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UID:edc72d41-b853-4b19-ae19-17dd843c62ff@avs.org
DTSTAMP:20260429T184205Z
DTSTART:20190609T110000Z
DTEND:20190609T230000Z
LOCATION: RIHGA Royal Hotel, Kyoto, Japan
DESCRIPTION:The workshop is going to highlight new capability in the field of Atomic Layer Etching, Atomic Layer Deposition and Selective Area Patterning which are of interest to the semiconductor device community for the enablement of future device fabrication technology.\n\n RIHGA Royal Hotel, Kyoto, Japan\n\n 
SUMMARY:  2019 VLSI Workshop: Impact of Atomic Layer Processing and Selective Area Patterning on Device Fab
PRIORITY:3
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DESCRIPTION:Reminder
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