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UID:75e34044-3908-4f67-9a6e-5d4fd67f9bb5@avs.org
DTSTAMP:20260429T184013Z
DTSTART:20210627T140000Z
DTEND:20210630T180000Z
LOCATION:Online/Virtual Conference
DESCRIPTION:\nThe AVS 21st International Conference on Atomic Layer Deposition (ALD 2021) featuring the 8th International Atomic Layer Etching Workshop (ALE 2021) will be adapted into a Virtual Meeting comprised of Live and On Demand Sessions. The registration deadline is June 30, 2021; all presenters must register by May 1, 2021.\n\nThe event will feature: Live Tutorial Session with live Q&A Chat opportunities (Sunday, June 27, 2021)Live Plenary, Awards, and Student Finalists with live Q&A Chat opportunities (Monday, June 28, 2021)Live Parallel Technical Sessions with live Q&A Chat opportunities (Tuesday-Wednesday, June 29-30, 2021)On Demand Oral Sessions (Starting Monday, June 28, 2021)On Demand Poster Sessions with a Mix of Pre-recorded (Video or Audio) Talks and/or PDF filesLive and On Demand Sessions available on Mobile App/Online Scheduler through July 31, 2021 and then to AVS members in the AVS Technical Library\n\nOnline/Virtual Conference\n\n Della Miller, e-mail: della@avs.org
SUMMARY:21st International Conference on Atomic Layer Deposition (ALD 2021) featuring the 8th International Atomic Layer Etching Workshop (ALE 2021)
PRIORITY:3
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DESCRIPTION:Reminder
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