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UID:a08f98b4-b5f1-48b4-9d00-e8bb16260dc7@avs.org
DTSTAMP:20260308T044157Z
DTSTART:20210518T140000Z
DTEND:20210518T210000Z
LOCATION: Virtual/Online
DESCRIPTION:\nThe first part of the course will cover the basics of plasma ALE.  Si ALE will be described as the model plasma ALE system defined by chlorination and Ar+ ion sputtering.  Other plasma ALE systems will be discussed such as SiO2, Si3N4 and HfO2 ALE.  The second part of the course will cover the basics of thermal ALE.  Al2O3 ALE will be developed as the model thermal ALE system based on fluorination and ligand-exchange reactions.  Other thermal ALE systems will be discussed such as TiN, SiO2 and Si ALE.\n\nREGISTER HERE!\n\n Virtual/Online\n\n Heather Korff
SUMMARY: AVS Online Short Course Program: Atomic Layer Etching
PRIORITY:3
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DESCRIPTION:Reminder
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