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UID:a1b5a12f-693e-4468-ad27-9a94f50a4921@avs.org
DTSTAMP:20260727T030857Z
DTSTART:20260819T170000Z
DTEND:20260819T180000Z
LOCATION: Virtual/Online
DESCRIPTION:Future electronic and quantum devices will require near-atomically-precise nanofabrication processes, but present plasma processing methods create a variety of imperfections that limit device performance. In this talk, I will present atomic layer etching processing for materials including superconducting niobium nitride, and lithium niobate which enable etching with Angstrom-scale precision. I will describe our efforts to translate the process improvements to devices with outstanding performance.\n\nREGISTER NOW!\n\n Virtual/Online\n\n Heather Korff
SUMMARY: AVS e-Talk: Atomic Layer Etching of Electronic and Quantum Materials for Revolutionary Solid-state Technologies
PRIORITY:3
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