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UID:ece4299a-aaf9-4824-9d78-9fdbcdcba593@avs.org
DTSTAMP:20260429T184238Z
DTSTART:20200629T120000Z
DTEND:20200701T230000Z
LOCATION: Online/Virtual
DESCRIPTION:\nThe AVS 20th International Conference on Atomic Layer Deposition (ALD 2020) featuring the 7th International Atomic Layer Etching Workshop (ALE 2020) will be adapted into a Virtual Meeting comprised of Live and On Demand Sessions.\n\nThe ALD/ALE 2020 Virtual Meeting will kick off on Monday, June 29, 2020, with a FREE (registration required) live Plenary & ALD Innovator Award Session. Following the announcement of the ALD 2020 Awardee there will be a series of plenary and invited talks.\n\nPaid attendees will be able to participate in the Tuesday, June 30, 2020 and Wednesday, July 1, 2020, Technical & Poster Sessions. The live sessions will feature invited and student awards talks. After each day’s live sessions, we also invite attendees to view the pre-recorded Technical & Poster Sessions On Demand. Posters will be a mix of pre-recorded (video or audio) talks and/or PDF files.\n\nAttendees may also register for the Tutorial that is being held live over a two-day period (Tuesday, June 30-Wednesday, July 1). The Tutorial will feature three speakers each day with a live question and answer period where your chat questions can be answered. The Tutorial Session will be recorded and placed On Demand for those who paid for them until July 31, 2020.\n\n Online/Virtual\n\n Della miller
SUMMARY:  20th International Conference on Atomic Layer Deposition (ALD 2020) Virtual Meeting
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DESCRIPTION:Reminder
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