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UID:010f4327-5167-4cdb-a5de-613aba1e7b9f@avs.org
DTSTAMP:20260314T223046Z
DTSTART:20210226T150000Z
DTEND:20210226T220000Z
LOCATION: Virtual/Online
DESCRIPTION:\nThis course provides an understanding of the cause and effect of changes in sputtering parameters on the energetics of the sputtering and deposition processes and their relationship to film properties. The energy and distribution of species ejected from the target are discussed. The effect of the sputtering system on material transport to the substrate and subsequent film deposition is also discussed for films of metals, alloys, and compounds. The parameters of different sputtering systems (diode, triode, magnetron, and ion guns) with DC and RF power supplies are discussed with respect to film properties.\n\nREGISTER HERE!\n\n Virtual/Online\n\n Heather Korff
SUMMARY: AVS Online Short Course: Sputter Deposition
PRIORITY:3
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DESCRIPTION:Reminder
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