AVS National Online Short Course: Plasma Etching and RIE: Fundamentals & Applications (1 or 2 day option: Day 1- Fundamentals; Day 2- Applications)
2022-09-29 14:00 - 2022-09-30 21:00 UTC | Online/Virtual
Course ObjectivesKnow the basic concepts of plasma etching.Understand the physics of RF glow discharges (both high and low density).Understand the surface science aspects of reactive ion etching (RIE).Learn about plasma-surface chemistry leading to etching.Recognize the factors that influence etching anisotropy.

Online/Virtual

Heather Korff
