Plasma Science and Technology Poster Session

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Surface Science (SS)

The Surface Science Division provides a forum for cutting edge and foundational research that involves solid surfaces and interfaces including gas-solid and liquid-solid interactions. This Division’s overarching goal is to provide the atomistic insights on solid surfaces and interfaces needed to advance our understanding of materials systems and benefit society. Research presented in the SSD program covers a wide range of phenomena from chemical reactions at surfaces of relevance to catalysis, corrosion and energy applications. This year we introduce a dedicated session on the surface science aspects of Energy Conversion and Storage which links directly to this year’s AVS Symposium theme on energy transition.  This year’s sessions extend from surface chemistries with carbon dioxide and water to reactions on alloy surfaces, catalytic reactions promoted by single atoms, and complex and intriguing surface studies on oxides. Technical developments in recent years now allow for intra-molecule imaging, and have greatly expanded our capabilities to study reactions under “real life conditions” with operando methods. Another session is dedicated to the study of the dynamics at surfaces and interfaces extending surface studies to include the time domain. For the first time we reach far out into the realms of astrochemistry and planetary science where astronomy observations and laboratory experiments intersect One of the sessions will host the Morton M. Traum award for exciting research presented by students in the Surface Science Division.
SS1: Operando and Ambient Pressure
  • Irene Groot, Leiden University, The  Netherlands, "Seeing Is Believing: Atomic-Scale Imaging of Catalysts under Industrial Conditions"
SS2: Carbon Dioxide Chemistry
  • Johan Gustafson, Lund University, Sweden, “Step-controlled Dissociation of CO2 on Cu Surfaces”
SS3: Water Chemistry at Surfaces
  • Hannes Jonsson, Brown University, "Electrochemical CO2 Reduction"
SS4: Astrochemistry and Planetary Science
  • Edith Fayolle, NASA, “Molecular Processes on Icy Surfaces in the Outer Solar System”
SS5: Oxide Surfaces
  • Martin Setvin, TU Wien, Austria, "Noncontact AFM on Oxide Surfaces: Challenges and Opportunities"
SS6: Dynamics at Surfaces and Interfaces
  • Gil Alexandrowicz, Swansea, UK, “Studying Molecule-Surface Interactions using Rotational Orientation Control of Ground-State Molecular Beams”
SS7: Intra-molecular Imaging
  • Leo Gross, IBM, Switzerland, “Characterizing Individual Molecules with AFM”
SS8: Reactions on Alloy Surfaces
  • Graeme Henkelman, University of Texas, "Correlating Structure and Function for Nanoparticle Catalysts"
SS9: Single Atom Catalysis
  • Philip Christopher, University of California, Santa Barbara, "Controlling the Local Coordination and Reactivity of Supported Pt-Group Atoms"
SS10: Surface Science of Energy Conversion and Storage
  • Esther Takeuchi, Stonybrook University, “Analysis and Deliberate Modification of Electrochemical Interfaces”
  • Bilge Yildiz, MIT, “Chemical and Electrochemical Stability of Perovskite Oxide Surfaces: Mechanisms and Improvements”
SS11: Surface Science Poster Session

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Thin Film (TF)

The Thin Film Division offers several core oral sessions, with outstanding invited speakers, and one poster session covering the broad scope of thin film topics including various deposition processes (ALD, CVD, PVD, MBE, PLD, sputtering, etc), characterization of structure-property-performance relationships, and applications enabled by thin film technologies. There are several sessions dedicated to thin film deposition and process development, including: precursors for ALD and CVD; surface reactions, mechanisms and kinetics; nucleation and growth transients; and  manufacturing and scale-up of thin film deposition.  Specifically to address this year’s symposium theme on energy transition we have two sessions comprising of thin films for energy harvesting, conversion, electrochemistry and storage.  Additionally, we offer sessions in other thin film applications including, electronics and optoelectronics, memory, magnetics, and flexible electronics. Furthermore, we offer sessions on in-situ diagnostics, theory, modelling, and machine learning to understand the fundamental science of thin films.  To address the emerging materials in thin films, we are offering sessions on metal halide perovskites and other organic/inorganic hybrid films and interfaces, functional films like multiferroics, piezo- and flexoelectrics, functional polymers and composites, neuromorphic and phase change materials, novel wide bandgap and ultrawide bandgap materials and epitaxial films. Again this year, we will host a student-focused session to highlight the Harper Award candidates in which the student finalists will present their work in an interactive “TEDTalk” type of forum.

