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UID:7f925a59-0e5e-4403-a920-3d1568f12f31@avs.org
DTSTAMP:20260429T184040Z
DTSTART:20200826T170000Z
DTEND:20200826T210000Z
LOCATION: Virual/Online
DESCRIPTION:This webinar will provide an overview on how film stress develops during deposition, how it is affected by the main process parameters, and how to mitigate it. Selected examples from epitaxial, amorphous and polycrystalline thin films will be highlighted, with emphasis on metallic thin films. Models explaining the generation and relaxation of stress will be presented and discussed.\n Instructor: Gregory AbadiasCost: $250/person\nREGISTER HERE!\n\n Virual/Online\n\n Heather Korff
SUMMARY: AVS Webinar: Stress Evolution during Thin Film Deposition
PRIORITY:3
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DESCRIPTION:Reminder
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