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UID:4c9ecf28-5fe9-4b54-981a-aca8e524a746@avs.org
DTSTAMP:20260429T183946Z
DTSTART:20210917T140000Z
DTEND:20210917T210000Z
LOCATION: Online/Virtual
DESCRIPTION:\nCourse ObjectivesLearn the fundamentals of ALD based on sequential self-limiting surface reactions.Understand the important advantages of ALD and comparison with CVD.Learn about ideal and non-ideal ALD and thermal and plasma-enhanced ALD.Understand how ALD surface chemistry and growth are studied using in situ probes.Learn how ALD can be utilized for thin film nanoengineering.Understand the many current and potential applications of ALD.\n\n Online/Virtual\n\n Heather Korff
SUMMARY: AVS National Online Short Course: Atomic Layer Deposition
PRIORITY:3
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DESCRIPTION:Reminder
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