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UID:43dcbd18-8769-49e6-a66f-92baaf030f04@avs.org
DTSTAMP:20260824T022235Z
DTSTART:20261213T120000Z
DTEND:20261216T000000Z
LOCATION: IIT Bombay, Mumbai, India
DESCRIPTION:\nThe workshop focuses on Atomic Layer Deposition (ALD) and its role in advancing materials-to-manufacturing (M2M) technologies, bringing together leading researchers, scientists, industry professionals, and students from academia, national laboratories, and industry. The workshop will feature expert lectures and discussions on:Advanced ALD processes and next-generation deposition technologiesThin-film growth mechanisms, surface chemistry, and interface engineeringSemiconductor device fabrication and integration2D materials, nanotechnology, and emerging device architecturesAI/ML-driven materials discovery and process optimization.\n\n IIT Bombay, Mumbai, India\n\nSaurabh Lodha, Gopalan Rajaraman
SUMMARY: Atomic Layer Deposition Materials-to-Manufacturing
PRIORITY:3
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