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UID:ae4b80b6-57e0-4f25-a04a-3b24362123da@avs.org
DTSTAMP:20260429T184144Z
DTSTART:20200402T110000Z
DTEND:20200403T230000Z
LOCATION: Stanford University, Stanford, CA, USA
DESCRIPTION:\nThe opportunities for area selective deposition (ASD) to impact several areas of materials and technological advancement are driving exciting advances. This workshop will bring together leading experts from both academia and industry to share their vision and results about fundamental aspects of surface chemistry, new processes, metrology, applications, technology needs and integration challenges for ASD. Based on a series of successful workshops at IMEC in 2019 and 2016, North Carolina State University in 2018, and Eindhoven University of Technology in 2017, the two-day program will include invited and contributed speakers and a poster session and a reception on the evening of April 2.\n\n Stanford University, Stanford, CA, USA\n\n Stacey Bent
SUMMARY:  Area Selective Deposition Workshop
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DESCRIPTION:Reminder
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