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UID:1c1c1734-fb43-4a88-8de9-77a2ac568739@avs.org
DTSTAMP:20260314T232709Z
DTSTART:20220209T180000Z
DTEND:20220209T220000Z
LOCATION: Virtual/Online
DESCRIPTION:\nOver the last two decades Atomic Layer Deposition (ALD) has become a key enabling method with a multitude of applications benefiting from the (ultra)thin films that can be prepared with precise thickness control and with unparalleled uniformity and conformality on substrates with a demanding surface topology.\n\nIn this webinar the method of ALD will be presented with a focus on various applications of ALD: both in the lab and in the fab; from high volume manufacturing to niche markets;  from emerging technologies to proof-of-concepts. Special attention will be given to the key features that ALD provides for these specific applications as well as the associated ALD configurations and types of equipment.\n\n Virtual/Online\n\n Heather Korff
SUMMARY: AVS Webinar: Atomic Layer Deposition from an Applications Perspective
PRIORITY:3
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DESCRIPTION:Reminder
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