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UID:bf608e2c-b31c-4f9b-8c92-4ffdc0c48aac@avs.org
DTSTAMP:20260429T184103Z
DTSTART:20210406T120000Z
DTEND:20210409T000000Z
LOCATION: Virtual
DESCRIPTION:\nDevelopments in nanoelectronics and nanoscale surface modification continue to drive the need for more elegant and reliable bottom-up area selective deposition (ASD) strategies. Many technology fields increasingly focus on developing new strategies for ASD, including sub-10 nm next generation devices, mixed-material catalysts, new optical devices, and materials for energy storage. This three-day virtual workshop will gather leading experts from academia and industry. Themes addressed include: fundamental challenges related to recent developments in ASD, applications for ASD in next-generation technology, emergent processes for implementing ASD techniques, and new perspectives on metrological and characterization strategies for further understanding persistent mechanistic challenges.\n\n Virtual\n\n John Ekerdt
SUMMARY: 5th Area Selective Deposition Workshop (ASD 2021)
PRIORITY:3
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DESCRIPTION:Reminder
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