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UID:d54cda8b-df9a-4d1e-9009-046fc5088e2b@avs.org
DTSTAMP:20260429T184204Z
DTSTART:20190611T110000Z
DTEND:20190614T230000Z
LOCATION: Kanazawa Institute of Technology, Kanazawa, Japan
DESCRIPTION:The 15th International Symposium on Sputtering and Plasma Processes (ISSP2019) will be held in Kanazawa, Japan from June 11th to 14th, 2019. This symposium has been held biennially and has gathered 135+ presentations and 210+ attendees. The topics of this symposium include 1) fundamentals of sputtering and plasma processes, 2) sputtering processes, 3) plasma processes, 4) plasma induced process technologies, 5) thin films, 6) micro- and nano-technologies, 7) applications, and 8) others. The program will consist of invited, contributed talks and poster presentations. To encourage young scientists' contributions, poster awards will be given to three outstanding poster presentations.\n\nAbstract Deadline: January 15, 2019\n\n Kanazawa Institute of Technology, Kanazawa, Japan\n\n Tetsuya Goto; e-mail: tetsuya.goto.b2@tohoku.ac.jp and Yasuhito Gotoh; e-mail: gotoh.yasuhito.5w@kyoto-u.ac.jp
SUMMARY:  15th International Symposium on Sputtering and Plasma Processes (ISSP2019)
PRIORITY:3
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DESCRIPTION:Reminder
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