Thin Film Division

Advancing the Science and Technology of Materials, Interfaces, and Processing


About the Division:

Mission - to promote and support the study of:
  • methods and processes for the formation of films
  • methods and processes for the analysis of films
  • properties of film materials, components and devices
  • manufacturing of these devices and their applications

Activities Supported
  • short courses on thin film topics
  • technical programs at international, national, and local symposia
  • thin film technical briefs, "recipes" for deposition
  • education



Conference:

ALD 2015:
15th International Conference on Atomic Layer Deposition
 
DATE & LOCATION:  
June 28-July 1, 2015
Portland Hilton, Portland, Oregon
 
SCOPE:
ALD 2015  will be a three-day meeting (preceded by one day workshop), dedicated to the science and technology of atomic layer controlled deposition of thin films. Atomic layer deposition (ALD) is used to fabricate ultrathin and conformal thin film structures for many semiconductor and thin film device applications. A unique attribute of ALD is that it uses sequential self-limiting surface reactions to achieve control of film growth in the monolayer or sub-monolayer thickness regime.
 
ALD is receiving attention for its potential applications in advanced high dielectric constant (high-k) gate oxides, storage capacitor dielectrics and copper diffusion barriers in advanced electronic devices, as well as for solar energy and biological applications. It is of interest for any advanced technologies that require control of film structure in the nanometer or sub-nanometer scale.
 
As in past conferences, the presentations will follow an all-electronic format, and electronic copies of the presentations (including oral component, and questions and answers) will be made available in the form of copy-secured DVDs.
 
This year an ALE Workshop will be held in conjunction with ALD 2015;
see details below.
 
Abstract Deadline: February 16, 2015 

Prospective authors are invited to submit their abstracts online by
February 16, 2015. Abstract submission will open November 2014.
 
WEBSITE:
Details will be posted to the ALD 2015 Website in November 2014
www.ald-avs.org.
 
CHAIRS
Dae-Gyu Park, IBM T.J.Watson Research Center
Charles Winter, Wayne State University
 
QUESTIONS:
Contact Della Miller, AVS, 530-896-0477, della@avs.org