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UID:080449e9-c68d-4da6-a7ea-74628c20ed71@avs.org
DTSTAMP:20260429T184145Z
DTSTART:20201111T150000Z
DTEND:20201111T220000Z
LOCATION: Virtual/Online
DESCRIPTION:\nAtomic layer etching (ALE) is based on sequential, self-limiting reactions that yield controlled etching at the atomic level.  ALE is critical for atomic layer processing that is increasingly important for nanoscale fabrication.  The course will cover both plasma ALE and thermal ALE.  Process strategies will be described that are useful for many applications including advanced semiconductor processing.\n\nREGISTER HERE!\n\n Virtual/Online\n\n Heather Korff
SUMMARY: AVS Mid-Atlantic Chapter Online Short Course Program: Atomic Layer Etching
PRIORITY:3
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DESCRIPTION:Reminder
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