BEGIN:VCALENDAR
PRODID:-//Kentico Software//NONSGML Kentico CMS//EN
VERSION:2.0
BEGIN:VEVENT
UID:255aef60-086f-4a35-9f54-3261498c0ced@avs.org
DTSTAMP:20260308T045557Z
DTSTART;VALUE=DATE:20270620
DTEND;VALUE=DATE:20270624
LOCATION: Dresden, Germany
DESCRIPTION:\nThe AVS 27th International Conference on Atomic Layer Deposition (ALD 2027) featuring the 14th International Atomic Layer Etching Workshop (ALE 2027) will be a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films and now topics related to atomic layer etching.  Since 2001, the ALD conference has been held alternately in the United States, Europe and Asia, allowing fruitful exchange of ideas, know-how and practices between scientists. This year, the ALD conference will again incorporate the Atomic Layer Etching 2027 Workshop (ALE 2027), so that attendees can interact freely. The conference will take place Sunday, June 20 - Wednesday, June 23, 2027, in Dresden, Germany.\n\nAs in past conferences, the meeting will be preceded by one day of tutorials and a welcome reception. Sessions will take place (Monday-Wednesday) along with an industry tradeshow. All presentations will be audio-recorded and provided to attendees following the conference (posters will be included as PDFs). Anticipated attendance is 800+.\n\n Dresden, Germany\n\n Della Miller
SUMMARY:  ALD/ALE 2027: AVS 27th International Conference on Atomic Layer Deposition (ALD 2027) featuring the 14th International Atomic Layer Etching Workshop (ALE 2027)
PRIORITY:3
BEGIN:VALARM
TRIGGER:P0DT0H15M
ACTION:DISPLAY
DESCRIPTION:Reminder
END:VALARM
END:VEVENT
END:VCALENDAR