BEGIN:VCALENDAR
PRODID:-//Kentico Software//NONSGML Kentico CMS//EN
VERSION:2.0
BEGIN:VEVENT
UID:da960209-caea-4f21-baa3-e1b6c3735cee@avs.org
DTSTAMP:20260429T184103Z
DTSTART:20210916T140000Z
DTEND:20210916T210000Z
LOCATION: Online/Virtual
DESCRIPTION:\nCourse ObjectivesKnow the basic concepts of plasma etching.Understand the physics of RF glow discharges (both high and low density).Understand the surface science aspects of reactive ion etching (RIE).Learn about plasma-surface chemistry leading to etching.Recognize the factors that influence etching anisotropy.\n\n Online/Virtual\n\n Heather Korff
SUMMARY: AVS National Online Short Course: Plasma Etching and RIE: Fundamentals and Applications <b>(Day 2 –  9/16)</b>
PRIORITY:3
BEGIN:VALARM
TRIGGER:P0DT0H15M
ACTION:DISPLAY
DESCRIPTION:Reminder
END:VALARM
END:VEVENT
END:VCALENDAR