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PRODID:-//Kentico Software//NONSGML Kentico CMS//EN
VERSION:2.0
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UID:5efc1f67-7cf9-4203-a44e-e5fac2838b37@avs.org
DTSTAMP:20260429T184103Z
DTSTART:20220208T150000Z
DTEND:20220208T220000Z
LOCATION: Virtual/Online
DESCRIPTION:\nAtomic layer etching (ALE) is based on sequential, self-limiting reactions that yield controlled etching at the atomic level.  ALE is critical for atomic layer processing that is increasingly important for nanoscale fabrication.  The course will cover both plasma ALE and thermal ALE.  Process strategies will be described that are useful for many applications including advanced semiconductor processing.\n\nThe first part of the course will cover the basics of plasma ALE.  Si ALE will be described as the model plasma ALE system defined by chlorination and Ar+ ion sputtering.  Other plasma ALE systems will be discussed such as SiO2, Si3N4 and HfO2 ALE.  The second part of the course will cover the basics of thermal ALE.  Al2O3 ALE will be developed as the model thermal ALE system based on fluorination and ligand-exchange reactions.  Other thermal ALE systems will be discussed such as TiN, SiO2 and Si ALE.\n\nThe course will also discuss selectivity in ALE and the importance of ALE in area-selective atomic layer deposition (ALD).  ALE and ALD can also be integrated into process flows in the same reactor for advanced device fabrication.  Other applications for ALE include surface cleaning and surface smoothening.\n\n Virtual/Online\n\n Heather Korff
SUMMARY: Atomic Layer Etching
PRIORITY:3
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DESCRIPTION:Reminder
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