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PRODID:-//Kentico Software//NONSGML Kentico CMS//EN
VERSION:2.0
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UID:7709f189-17fc-476d-a83b-6187a847ffea@avs.org
DTSTAMP:20260308T041935Z
DTSTART:20220203T150000Z
DTEND:20220203T220000Z
LOCATION: Virtual/Online
DESCRIPTION:\nThis introductory course provides maintenance and equipment engineers and technicians with a basic working knowledge of RF technology as it is applied to semiconductor processing equipment.\n\nThe role of RF in the various plasma processes, including sputter deposition and etching systems, is discussed. The characteristics and uses of various components that make up an RF system are described. The differences between resistive and reactive components are explained as well as the differences between series and parallel resonance.\n\nThe course covers the operation of RF generators, coaxial cables, matching networks, filter circuits, and the plasma chamber itself. The use of inductive versus capacitive coupling of RF power into the plasma discharge is reviewed as well as methods for measuring target and substrate voltages and their relation to ion energies.  Basic and practical troubleshooting techniques are discussed.\n\n Virtual/Online\n\n Heather Korff
SUMMARY: Basics of Radio Frequency Technology
PRIORITY:3
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DESCRIPTION:Reminder
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