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VERSION:2.0
BEGIN:VEVENT
UID:27257196-e054-4de5-a7f2-3a1bf7d97d86@avs.org
DTSTAMP:20260308T044637Z
DTSTART:20221121T150000Z
DTEND:20221121T220000Z
LOCATION: Virtual/Online
DESCRIPTION:This course develops an understanding of atomic layer deposition (ALD). Al2O3 ALD is first introduced as an ideal model system and then ALD is compared with CVD. Non-ideal ALD behavior is presented before discussing plasma and radical-enhanced ALD. Subsequently, novel surface chemistry is described for metal ALD.\n\n Virtual/Online\n\n Heather Korff
SUMMARY: Mid-Atlantic (Virtual) AVS Short Course: Atomic Layer Deposition
PRIORITY:3
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TRIGGER:P0DT0H15M
ACTION:DISPLAY
DESCRIPTION:Reminder
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