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UID:1f16fe1b-e347-4f80-b3ed-b474cdb0788b@avs.org
DTSTAMP:20260314T231716Z
DTSTART:20190721T120000Z
DTEND:20190724T230000Z
LOCATION: Bellevue, Washington
DESCRIPTION:The AVS 19th International Conference on Atomic Layer Deposition (ALD 2019) featuring the 6th International Atomic Layer Etching Workshop (ALE 2019) will be a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films and now topics related to atomic layer etching.  Since 2001, the ALD conference has been held alternately in the United States, Europe and Asia, allowing fruitful exchange of ideas, know-how and practices between scientists. This year, the ALD conference will again incorporate the Atomic Layer Etching 2019 Workshop (ALE 2019), so that attendees can interact freely. The conference will take place Sunday, July 21-Wednesday, July 24, 2019, at the Hyatt Regency Bellevue in Bellevue, Washington (East Seattle).\n\n Bellevue, Washington\n\n Della miller, e-mail: della@avs.org
SUMMARY:  19th International Conference on Atomic Layer Deposition (ALD 2019)
PRIORITY:3
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DESCRIPTION:Reminder
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