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UID:ba48fe4f-371b-4275-b844-4d47a404b1cb@avs.org
DTSTAMP:20260429T184012Z
DTSTART:20220928T140000Z
DTEND:20220928T210000Z
LOCATION: Online/Virtual
DESCRIPTION:\nCourse ObjectivesLearn the fundamentals of ALE based on sequential self-limiting reactions.Understand the differences between plasma ALE and thermal ALE.Learn about the surface chemistry and reactors for ALE.Understand why plasma ALE can obtain atomic layer precise anisotropic etching.Learn how thermal ALE can achieve atomic layer precise isotropic etching.Learn how ALE can be utilized for thin film nanoengineering and device fabrication.Understand the many current and potential applications of ALE.\n\n Online/Virtual\n\n Heather Korff
SUMMARY: AVS National Online Short Course: Atomic Layer Etching
PRIORITY:3
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DESCRIPTION:Reminder
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