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UID:2c971d5b-dcde-48be-8855-886c1971520f@avs.org
DTSTAMP:20260429T183933Z
DTSTART:20220421T120000Z
DTEND:20220423T000000Z
LOCATION: Westin St. Francis, San Francisco, CA
DESCRIPTION:\nDevelopments in nanoelectronics and nanoscale surface modification continue to drive the need for more elegant and reliable bottom-up area selective deposition (ASD) strategies. Many technology fields increasingly focus on developing new strategies for ASD, including sub-10 nm next generation devices, -material catalysts, new optical devices, and materials for energy storage. This two-day workshop will gather leading experts from academia and industry. Themes addressed include: fundamental challenges related to recent developments in ASD, applications for ASD in next-generation technology, emergent processes for implementing ASD techniques, and new perspectives on metrological and characterization strategies for further understanding persistent mechanistic challenges.\n\n Westin St. Francis, San Francisco, CA\n\n Rudy Wojtecki
SUMMARY: 6th Area Selective Deposition Workshop (ASD 2022)
PRIORITY:3
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DESCRIPTION:Reminder
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