TF1+EM+NS+SS: Thin Films for Energy Harvesting and Conversion
  • Cary Pint, Vanderbilt University, "Redesigning Batteries into Efficient Energy Harvesters and Sensors for Wearable Applications"
TF2: Thin Films for Electrochemistry and Energy Storage
  • Wyatt Tenhaeff, University of Rochester, "Enabling Energy Dense Lithium Batteries Using Thin Film Technology"
TF3+2D+AS+EL+EM+NS+SS: Thin Film for Flexible Electronics
  • John D. Williams, Boeing, “Flexible Hybrid Electronics Process Maturation Using Printed Silver Based Inks”
TF4+MI+MN+OX: Functional Thin Films: Piezoelectric, Flexoelectric and Multiferroics
  • Nazanin Bassiri-Gharb, Georgia Institute of Technology, “Size Effects of the Electromechanical Response in Ferroic Thin Films: Phase Transitions to the Rescue”
TF5+AP: ALD and CVD: Precursors and Process Development
  • Lisa McElwee-White, University of Florida, "Mechanism Based Precursor Design for CVD Metal Oxides and Sulfides"
TF6+2D+AP+SS: ALD and CVD: Surface Reactions, Mechanisms, and Kinetics
  • J. Ruud van Ommen, Delft University of Technology, The Netherlands, "ALD on Particles: What is Different from Wafers?"
TF7+2D+EL+SS: Nucleation, Early Growth and Transient Phenomena in Thin Film Deposition
  • Joachim Schnadt, Lund University, Sweden, “Real-time Monitoring of the Surface Chemistry of Atomic Layer Deposition by Ambient Pressure X-ray Photoelectron Spectroscopy”
TF8+AP: Manufacturing and Scale-Up of Thin Film Deposition: CVD, ALD, PVD, and CSD
  • Frank Rosowski, BASF, TU Berlin, Germany
TF9+SE: HiPIMS and Reactive HiPIMS for Novel Thin Films
  • Jon-Paul Maria, Pennsylvania State University, "Reactive HIPIMs Deposition of Oxide Thin Films"
TF10+EM+MI+PS: Thin Films for Magnetics and Advance Memory Applications
  • Megan Holtz, Cornell University, "A Room-Temperature Magnetoelectric Multiferroic made by Thin Film Alchemy"
TF11+EM+MI: Thin Films for Microelectronics, Photonics, and Optoelectronic Applications
  • Kirsten Moselund, IBM, Switzerland, "Monolithic Integration of III-Vs on Si for Electronic and Photonic Applications"
TF12: Emerging Applications for Thin Films
  • Aaron Lindenberg, Stanford University, "Visualization of Ultrafast Charge Motion in Thin Films via THz Emission Spectroscopy"
TF13: Theory, Computation, and Machine Learning Applied to Thin Films and Related Devices
  • Maria Chan, Argonne  National Laboratory, “First Principles Modeling and Machine Learning of Hybrid Perovskite Properties”
  • John (Jack) Lyons, U.S. Naval Research Laboratory, "Incorporation Mechanisms and Electronic Properties of Impurities in Wide-Band-Gap Semiconductors”
TF14+AS+EL+PS+RA: Characterization of Thin Film Processes and Properties
  • Mark Twigg, U.S. Naval Research Laboratory, "Phase Separation in Semiconductor Thin Films"
TF15+SS: Metal Halide Perovskites and Other Organic/Inorganic Hybrid Thin Films
  • B. Reeja Jayan, Carnegie Mellon University, "CVD Polymers That Enhance Rate Capability and Cycling Stability of Lithium Ion Batteries"
TF16: Vapor Deposition of Functional Polymer Thin Films and Composites
  • Karen Gleason, MIT, "Durable Surface Energy Control with Initiated Chemical Vapor Deposited (iCVD) Polymers"
TF17: Thin Film Neuromorphic and Phase Change Materials
  • Gabriele Navarro, CEAL LETI, France, "Phase-Change Memory: A Quest from Material Engineering Towards the Device Performances"
TF18+EM: Wide and Ultra-wide Bandgap Thin Films: Advances in Deposition and Novel Materials
  • Jim Speck, University of California Santa Barbara, "Metal Oxide Catalyzed Epitaxy (MOCATAXY) Growth of beta-Ga2O3 Alloys and Heterostructures"
TF19+PS: Epitaxial Thin Films
  • Paul Simmonds, Boise State University, "Molecular Beam Epitaxy Applied to Tensile-Strained Quantum Dots for Quantum Optics and Band-Structure Engineering"
TF20: Thin Films Poster Session

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Vacuum Technology (VT)

The Vacuum Technology Division (VTD) provides a forum for research in achieving, maintaining, measuring, and analyzing vacuum across a wide range of pressures, gas compositions and applications.  The 2019 VT program topics include: Vacuum Measurement; Vacuum Pumping and Outgassing;  Aerospace, Large Vacuum System and Accelerator Vacuum Technology;  Extreme High Vacuum; Systems for Energy Storage. The VTD Poster session Tuesday evening features the VT Student Poster Competition, where students of any discipline are invited to share their innovative solutions to vacuum equipment challenges. Student presenter awards will also be given for the best oral presentations.
VT1: New Methods of Vacuum Measurement and Partial Pressure Analysis
  • Laurent Pitre, LNE Cnam-LCM, France, "Superconducting Microwave Cavity Quantum Pressure Standard in the range 200 Pa to 20 kPa"
VT2: Material Outgassing, Gas Loads and Vacuum Pumping
  • Diana Gamzina, Stanford University, "e-beam Melting of Copper"
VT3: Gas Dynamics, Modeling, and Simulation
  • Irina Graur, Aix-Marseille University, France, "Gas Dynamic Simulations"
VT4: Aerospace, Large Vacuum System and Accelerators
  • Giuseppe Bregliozzi, CERN, Switzerland, "Vacuum Operation and Future Upgrade of the LHC Accelerator Complex"
  • Ian Malloch, Facility for Rare Isotope Beams, "Vacuum System Modeling, Design, and Commissioning at the Facility for Rare Isotope Beams"
  • Chandra Romel, California Institute of Technology, "Next Generation LIGO Vacuum System"
VT5: Extreme High Vacuum

VT6: Particle Control, Quality Control, Ultraclean Systems

VT7: History of Vacuum Systems and Processes with Energy Focus
  • Timothy Gessert, Gessert Consulting, LLC, "Importance of Advanced Vacuum Technology to the Present Thin Film Photovoltaics Industry"
VT8+QS: Vacuum Systems for Quantum Science
  • Richard Silver, National Institute of Standards and Technology (NIST), "Single Atom Transistors"
VT9: Vacuum Systems for Energy Storage
  • Leonard Brillson, Ohio State University, "Defect Manipulation to Control Energy Processes in Electronic Materials"
  • David Cullen, Oak Ridge National Laboratory, "SEM Work for Fuel Cells"
VT10: Vacuum Technology Poster Session

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