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UID:6a175770-6463-42e3-b11c-cc1e85005cb7@avs.org
DTSTAMP:20260429T183932Z
DTSTART:20211209T180000Z
DTEND:20211209T220000Z
LOCATION: Virtual/Online
DESCRIPTION:\nArea-selective deposition (ASD) is a technology that is currently gathering momentum as enabler for bottom-up fabrication. Its main promise is the ability to process material in a self-aligned fashion, thereby eliminating alignment errors in semiconductor processing. In addition, ASD has been considered for alternative nanofabrication schemes in catalysis. By using mature thin film techniques such as chemical vapor deposition (CVD) and atomic layer deposition (ALD) as a starting point, the development of strategies and approaches to ASD primarily focuses on making the growth selective to specific materials or surfaces. This often involves the selective adsorption of reactant species, or as a more general approach, the deactivation of surfaces on which no growth is desired by selective functionalization. While achieving selective deposition is already difficult, maintaining the selectivity is yet another challenge, as there are numerous side-reactions that could lead to loss of selectivity. In this webinar, several aspects of ASD technology will be addressed, ranging from fundamental surface reactions to technological challenges.\n\n Virtual/Online\n\n Heather Korff
SUMMARY: AVS Webinar: Area-Selective Deposition
PRIORITY:3
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DESCRIPTION:Reminder
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